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研究生:林彥名
研究生(外文):Lin, Yan-Ming
論文名稱:於ABS塑膠基材上鍍製Cr-Si-N奈米複合薄膜之製程技術研究
論文名稱(外文):A study of fabrication process for the Cr-Si-N nanocomposite thin films on ABS plastic substrates
指導教授:徐富勇
指導教授(外文):Hsu, Fu-Yung
口試委員:黃清安李志偉
口試委員(外文):Huang, C. A.Lee, Jyh-Wei
口試日期:2012-12-20
學位類別:碩士
校院名稱:明志科技大學
系所名稱:材料工程研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2013
畢業學年度:101
語文別:中文
論文頁數:96
中文關鍵詞:氮化鉻矽奈米複合薄膜陰極電弧沉積直流磁控濺鍍法離子輔助沉積塑膠材料
外文關鍵詞:Cr-Si-N nanocomposite thin filmcathodic arc evaporationplused DC magnetron sputteringion-assisted depositionplastic materials
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氮化鉻薄膜具有良好的機械特性與抗腐蝕性,本研究透過奈米複合薄膜概念,改變添加的矽元素含量,形成Cr-Si-N奈米複合薄膜,對於硬度、耐磨耗性及抗腐蝕性的提高有相當的助益。研究中一個結合了陰極電弧蒸鍍、脈衝直流磁控濺鍍和離子輔助沉積三種方法的複合鍍膜系統,在塑膠材料及矽晶片上分別鍍製出矽成份自0.6 at.%至13.5 at.%的Cr-Si-N薄膜。依據成份分析得知,薄膜氮含量隨矽含量增加而增加。由XRD與XPS分析發現,在矽含量1.3~5.1 at.﹪時,CrN 特徵峰強度非常明顯,但在矽含量8.6 at.﹪時,其特徵峰強度下降,且呈現些微奈米晶特性,而且當矽含量13.5 at.﹪時,轉變為寬廣的繞射峰,當矽含量增加至5.1 at.%以上時,薄膜有非結晶相Si3N4存在。並且發現晶粒尺寸隨矽含量得添加而降低趨勢。觀察薄膜截面可發現柱狀結構隨矽含量增加而消失,且薄膜的表面都存在一些微粒與部份孔洞。薄膜的色澤度大約落在64~71左右。從硬度試驗得知硬度隨矽含量增加而升高,但過高的矽含量則會導致硬度下降,當矽含量為5.1 at.%時達到最高硬度23.7 GPa。從刮痕試驗得知,在矽含量為13.5 at.%的薄膜試片附著性最佳。而Cr-Si-N 薄膜矽含量為5.1 at.%時,具有最佳抗磨耗性能。從紙帶磨耗試驗結果發現,薄膜都可通過測試。而薄膜的落砂試驗結果都呈現不佳。由鹽霧試驗結果,薄膜都可通過48小時的測試,顯示具有不錯的抗腐蝕能力。


關鍵字:Cr-Si-N奈米複合薄膜、陰極電弧沉積、直流磁控濺鍍法、離子輔助沉積、塑膠材料

In this study, the Cr-Si-N nanocomposite thin films were prepared on plastic materials and silicon wafer substrate by a hybrid coating system, which includes cathodic arc evaporation, pulse DC magnetron sputtering and ion-assisted deposition components. The nanocomposite Cr-Si-N thin films with various Si contents have been achieved ranging from 0.6 at.% to 13.5 at.%.
The XRD analysis showed that the stronger CrN peaks appeared when Si content was between 1.3 at.% to 5.1 at.%. The intensity of CrN peaks decreased when Si content increased up to 8.6 at.%. An amorphous broadening peak was found as the Si content reaching to 13.5 at.%. The XPS analysis of Cr-Si-N films indicated that the amorphous Si3N4 was found as Si content up higher than 5.1 at.%. The grain size of Cr-Si-N thin films decreased with increasing Si content. The columnar structure of thin films disappeared as Si content increased, and macroparticles and pin holes were found on the surface of each thin films. The chromaticity analysis of Cr-Si-N films indicated between 64 to 71.
The hardness of Cr-Si-N thin films increased with increasing Si content and then decreased. A maximum hardness around 23.7 GPa in average was achieved for coatings with around 10.1 at.% Si content. A good adhesion and good nanowear resistance were found in the Cr-Si-N thin films with around 13.5 at.% and 5.1 at.% Si content respectively. The R.C.A abrasion test indicated that good resistance was found for the Cr-Si-N thin films. The Cr-Si-N thin films were failed after the falling sand abrasion teat. The forty-eight hours salt spray test indicated that the good corrosion resistance was found for each Cr-Si-N thin film.


Keywords:Cr-Si-N nanocomposite thin film, cathodic arc evaporation, plused DC magnetron sputtering, ion-assisted deposition, plastic materials

明志科技大學碩士學位論文指導教授推薦書 i
明志科技大學碩士學位論文口試委員審定書 ii
明志科技大學學位論文授權書 iii
誌謝 iv
中文摘要 v
ABSTRACT vi
目錄 vii
表目錄 x
圖目錄 xi
第一章 序論 1
1.1 前言 1
1.2 研究動機與目的 3
第二章 文獻回顧 4
2.1 物理氣相沉積系統 4
2.1.1 薄膜沉積機制 5
2.2 陰極電弧系統 6
2.2.1 陰極電弧原理 6
2.2.2 陰極電弧的優缺點 7
2.3 離子輔助系統 8
2.3.1 離子源助鍍之效果 9
2.4 直流磁控濺鍍系統 10
2.4.1 脈衝磁控濺鍍系統 12
2.5 氮化鉻矽奈米複合薄膜 13
2.5.1 氮化鉻薄膜特性 13
2.5.2 氮化鉻薄膜組成 15
2.5.3 氮化鉻矽奈米複合薄膜特性 19
2.5.4 氮化鉻矽奈米複合薄膜強化機制 21
2.6 鹽霧試驗 25
2.7 塑膠材料 28
2.7.1 塑膠材料分類與特性 28
2.7.2 ABS塑膠材料 30
第三章 實驗方法 31
3.1 實驗流程 31
3.2 實驗方法與步驟 33
3.2.1 基材試片規格與前處理 33
3.2.2 實驗設備 33
3.2.3 實驗步驟 35
3.3 鍍膜性質分析 37
3.3.1 薄膜成份分析 37
3.3.2 薄膜表面及截面型態分析 38
3.3.3 薄膜晶相結構分析 39
3.3.4 薄膜色澤度分析 40
3.3.5 薄膜硬度分析 41
3.3.6 薄膜附著性分析 43
3.3.7 薄膜耐磨性分析 44
3.3.8 薄膜鹽霧腐蝕分析 47
第四章 結果與討論 49
4.1 不同矽含量之Cr-Si-N 奈米複合薄膜性質分析 49
4.1.1 薄膜成份分析 49
4.1.2 薄膜晶相分析 51
4.1.3 薄膜微結構分析 55
4.1.4 薄膜色澤度分析 62
4.2 不同矽含量之Cr-Si-N 奈米複合薄膜機械性質分析 65
4.2.1 薄膜硬度分析 65
4.2.2 薄膜附著性分析 67
4.2.3 薄膜耐磨性分析 73
4.3 不同矽含量之Cr-Si-N 奈米複合薄膜腐蝕性質分析 84
4.3.1 薄膜極化曲線試驗 84
第五章 結論 88
參考文獻 90

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