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研究生:黃裕廷
研究生(外文):Huang, Yu-Ting
論文名稱:氮化鋁鎵/氮化鎵高載子遷移率電晶體之電性量測與大訊號模型
論文名稱(外文):Electrical Measurements and Large-Signal Model of AlGaN/GaN HEMT
指導教授:成維華成維華引用關係
指導教授(外文):Chieng, Wei-Hua
學位類別:碩士
校院名稱:國立交通大學
系所名稱:機械工程學系
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2011
畢業學年度:100
語文別:中文
論文頁數:74
中文關鍵詞:氮化鎵電晶體等效電路模型電性量測
外文關鍵詞:GaNHEMTtransistorIsSpiceModelElectrical measurements
相關次數:
  • 被引用被引用:3
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  • 下載下載:0
  • 收藏至我的研究室書目清單書目收藏:0
氮化鎵材料本身具有的優秀材料特性,如:高抗熱、高崩潰電壓、高電子飽和速&;#64001;、優秀的壓電效應以及高電&;#63946;密&;#64001;,非常適合應用於高速與高溫操作的環境。本研究的目的,在測量氮化鋁鎵/氮化鎵高載子遷移率電晶體之電性特性與參數,並說明量測方法與討論,包含了載子缺陷效應、阻性與感性負載切換實驗、以及臨限電壓與閘極漏電流量測,以提供電路設計之必要資訊,最後利用IsSpice電路模擬軟體建立其大訊號等效電路模型,便於在電路設計上的修改與模擬。
GaN material has excellent material properties, such as high heat, high breakdown voltage, high electron saturation velocity, excellent piezoelectric effect and high current density, which is very suitable for operating in high-speed and high temperature environment. The purpose of this study is the measurements of AlGaN / GaN high electron mobility transistor's electrical characteristics and parameters, including charge trapping effect, resistive and inductive load switching test, threshold voltage and gate leakage measurements, by describing and discussing the method of these measurements to provide the necessary information for circuit design, and finally model the large-signal equivalent circuit in IsSpice simulation software for circuit design and simulation.
摘要 i
Abstract ii
誌 謝 iii
目錄 iv
圖目錄 viii
表目錄 xii
符號說明 1
第一章 緒論 4
1.1氮化鎵材料特性與應用 4
1.2 研究動機 5
1.3 論文架構 5
第二章 AlGaN/GaN HEMT電性特性量測 7
2.1 功率AlGaN/GaN HEMT簡介 7
2.1.1 AlGaN/GaN HEMT操作原理 7
2.1.2 功率AlGaN/GaN HEMT結構 8
2.2 直流特性分析 8
2.2.1 AlGaN/GaN HEMT熱效應簡介 9
2.3 切換特性分析 9
2.3.1 AlGaN/GaN HEMT缺陷效應簡介 9
2.3.2 缺陷效應實驗與結果 9
第三章 一般功率元件電性參數量測 11
3.1 臨限電壓量測(Threshold voltage measurement) 12
3.1.1 實驗目的 12
3.1.2 實驗儀器 12
3.1.3 實驗原理 12
3.1.4 IRF640實驗步驟 12
3.1.5 EPC1010實驗步驟 13
3.1.6 實驗結果與討論 13
3.2 汲極漏電流量測(Drain to source leakage current measurement) 14
3.2.1 實驗目的 14
3.2.2 實驗儀器 14
3.2.3 實驗原理 14
3.2.4 實驗結果與討論 14
3.3 閘極漏電流量測(Gate leakage current measurement) 15
3.3.1 實驗目的 15
3.3.2 實驗儀器 15
3.3.3 實驗原理 15
3.3.4 實驗結果與討論 15
3.4 阻性負載開關時間量測(Switching time test with resistive load) 15
3.4.1實驗目的 16
3.4.2 實驗儀器 16
3.4.3實驗原理 16
3.4.4 IRF 630實驗步驟 17
3.4.5 EPC1010實驗步驟 17
3.4.6 實驗結果與討論 17
3.5 無箝制感性負載實驗(Unclamped inductive load test) 19
3.5.1 實驗目的 19
3.5.2 實驗儀器 19
3.5.3 實驗原理 20
3.5.4 IRF 630實驗步驟 22
3.5.5 EPC1010實驗步驟 23
3.5.6實驗結果與討論 23
3.6 閘極電荷量測實驗(Gate charge test) 24
3.6.1 實驗目的 25
3.6.2 實驗儀器 25
3.6.3 實驗原理 25
3.6.4 IRF630實驗步驟 26
3.6.5 EPC1010實驗步驟 26
3.6.6 實驗結果與討論 27
第四章 AlGaN/GaN等效電路模型 29
4.1 等效電路模型簡介 29
4.2 建立等效電路模型 30
4.2.1 HEMT大訊號模型 30
4.2.2 Angelov HEMT 實驗經驗模型 32
第五章 結論 35
參考文獻 36
圖片 40
附表 71
[1] Fabio Sacconi, Aldo Di Carlo, P. Lugli, and Hadis Morkoç, “Spontaneous and
Piezoelectric Polarization Effects on the Output Characteristics of AlGaN/GaN Heterojunction Modulation Doped FETs,” IEEE Transactions on electron devices, vol. 48,pp. 450-457, 2001
[2] M.S. Shur and M.A. Kahn, “Wide Band Gap Semiconductors. Good Results and Great Expections”, in the Proceedings of 23d International Symposium on GaAs and Related Compounds, St. Petersburg, Russia, Sep. 22-28, 1996, Institute Phys. Conferrence Series, No.155, Chapter 2, pp. 25-32, M.S. Shur and R. Suris, Editors, IOP Publishing, London 1997.
[3] Michael Howard Willemann”Polymer-Supported Bridges for Multi-Finger AlGaN/GaN Heterojunction Field Effect Transistors (HFETs)” Materials Science and Engineering-VT-masters-2007-09-04
[4] H. Xing, S. Keller, Y-F Wu, L. McCarthy, I. P. Smorchkova, D. Buttaril, R. Coffie, D. S. Green, G. Parish, S. Heikman, L. Shen, N. Zhang, J. J. Xu, B. P. Keller, S. P. DenBaars and U. K. Mishra, “Gallium nitide based transistors” Institute of Physics Publishing Journal of Physics, vol. 13,pp. 7139-7157,2001.
[5] L. Shen, R. Coffie, D. Buttari, S. Heikman, A. Chakraborty, A. Chini, S. Keller, S. P. DenBaars, and U. K. Mishra, “Unpassivated GaN/AlGaN/GaN Power High Electron Mobility Transistors with Dispersion Controlled by Epitaxial Layer Design” Journal of Electronic Materials, vol. 33,pp. 422-425,2004.
[6] EPC1010 datasheet
[7] EPC Application Note “EPC GaN Transistor Parametric Characterization Guide
[8] “Power MOSFET Basics” International Rectifier Application Note
[9] “MOSFET Basics” Fairchild AN9010
[10] IRF630 ST Microelectronics Datasheet
[11] IRF630 Fairchild Datasheet
[12] Anup Bhalla, Fei Wang “High Voltage Power MOSFET switching parameters : Testing Methods for Guaranteeing datasheet limits” ALPHA & OMEGA SEMICONDUCTOR, INC.
[13] Zheng Chen, Dushan Boroyevich, and Rolando Burgos “Experimental Parametric Study of the Parasitic Inductance Influence on MOSFET Switching Characteristics” The 2010 International Power Electronics Conference IEEE
[14] Sungmo Young “Power MOSFET Avalanche Guideline” Fairchild Application Note
[15] ”Single-Pulse Unclamped Inductive Switching: A Rating System” Fairchild Application Note AN-7514
[16] ”Combined Single-Pulse and Repetitive UIS Rating System” Fairchild Application Note AN-7515
[17] ”Practical Aspects of Using PowerMOS Transistors to Drive Inductive Loads” Fairchild Application Note AN-7517
[18] “Power MOSFET avalanche characteristics and ratings” ST Microelectronics Application Note AN2344
[19] ”Use Gate Charge to Design the Gate Driver Circuit for Power MOSFET and IGBTs” International Rectifier Application Note AN-944
[20] Laszlo Balogh “Design And Application Guild For High Speed MOSFET Gate Drive Circuit”
[21] A.J. Yiin, R.D. Schrimpf, and K.F. Galloway “GATE-CHARGE MEASUREMENTS FOR IRRADIATED N-CHANNEL DMOS POWER TRANSISTORS” IEEE TRANSACTIONS ON NUCLEAR SCIENCE, VOL. 38. NO. 6. DECEMBER 1991
[22] Charles Baylis, Lawrence Dunleavy and Rick Connick ‘’Modeling Considerations for GaN HEMT Devices’’2009 IEEE
[23] Pedro M. Cabral, Jose C. Pedro and Nuno B. Carvalho ‘’Nonlinear Device Model of Microwave Power GaN HEMTs for High Power-Amplifier Design’’2004 IEEE
[24] Christian Fager, Jose Carlos Pedro and Nuni Borges de Carvalho ’’Prediction of IMD in LDMOS Transistor Amplifiers Using a New Large-Signal Model’’2002 IEEE
[25] Kelvin S. Yuk, George R. Branner and David J. McQuate “A Wideband Multiharmonic Epirical Large-Signal Model for High-Power GaN HEMTs With Self-Heating and Charge-Trapping Effects”2009 IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 57, NO. 12
[26] I. Angelov and H. Zirath. “New empirical nonlinear model for HEMT devices,”Electron. Lett., vol. 28, no. 2, pp. 140-142, Jan. 1992
[27] I. Angelov, N. Rorsman, J. Stenarson, M. Garcia, and H. Zirath, “An empirical table-based FET model” IEEE Trans. Microw. Theory Tech., vol. 47, no. 12, pp. 2350-2357, Dec. 1999
[28] Jie Deng, Weike Wang, Subrata Halder, Walter. R. Curtice, James C. M. Hwang, Vinod Adivarahan, and M. Asif Khan “Temperature-Dependent RF Large-Signal Model of GaN-Based MOSFETs” IEEE TRANSCTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 56, NO. 12, Dec 2008
[29] I. Angelov, Herbert Zirath and Niklas Rorsman “A New Empirical Nonlinear Model for HEMT and MESFET Devices” IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 40, NO. 12, Dec 1992

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