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研究生:陳盈佑
研究生(外文):Ying-you Chen
論文名稱:有限時域差分法解析高介電層金屬閘製程疊層光柵之繞射效率
論文名稱(外文):Diffraction Analysis of Optical Gratings on HKMG Process Stacks Using FDTD Method
指導教授:郭鴻飛
指導教授(外文):Hung-fei Kuo
口試委員:郭鴻飛
口試日期:2012-07-26
學位類別:碩士
校院名稱:國立臺灣科技大學
系所名稱:自動化及控制研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2012
畢業學年度:100
語文別:中文
論文頁數:79
中文關鍵詞:光學散射量測嚴格耦合波理論分析有限時域差分法高介電層金屬閘
外文關鍵詞:Optical ScatterometryRCWAFDTDHKMG
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在半導體奈米量測自動化設備中,光學散射量測儀被視為取代傳統電子顯微鏡擷取微影圖案關鍵尺寸的重要技術,光學散射量測法的優點包含:量測速度快約為現有電子顯微鏡的三倍,可重複性量測同一微影圖案之關鍵尺寸,而且選擇適當的量測波長不會對形成圖案的光阻產生影響,以及提供三維圖形的資訊。現有光學散射量測儀所採取的計算方式為使用嚴格耦合波演算法來預測關鍵尺寸的大小,這是由於此演算結構易於植入計算機系統並且演算速度快,然而此種演算法瓶頸是無法針對微影圖案位於製程疊層中含有非等向性或是金屬材料層以及孤立線圖案做準確的關鍵尺寸估測。本論文針對最新製程的高介電層金屬閘製程疊層等效於繞射光柵結構分析,探討半導體疊層上線微影圖案的不同週期、製程疊層對於繞射效率敏感度、不同三維參數對於繞射效率影響,且比較使用有限時域差分法與嚴格耦合波理論兩種數值方法所計算的零階與正負壹階繞射效率差異。本論文結論可以做為使用有限時域差分法替代嚴格耦合波演算法之參考依據。
Metrology has been the key to ensure the reliability of high volume manufacturing processes in the semiconductor foundry, including the measurements of the critical dimension (CD), the film thickness, the overlay, the wafer geometry, the surface profiling, and the resistivity. The optical scatterometry instrument is attracting more attention to measure the three dimensional shapes of features on integrated circuits (IC) due to its rapid measurement speed, better repeatability measurement, non-destructive measurement, and complete pattern profile information as compared with the conventional CD-SEM (Critical Dimension Scanning Electron Microscope) tool. The rigorous couple wave analysis (RCWA) technique is currently the most popular algorithm implemented in the optical scatterometry to reconstruct CDs of lithography patterns with the prediction limit for the process stacks containing the anisotropic or the metal layers. In order to solve the issues, this study uses finite difference time domain (FDTD) method as an alternative to RCWA for the CD estimation of the patterns on the stacks with the metal layers. The development steps start from the theoretical calculation of the diffraction response from the high-k metal gate (HKMG) process stacks as one-dimensional optical gratings. The diffraction efficiency of the 0th and 1st order is compared between RCWA and FDTD methods. The numerical results based on the FDTD method to retrieve the sensitivity parameters including the CD, the side wall angle, and the height.
目錄
致謝Ι
中文摘要Ⅱ
AbstractⅢ
目錄Ⅳ
圖目錄Ⅵ
表目錄Ⅹ
第一章 緒論1
1.1 前言1
1.2 文獻回顧7
1.3 研究動機及目的8
1.4 論文架構9
第二章 光學散射量測儀及嚴格耦合波分析10
2.1 整體架構10
2.2 光學散射量測儀結構原理11
2.3 嚴格耦合波分析16
2.4 含金屬材料製程之繞射效率19
第三章 有限時域差分法與分析流程23
3.1 馬克斯威爾方程組與有限時域差分法23
3.2 TE/TM平面波入射數值收斂化測試35
3.3 PML/PBC邊界條件測試比較39
3.4 正向入射/斜向入射分析44
第四章 HKMG光柵模擬分析47
4.1 高介電係數金屬閘極結構47
4.2 不同週期之分析50
4.3 製程疊層敏感度分析52
4.4 不同結構之幾何參數分析58
第五章 結論62
5.1 模擬結果討論62
5.2 研究之貢獻63
5.3 未來展望64
參考文獻65
作者簡介79
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