[1]Nisihhara. H., Y.Handa, T. Suhara, and J. Koyama, “Electron-beam directly written micro gratings for integrated optical circuits,” Proc. SPIE, 239:134, 1980.
[2]Y. Cheng, T. Huang, C.-C. Chieng, “Thick-film lithography using laser write,” Microsystem Technologies 9 (2002) 17–22 _ Springer-Verlag, 2002.
[3]Mackenie J. D. and Ulrich D. R. ed., 1990, 11-13 July, SPIE 1328, Sec. 5-7,San Diego.Ca.
[4]Aegorter M. A., Jafelicci Jr. M., Souza D. F. and Zanotto E. D. ed.,1989,“Sol-gel Science and Technology”,World Scientific,London.
[5]Blodgett K. B., 1939, “Use of Interference to Extinguish Reflection of Light From Glass”, Phy. Rev.55, 391.
[6]Laser and Holography, edited by P. C. Mehta and V. V. Rampal, World Scientific, Singapore, 1993.
[7]Laser and Holography, edited by P. C. Mehta and V. V. Rampal, World Scientific, Singapore, 1993. Chung-Yen Chao, Cheng-Yen Chen, and Cgee-Wee Liu, ”Direct writing of silicon gratings with highly coherent ultraviolet laser,” Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, National Taiwan University, Taipei 116, Taiwan.
[8]簡易光纖通信 黃胤年 編著[9]T. V.Galstyan, B.Saad, M.M.Denariez-Roberge, J.Chem.Phys.,107,22, p9319-9325 , 1997.
[10] hotochemistry and Photophysics, H. Rau, edited by J. F. Rabek, vol 2, p119-141, Boca Raton(1990).
[11]S. J. Clarson, J. A. Semlyen, Siloxance Polymers, 1993
[12]Taechung Yi , Lu Li, Chang-Jin Kim, “Microscale material testing of
single crystalline silicon: process effects on surface morphology and
tensile strength, ” Sensors and Actuators A.83, pp.172-178,2000.