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研究生:鄧兆廷
研究生(外文):Jau-Ting Teng
論文名稱:封閉式磁控直流濺鍍氮化鈦鉻薄膜之磨潤性能
論文名稱(外文):The tribological performance of TiCrN films deposite by closed field magnetron DC sputtering
指導教授:高木榮高木榮引用關係
口試委員:鄧敦平許春耀張合
口試日期:2012-07-13
學位類別:碩士
校院名稱:國立臺北科技大學
系所名稱:車輛工程系所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2012
畢業學年度:100
語文別:中文
論文頁數:73
中文關鍵詞:封閉式磁控直流濺鍍系統氮化鉻氮化鈦鉻磨潤性能
外文關鍵詞:closed field magnetron DC sputteringTiCrNCrNtribological performance
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本研究利用封閉式磁控直流濺鍍系統,以不同鈦鈀及鉻鈀功率將TiCrN鍍膜披覆於SUJ-2軸承鋼上,探討不同鈦含量對於氮化鉻鍍膜性質之影響。在薄膜特性,首先以EDS分析鍍膜成分,SEM以及XRD分析微結構,以維氏硬度儀量測鍍膜之硬度,以洛式壓痕儀檢測其膜之附著性,以Pin-on-disk磨耗試驗機研究其膜之磨潤性能。
本研究結果顯示,TiCrN鍍膜隨著鈦鈀及鉻鈀功率由(Cr:800W,Ti:600W)轉變為(Cr:500W,Ti:800W),鈦含量將由10.82at%增加至26.59%,隨著鈦含量增加,薄膜結晶將變小且更加細緻。當TiCrN鍍膜在鈦鈀功率800W、鉻鈀功率500W、氬氣流量30sccm、氮氣流量30sccm、基板偏壓50W、經過400度熱處理硬度可達Hv150kg734。最後在5kg、4kg、3kg、2kg荷重試驗條件之pin-on disk磨耗試驗中,在鈦含量26.59%TiCrN-2薄膜有最低摩擦係數。


In this study, TiCrN coatings were deposited on SUJ-2 substrate surface from titanium and chromium targets using the closed field magnetron sputtering system. These TiCrN coatings were prepared at various power of titanium and chromium targets. The microstructure of the coatings was analyzed by scanning electron microscopy (SEM) and X-ray Diffraction. EDS was used to measure the composition inside the coatings. The hardness have been characterized by Vickers hardness test machine. Adhesion of coatings to the substrate was assessed using Rockwell hardness test machine. Afterwards the tribological performance of the coatings were tested by pin-on-disk wear apparatus.
The experiment results are shown as following: the contents of Ti increase from 10.82 at.% to 26.59 at.% when changing the power of titanium and chromium targets(form Cr:800W,Ti:600W to Cr:500W,Ti:800W).The grain size has been become smaller and more compact with increasing Ti dopant concentration. Inhibition of Hv150kg of TiCrN coatings at 800W titanium, 500W chromium target power, 30sccm nigrogen flux, 30sccm argon flux and 50W bias with 400° heat treatment is the highest hardness. Finally, difference of experimental conditions by pin-on-disk wear apparatus has the lowest friction coefficient of TiCrN-2 coatings with Ti contents 26.59 at.%.


中文摘要 I
ABSTRACT II
目錄 IV
圖目錄
表目錄 1
第一章 緒論 1
1.1 前言 1
1.2 研究動機與目的 1
第二章 基礎理論與文獻回顧 3
2.1 奈米複合薄膜 3
2.2 磨耗理論 3
2.2.1 磨耗基礎 3
2.2.2 磨耗表面的形式 3
2.3 活塞環 4
2.3.1 活塞環的構造及功用 4
2.3.2 活塞環的製造條件 5
2.2.3 活塞環的磨耗 6
2.2.3.1 活塞環的磨耗因素 6
2.2.3.2 活塞環的磨耗種類 6
2.4 濺鍍理論 7
2.4.1 直流濺鍍原理 7
2.4.2 電漿原理 7
2.4.3 輝光放電 8
2.4.4 真空系統 10
2.4.5 基礎濺鍍理論 10
2.4.6 二極式直流濺鍍系統 12
2.4.7 磁控濺鍍系統 14
2.5 薄膜沉積理論 15
2.5.1 薄膜成長過程 15
2.5.2 鍍層微結構 17
2.6 薄膜細化強化理論 18
第三章 實驗方法與儀器設備 20
3.1 實驗設計與流程 20
3.2 濺鍍系統製程參數 22
3.3 實驗材料 24
3.3.1 鈀材 24
3.3.2 基板 25
3.3.3 工作氣體 25
3.4 濺鍍系統 25
3.5 濺鍍實驗步驟 28
3.5.1 基板前處理 28
3.5.2 濺鍍前基板表面處理步驟 29
3.5.3 薄膜濺鍍步驟 30
3.6 鍍層分析與量測 31
3.6.1 膜厚量測 31
3.6.2 薄膜結構分析 32
3.6.3 表面粗糙度檢測 33
3.6.4 薄膜表面分析 33
3.6.5 薄膜附著性分析 34
3.7 磨耗試驗機系統架構 34
3.7.1 磨耗試驗平台規格 35
3.7.2 測試油品與試片規格 36
3.7.3 實驗參數設定與定義 37
3.7.4 磨耗實驗流程 38
第四章 結果與討論 40
4.1 鍍膜特性分析 40
4.1.1 氮化鉻與氮化鈦鉻薄膜形貌觀察 40
4.1.2 氮化鉻與氮化鈦鉻薄膜EDS檢測 44
4.1.3 鍍膜膜厚分析 46
4.1.4 氮化鉻與氮化鈦鉻薄膜結構分析 47
4.1.5 鍍膜附著力分析 49
4.1.6 表面硬度分析 50
4.2 鍍膜磨耗特性分析 53
4.2.1 Pin-On-Disk鍍膜磨耗分析 53
4.2.2 鍍膜磨耗表面分析 58
4.2.3 鋼球磨疤直徑分析 64
第五章 結論 70
參考文獻 72


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