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研究生:許葦亭
研究生(外文):Wei-Ting Hsu
論文名稱:磁控濺鍍法製備釔安定氧化鋯固態氧化物燃料電池電解質薄膜之研究
論文名稱(外文):Fabrication and Characterization of Yttria Stabilized Zirconia Oxide SOFC Electrolytes Thin Film Deposited by RF Magnetron Sputtering
指導教授:王錫福
口試委員:吳玉娟黃啟原陳三元徐永富
口試日期:2012-07-11
學位類別:碩士
校院名稱:國立臺北科技大學
系所名稱:材料及資源工程系研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2012
畢業學年度:100
語文別:中文
論文頁數:79
中文關鍵詞:釔安定氧化鋯、固態氧化物燃料電池、射頻磁控濺鍍
外文關鍵詞:YSZsolid oxide fuel cellRF magnetron sputtering
相關次數:
  • 被引用被引用:3
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  • 下載下載:33
  • 收藏至我的研究室書目清單書目收藏:0
本研究是利用射頻磁控濺鍍法的薄膜鍍層技術來製備高緻密性、成份均勻的釔安定氧化鋯高溫固態電解質薄膜。以8 mole%的氧化釔(Y2O3)添加氧化鋯(ZrO2)作為濺鍍靶材,進行YSZ電解質薄膜的鍍膜製程。在工作壓力為10 mTorr,Ar:O2 = 30:1 sccm氣氛下,可以發現當基板溫度在300oC進行濺鍍,可得到最緻密之薄膜。
接著藉由不同的鍍膜時間製備出不同厚度(1.8~10.5 ?m)的YSZ電解質薄膜於NiO-SDC陽極上,最後以網印法製備LSM/YSZ陰極於YSZ電解質層上,完成單元電池之製備。結果發現,當薄膜厚度為1.8 ?m和10.5 ?m時,應用溫度於800°C所得到的開路電壓為0.96 和0.88 V,最大電功率密度分別為0.67 和0.19 W/cm2,而歐姆阻抗為0.12、0.69 Ω•cm2,極化阻抗為0.19、0.44 Ω•cm2,由結果可以發現電解質厚度為1.8 ?m受到極化阻抗影響較歐姆阻抗大且有最佳之電性。


In this study, electrolyte of Yttria-stabilized Zirconia (YSZ) films was prepared on NiO-SDC anode substrate by magnetron RF sputtering at oxygen and argon atmosphere. Various thicknesses of electrolyte films ranging from 1.8 ?m to 10.5 ?m were deposited at a substrate temperature of 300°C and an atmosphere of 30 sccm Ar and 1 sccm O2. It was found that the cell performances of the single cells are strongly dependent on the thickness of the electrolyte layer. For instance, the open circuit voltage and maximum power density of single cell with 1.8 ?m YSZ electrolyte at 800°C were 0.96 V and 0.67 W/cm2, respectively, while 0.88 V and 0.19 W/cm2 for 10.5 ?m YSZ film. The thickness effects of various electrolyte films on the electrochemical performances of SOFC cells were compared and discussed in term of the conduction nature of the electrolyte films.

摘要 i
ABSTRACT ii
誌謝 iii
目錄 iv
表目錄 vi
圖目錄 vii
第一章 緒論 1
1.1前言 1
1.2研究動機 2
1.3研究目的 3
第二章 基礎理論及文獻回顧 4
2.1 固態氧化物燃料電池 4
2.1.1 固態氧化物燃料電池運作原理 4
2.1.2 固態電解質材料 5
2.1.3 固態氧化物燃料電池操作之極化損失現象 7
2.2 薄膜成長 8
2.2.1 RF功率對薄膜性質的影響 8
2.2.2 基板溫度對薄膜性質的影響 9
2.2.3 退火溫度對薄膜性質的影響 12
2.2.4 偏壓對薄膜性質的影響 14
2.2.5 影響薄膜之附著性 15
2.3以薄膜技術製備YSZ固態電解質 16
2.3.1 電泳沉積法(Electrophoretic Deposition) 16
2.3.2 網印法(Screen printing) 19
2.3.3 旋轉塗佈(Spin coating) 20
2.3.4 脈衝雷射沉積法(pulse laser deposition) 22
2.3.5 浸鍍法(Dip-coating) 23
2.3.6 濺鍍法(sputtering) 23
2.4 YSZ電解質薄膜之電性 27
第三章 實驗方法及步驟 30
3.1實驗材料 30
3.2 實驗流程 31
3.2.1 靶材製備 31
3.2.2 鍍膜步驟及參數 32
3.3 實驗設備 35
3.3.1 射頻磁控濺鍍機 35
3.3.2 快速熱退火爐 37
3.3.3 網印機 37
3.4 分析儀器 38
3.4.1 X射線繞射儀(XRD) 38
3.4.2 掃描式電子顯微鏡(FE-SEM) 39
3.4.3 表面輪廓儀 40
3.4.4 刮痕試驗儀 40
3.4.5 電化學量測設備與高溫量測儀器 41
第四章 結果與討論 43
4.1 起始粉末物理性質分析 43
4.1.1 釔安定氧化鋯之性質分析 43
4.1.2 靶材之性質分析 45
4.2 製程參數對沉積釔安定氧化鋯薄膜於陽極基板之影響 46
4.2.1 基板溫度對電解質薄膜之影響 46
4.2.2 濺射功率對電解質薄膜之影響 49
4.2.3 熱處理對電解質薄膜之影響 54
4.2.4 製程時間對電解質薄膜之影響 56
4.2.5 固態氧化物燃料電池製作與電性量測 66
第五章 結論 72
參考文獻 73



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