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研究生:李俊毅
研究生(外文):Chun-I Lee
論文名稱:以直流脈衝電漿化學氣相沉積法蒸鍍DLC薄膜於氮氧化處理AISI H13工具鋼之研究
論文名稱(外文):Study on the DC-Pulsed Plasma Chemical Vapor Deposition Coating DLC Films of the Oxynitriding-treated AISI H13 Tool Steel
指導教授:張世賢張世賢引用關係
口試委員:黃國聰劉沖明唐自標
口試日期:2012-06-26
學位類別:碩士
校院名稱:國立臺北科技大學
系所名稱:材料及資源工程系研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2012
畢業學年度:100
語文別:中文
論文頁數:71
中文關鍵詞:氮氧化處理氮氧化/類鑽碳膜複合表面處理AISI H13工具鋼直流脈衝電漿化學沉積法磨耗
外文關鍵詞:OxynitridingOxynitriding/DLC Duplex TreatmentAISI H13 Tool SteelsDC-pulsed plasma CVDWear
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  • 被引用被引用:1
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表面處理通常被應用於改善工具的使用壽命;類鑽碳膜(DLC)具有很多優越的性質,例如:高硬度、高磨耗阻抗、低磨擦係數及化學鈍性等等。氮氧化製程是在氮化完成的最後階段,利用空氣或水蒸氣處理,其利用水蒸氣為介質是一個整體性的重要步驟。氧化處理期間,大多數鋼材表面會形成各種不同的氧化物(Fe2O3及Fe3O4);一般而言,氧化處理後的Fe3O4氧化層,可以有效防止並改善鋼鐵的耐侵蝕性與耐腐蝕性。因此,本實驗利用氮氧化/類鑽碳膜複合處理於AISI H13工具鋼上,嘗試利用此一表面處理方法來增加工具鋼之使用壽命。
本研究中,使用直流脈衝電漿化學沉積法,沉積類鑽碳膜(DLC)於氮氧化處理後之AISI H13工具鋼上;為了探討DLC薄膜的品質,我們將利用拉曼分析、磨耗測試、附著性測試以及硬度測試等,來檢測其性質。主要探討的直流脈衝電漿化學參數,包括脈衝電壓、氬氣前處理以及基材溫度。
實驗結果顯示,氮氧化層深度可達0.05-0.06 mm,可以成功地在氮氧化處理後的試片上沉積1-2 μm的類鑽碳膜。而在脈衝電壓-1.5 kV、氬氣電漿前處理15分鐘以及基材溫度50°C時,所層積的類鑽碳膜具有較佳之性質。同時氮氧化/類鑽碳膜複合表面處理後,表面硬度可達最高之Hv0.01 1457、最低之磨耗體積損失量2.25 × 10-3 mm3以及較低的磨擦係數0.06。


A surface treatment is usually used to improve tool life. DLC has many superior properties, such as high mechanical hardness, high wear resistance, a low friction coefficient and chemical inertness. The oxynitriding process uses air or steam at the end of the nitriding stage as an oxidizing medium, which is an integral part of the treatment. During the oxidation process, most steels can form several kinds of oxides (Fe2O3 and Fe3O4). Generally, the Fe3O4 layer of the oxidation treatment can effectively protect and improve the erosion and corrosion resistance of steels. Therefore, the oxynitriding/DLC duplex treatment was utilized for treating AISI H13 tool steel in an attempt to increase tool life.
In this study, the diamond-like carbon films were prepared by DC-pulsed plasma CVD after the oxynitride treatment of AISI H13 tool steel. In order to investigate the DLC films properties, Raman spectroscopy analysis, wear test, adhesion and hardness tests were performed. The study of the parameters of DC-pulsed plasma CVD process included the pulsed voltage, pre-treatment of argon gas and the substrate temperature.
The experimental results showed that a 0.05-0.06 mm oxynitride layer and 1-2 μm of DLC thin film could be obtained after the oxynitride/DLC duplex treatment. The duplex coating layers had the optimal properties when treated by a low pulse voltage (-1.5 kV), pre-treatment of argon gas for 15 min and the substrate kept at a 50°C condition. Meanwhile, the oxynitride/DLC duplex treatments possessed the highest surface hardness (Hv0.01 1457), lowest wear volume (2.25 × 10-3 mm3) and lower friction coefficient (0.06).


摘 要 i
ABSTRACT iii
誌謝 v
目錄 vi
表目錄 ix
圖目錄 x
第一章 緒論 1
1.1 前言 1
1.2 研究目的與動機 1
1.3 研究簡介 2
第二章 文獻回顧 3
2.1 合金工具鋼 3
2.2 表面處理工程 3
2.2.1 氮化、氧化處理及氮氧化處理(ONCR) 4
2.2.1.1 鹽浴氮化(Salt-Bath Nitriding) 7
2.2.1.2 Tufftride鹽浴軟氮化法 8
2.2.1.3 離子氮化法 8
2.2.1.4 氣體氮化法 10
2.2.1.5氣體氮氧化(ONCR) 10
2.3 DLC薄膜基本特性 12
2.4 DLC薄膜製程方法 12
2.5 電漿前處理效應 16
2.6 金屬磨耗理論 20
第三章 研究方法 22
3.1 實驗規劃與步驟 22
3.1.1試片準備 23
3.1.2 氮氧化(ONCR)表面處理 24
3.1.3 直流脈衝電漿化學氣相沉積 25
3.1.4 表面硬度量測 26
3.1.5 X-ray 繞射分析 27
3.1.6 金相顯微結構觀察 28
3.1.7 SEM顯微結構及成分分析 28
3.1.8 拉曼光譜分析(Raman Spectroscopy Analysis) 29
3.1.9 刮痕實驗(Scratch Test) 31
3.1.10 磨耗試驗(Wear Test) 32
3.1.11 表面粗糙度測試(Roughness Test) 33
第四章 結果與討論 35
4.1 氮氧化處理基本性質分析 35
4.1.1 顯微組織觀察 35
4.1.2 XRD分析 36
4.1.3 表面硬度量測 37
4.2 第一部分-脈衝電壓對於類鑽碳膜之影響 38
4.2.1 第一部分拉曼光譜分析 38
4.2.2 第一部分刮痕測試 40
4.3 第二部分氬氣電漿處理對於類鑽碳膜之影響 42
4.3.1 第二部分拉曼光譜分析 42
4.3.2 第二部分刮痕測試 45
4.3.3 第二部分磨耗測試 47
4.4 第三部分基材溫度對於類鑽碳膜之影響 51
4.4.1 第三部分拉曼光譜分析 51
4.4.2 第三部分刮痕測試 53
4.4.3 第三部分磨耗試驗 55
4.5 類鑽碳膜比較 60
4.5.1 薄膜厚度比較 60
4.5.2 硬度比較 62
4.5.3刮痕測試比較 62
4.5.4 磨耗性質比較 64
第五章 結論 68
參考文獻 69


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