臺灣博碩士論文加值系統

本論文研製之近期開發的L11 CoPt薄膜因具有與L10 FePt薄膜相似的垂直磁晶異向能(Ku ~ 107 erg/cm3)，且可在低溫製備(約250 ℃)，因此開始被重視。但目前為止，此結構的缺點除矯頑磁力(Hc)無法有效被提升外，還需成長在單晶的MgO基板上，造成應用上的困難。因此本實驗將利用磁控濺鍍的方式在玻璃基板上鍍製L11 CoPtM薄膜，其中M為第三元素Cu與Ru，探討不同成分的Cu或Ru添加、改變膜厚和退火溫度對L11 CoPtCu薄膜磁性質的影響。
結果發現銅添加到23 ~ 26 at.%有良好的磁性質，再搭配膜厚的改變後，在4 nm時有最高的Hc (~ 2.7 kOe)，但隨著膜厚的增加，其Hc會緩慢地下降，到40 nm時其Hc還維持在2 kOe以上。與過去L11 CoPt相關的研究比較，除了Hc被提升外，我們還發現在膜厚減少的同時Hc反而會上升，這跟先前以MgO(111)為基板的結果相反。因此添加Cu能有效地改善L11 CoPt薄膜的性質，增加的Hc，更可以用玻璃基板取代MgO基板，減少基板的成本，也因此增加L11 CoPt薄膜在磁記錄工業的應用性。
而添加Ru則會破壞L11 CoPt的結構，因此隨著Ru的添加量上升，飽和磁化量下降，角型比變差，Hc也跟著下降，造成磁性質不好。
本研究成功的以第三元素(Cu)添加，將L11 CoPt 薄膜鍍製於玻璃基板上，同時藉由插入Pt底層和改變底層與磁性層的參數大幅度提升L11 CoPt 薄膜的磁性質，本研究的結果可做為未來L11 CoPt 薄膜在磁記錄媒體上的應用參考。

Rcently, L11 CoPt thin films have attracted much attention for their potential application in advanced magnetic recording media because of high magnetocrystalline anisotropy energy (Ku ~ 107 erg/cm3), similar to the L10 FePt. However, the small coercivity (Hc) and high cost single crystal substrates of L11 CoPt thin film are required to be further improved. Therefore, the Co50−xMxPt50 films were magnetron co-sputtered on glass substrates, as well as investigate the film properties with different copper and ruthenium content, and further discuss the film thickness and annealing temperature.
Our results shows that high magnetic properties were obtained for the films with Cu = 23~26 at.%. When futher study the CoPt film thickness, Hc has a maximum value of 2.7 kOe at t = 4 nm, and then slightly drops (~ 2 kOe) at t = 40 nm. This result is opposite of the properties in the issues of previous investigations on L11 CoCuPt sputtered on MgO(111) substrate. On the other hand, the magnetic properties of the film are decreased becauase the Ru destroys the L11 structure.
The results demonstrate that replacing Co with Cu effectively increases the perpendicular magnetic properties of L11 CoPt phase, and MgO(111) substrate can be replaced by the glass substrate to reduce the cost, which largely increase the potential of L11 films for application in perpendicular magnetic media and advance spintronic device.

摘要 I
Abstract II
致謝 III
目錄 IV
表目錄 VII
圖目錄 VIII
符號說明 XII
第一章 前言 1
第二章 理論基礎與文獻回顧 6
2-1 磁性來源 6
2-2 磁性物質 6
2-2-1磁滯迴路(Hysteresis loop) 6
2-2-2磁異相姓簡介 7
2-2-3超順磁效應 7
2-3 文獻回顧 8
2-3-1 磁記錄材料 8
2-3-2 鈷鉑合金的介穩態(meta-stable state)－L11相 11
2-3-3
第三章 實驗方法、步驟與 23
3-1 試片製作 23
3-1-1實驗裝置 23
3-1-2基板準備 25
3-1-3靶材 25
3-1-4實驗方法 25
3-2 試片分析儀器介紹 25
3-2-1薄膜膜厚分析 25
3-2-2晶相結構分析 26
3-2-3磁性質分析 28
3-2-4微結構分析 31
第四章 結果與討論 33
4-1 Cu取代Co對於L11-CoPt的影響 34
4-1-1磁性質分析 34
4-2 插入Pt(111)(20 nm)底層對於L11-CoPtCu薄膜的影響 37
4-2-2結晶結構分析 41
4-3 Co50-xCuxPt50(20 nm)/glass 與Co50-xCuxPt50(20 nm)/Pt(111)(20 nm)/glass 比較 42
4-4 改變磁性層厚度對於L11-CoPtCu薄膜的影響 45
4-4-2磁性質分析 47
4-5 最佳磁性層厚度條件下Cu取代Co對於L11-CoPt的影響 50
4-5-1磁性質分析 50
4-6 最佳磁性層條件下改變底層參數對於L11-Co27Cu23Pt50的影響53
4-6-1磁性質分析 53
4-7 探討臨場退火溫度對於最佳化的L11-CoPtCu薄膜的影響
4-7-1磁性質分析 57
4-7-2結晶結構分析 60
4-8 添加Cu對於L11-CoPt表面形貌的影響 61
4-8-1掃描式電子顯微鏡的影像分析 61
4-9添加Cu在L11-CoPt的磁力顯微鏡的影像分析 66
4-10 添加Cu在L11-CoPt的穿隧式電子顯微鏡影像 68
4-11添加Cu在L11-CoPt的熱穩定性分析 72
4-12 Ru取代Co對於L11-CoPt的影響 73
4-12-1磁性質分析 73
4-12-2結晶結構分析 76
4-12-3添加Ru對於L11-CoPt表面形貌的影響 77
第五章 結論 78
參考文獻 80
附錄 相關國際期刊發表 84

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