臺灣博碩士論文加值系統

本論文使用有限差分時域法(FDTD)光學模擬軟體，在SOI基板上蝕刻出一套有系統變化的漸變蝕刻光柵，整套模擬分為未含DBR結構及含DBR結構兩大類，然後又分成相同結構參數變化的各五組(Case 1~102)進行探討。上述兩大類的最佳結果，分別是未含DBR Case 47(Lge中光柵蝕刻深度的順序為16 nm, 32 nm, 48 nm, 80nm)經MOST 13最佳化模擬加上DBR結構，其光纖耦合效率為84%，1 dB頻寬為68 nm及含DBR Case 16(Lge中光柵蝕刻深度的順序為20 nm, 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, 80 nm)的MOST 10結構，其光纖耦合效率為85%，1 dB頻寬為62 nm。

另一方面，本文亦進行多晶矽二進制閃耀光柵耦合器的評估設計，在入射光波長1.55 μm下，其光纖耦合效率為40%，1 dB頻寬為 17 nm，而在波長1.557 μm時的光纖耦合效率為60%。

關鍵詞:SOI基板、光柵耦合器、光纖耦合效率、漸變蝕刻區域和二進制閃耀光柵

In this thesis, we used finite-difference time-domain (FDTD) optical simulation software to systematically design a gradually etched grating on the SOI substrate. The entire simulation contained a structure with and without DBR. The discussion was divided into two categories and five groups (case 1~102) with the same structural parameters. Among these simulations, the fiber coupling efficiency and the 1 dB bandwidth changed differently and the center wavelength would swift to longer or shorter wavelength. The best results for the above two categories was case 47 without DBR (The sequence of etched grating depth in Lge was 16 nm, 32 nm, 48 nm and 80nm) after MOST 13 optimum simulation and addition of DBR structure. Its fiber coupling efficiency was 84% and 1 dB bandwidth was 68 nm as well as the case 16 with DBR (The sequence of etched grating depth in Lge was 20 nm, 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, and 80 nm) after MOST 10 optimum simulation. Its optical coupling efficiency was 85%, and 1 dB bandwidth was 62 nm.

On the other hand, we also evaluated and designed binary blazed grating based on poly-silicon. For the incident light with the wavelength of 1.55 μm, the optical coupling efficiency was 40%, and 1 dB bandwidth was 17 nm. In addition, for the wavelength of 1.557 μm, the fiber coupling efficiency was 60%.

Keywords: SOI substrate, grating couplers, fiber coupling efficiency, gradually etched region and binary blazed grating

第一章 緒論 1
1.1 前言 1
1.2 文獻回顧 2
1.3 研究動機與目的 10
1.4 論文架構 10
第二章 原理介紹 11
2.1 光柵原理 11
2.2 光柵耦合器原理 12
第三章 具有漸變蝕刻深度的高效率均勻光柵耦合器系統化設計 16
3.1 設計內容 16
3.2 結果與討論 19
3.2.1 未含分散式布拉格反射鏡結構之元件設計 19
3.2.1.1 漸變蝕刻區域斜率改變結構之模擬結果 19
3.2.1.2 漸變蝕刻區域逐次往右減少一個週期結構之模擬結 20
果 20
3.2.1.3 漸變蝕刻區域逐次往左減少一個週期結構之模擬結果 22
3.2.1.4 漸變蝕刻區域逐次往右填滿一個週期結構之模擬結果 23
3.2.1.5 漸變蝕刻區域逐次往左填滿一個週期結構之模擬結果 25
3.2.1.6 元件設計最終結果及最佳化 26
3.2.2 含分散式布拉格反射鏡結構之元件設計 33
3.2.2.1 漸變蝕刻區域斜率改變結構之模擬結果 33
3.2.2.2 漸變蝕刻區域逐次往右減少一個週期結構之模擬結果 34
3.2.2.3 漸變蝕刻區域逐次往左減少一個週期結構之模擬結果 36
3.2.2.4 漸變蝕刻區域逐次往右填滿一個週期結構之模擬結果 38
3.2.2.5 漸變蝕刻區域逐次往左減填滿一個週期結構之模擬結果 39
3.2.2.6 元件設計最終結果及最佳化 41
第四章 具完全蝕刻的多晶矽二進制閃耀光柵耦合器設計 46
4.1 設計內容 46
4.2 結果與討論 48
第五章 結論與未來研究方向 49
附錄 50
1. 有限差分時域法(FDTD)光學模擬軟體使用介紹 50
2. 遺傳基因演算法(MOST)最佳化模擬軟體使用介紹 67
3. 改善FDTD光學模擬軟體中元件模擬頻寬過大的問題 70
4. 完成之前未含分散式布拉格反射鏡之非均勻光柵耦合器未完成的MOST最佳化 72
參考文獻 78

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