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研究生:卓逸誠
研究生(外文):Yi-Cheng Cho
論文名稱:利用脈衝磁控濺射製備可撓式電致色變薄膜特性研究
論文名稱(外文):Investigation of the Flexible Electrochromic Thin Film by Pulse Magnetron Sputter Process
指導教授:黃俊杰黃俊杰引用關係翁克偉
指導教授(外文):Jung-Jie HuangKo-Wei Weng
口試委員:趙慶勳
口試委員(外文):Ching-Hsun Chao
口試日期:2013-06-11
學位類別:碩士
校院名稱:明道大學
系所名稱:材料科學與工程學系碩士班
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2013
畢業學年度:101
語文別:中文
論文頁數:75
中文關鍵詞:電致色變磁控濺射三氧化鎢
外文關鍵詞:electrochromicmagnetron sputtertungsten trioxide
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電致色變薄膜是現在被廣泛使用於建築窗戶,更可以延伸應用於光學用品、交通工具及各類數位顯示器。這些都以玻璃作為基板居多,雖然玻璃具有較高穿透度、高耐熱與耐化學藥品等特性,但易碎、笨重且不易彎曲等缺點致使其未來發展受限。軟性塑膠基板克服了玻璃所衍生的問題。
本研究利用脈衝磁控濺射濺鍍氧化鎢鈦薄膜於ITO/PET基材上。藉由改變脈衝功率、製程壓力探討對氧化鎢鈦薄膜的影響並得最佳參數。
研究結果顯示:藉由XRD分析氧化鎢鈦薄膜均為非晶結構。從SEM的表面分析,當功率增加氧化鎢鈦薄膜顆粒尺寸也會增加。XPS分析結果,氧化鎢鈦薄膜中有低價數的W+4價存在所以容易造成薄膜著色不均。從W4f 面積分析中,當功率增加時薄膜以高價數W+5價存在而使穿透率提高。在光學分析中氧化鎢鈦薄膜最佳參數工作壓力10 mTorr功率250 W下紅外光波段穿透率變化為64.83 %。

Electrochromic films were used popularly for building window, optical goods, conveyance and liquid crystal displays. These productions were used the glass substrate mostly. Glass substrate has most high transmittance, heat-resistant and chemical resistance. But its disadvantages are easily broken, heavy and not easy to bend. Therefore, it limits its applications. The flexible substrate can overcome the problem of the glass.
In this study, tungsten titanium oxide film was deposited on ITO /PET substrate by using pulse magnetron sputter deposition. The optimum parameter was obtained by changing the pulse power, working pressure.
The experimental results show that the amorphous structure by XRD analysis of tungsten titanium oxide film. From the SEM of the surface analysis, as pulsed power increase the grain size increase of tungsten titanium oxide film. XPS results showed that large number of W+4 ions are included in oxide tungsten titanium film so easy for cause the the film colored was not completely. From the W4f area observed as pulsed power increase can get high price tungsten ions let transmittance increase. In the optics analysis, the tungsten titanium oxide film in the pressure 10 mTorr pulsed power 250W the optimum parameter have transmittance variation in infrared light wave 64.83 %.

中文摘要 i
英文摘要 ii
目錄 iii
圖目錄 v
表目錄 viii
第一章 緒論 1
1-1 前言 1
1-2 研究動機與目的 5
第二章 文獻回顧 6
2-1 電致色變簡介 6
2-2 電致色變材料 7
2-3 氧化鎢鈦薄膜電致色變機制 10
2-4 變色玻璃種類 14
2-4-1 光致色變玻璃 14
2-4-2 熱致色變玻璃 14
2-4-3 電調控玻璃 15
2-5 氧化鎢鈦結構 17
2-6 電致色變元件 18
2-7 濺鍍技術 20
2-7-1 濺鍍原理 20
2-7-2 磁控濺鍍 21
2-7-3 脈衝電源供應器 23
2-7-4 薄膜沉積機制 24
2-7-5 薄膜成長理論 26
第三章 實驗部分 28
3-1  實驗目的 28
3-1-1 實驗流程 28
3-1-2 試片前處理 29
3-1-3 氧化鎢鈦薄膜製備方法 29
3-2  實驗設備 32
3-2-1 製程設備 32
3-2-2 電化學反應 34
3-3 薄膜分析與檢測 35
3-3-1 掃描式電子顯微鏡 (SEM) 36
3-3-2 X-ray 繞射分析 (XRD) 37
3-3-3 紫外光/可見光光譜分析儀 (UV/Vis Spectrophptometer) 38
3-3-4 X光光電子譜儀分析 (ESCA) 40
第四章 結果與討論 41
4-1 不同功率對氧化鎢鈦薄膜性質影響 41
4-1-1氧化鎢鈦薄膜FE-SEM表面形貌與截面分析 41
4-1-2氧化鎢鈦薄膜XRD結晶結構分析 45
4-1-3 氧化鎢鈦薄膜之電化學與光學性質 46
4-1-4 氧化鎢鈦薄膜之XPS表面鍵結分析 53
4-2 不同壓力對氧化鎢鈦薄膜性質影響 56
4-2-1氧化鎢鈦薄膜FE-SEM表面形貌與截面分析 56
4-2-2氧化鎢鈦薄膜XRD結晶結構分析 60
4-2-3 氧化鎢鈦薄膜之電化學與光學性質 61
4-2-4 氧化鎢鈦薄膜之XPS表面鍵結分析 68
第五章 結論 70
參考文獻 72

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