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研究生:許騰元
研究生(外文):Teng-Yuan Hsu
論文名稱:利用軟微影技術製作可熱調控分佈式回饋雷射
論文名稱(外文):Thermally controllable distributed feedback laserbased on soft lithography technique
指導教授:郭啟東
指導教授(外文):Chie-Tong Kuo
學位類別:碩士
校院名稱:國立中山大學
系所名稱:物理學系研究所
學門:自然科學學門
學類:物理學類
論文種類:學術論文
論文出版年:2013
畢業學年度:102
語文別:中文
論文頁數:97
中文關鍵詞:分佈回饋雷射調控波長液晶軟微影法全像干涉法
外文關鍵詞:wavelength tunableDFB laserholographic methodLiquid crystalsoft lithography
相關次數:
  • 被引用被引用:2
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  • 下載下載:18
  • 收藏至我的研究室書目清單書目收藏:0
本論文利用軟微影法製作可熱調控波長之分佈式回饋雷射。利用全像干涉法於光阻層上製作次微米等級之光柵結構,接著經由軟性材料聚二甲基矽氧烷(PDMS)複製,將週期360nm的光柵結構轉移至可光聚合薄膜上並形成波導批覆層。本實驗利用雷射染料摻雜向列型液晶做為分佈式回饋雷射中之主動波導層,並藉由溫度控制液晶折射率變化,進而達成調控雷射輸出波長之目的。實驗結果顯示,在逐步升溫的過程中,二階雷射波長由原本的625.1nm藍移至606.35nm。
This study demonstrates a thermally tunable distributed feedback (DFB) laser fabricated by soft lithography method. The sub-micronmeter grating was patterned onto photoresist layer by using the holographic method. In this study, the grating pattern with period of 360nm was transfer to cladding layer of the laser device via the soft stamp Polydimethylsiloxane (PDMS). The nematic liquid crystal (NLC) was adopted as a guiding layer and the refractive index can be tuned by thermal source. By increasing the temperature of the NLC guiding layer, the wavelength of the second order DFB laser was shifted from 625.1 nm to 606.35 nm.
論文審定書 i
致  謝 ii
摘  要 iii
Abstract iv
圖  次 ix
表  次 xvi
第一章 緒論 1
第二章 簡介 2
2.1 分佈式回饋雷射簡介 2
2.2 液晶介紹 4
2.1.1 液晶發現 [20, 21] 4
2.1.2 液晶分類 [21] 5
2.3 液晶物理 8
2.2.1 液晶分子秩序參數 8
2.2.2 液晶分子介電常數 9
2.2.3 液晶分子折射異向性與雙折射性 10
2.2.4 液晶的彈性係數 12
2.2.5 液晶折射率與溫度關係 13
第三章 分佈式回饋雷射相關理論 15
3.1 雷射機制 15
3.2 分佈式回饋雷射機制 18
3.3 相關理論 19
3.3.1 Bragg繞射(Bragg Scattering) 19
3.3.2 繞射光柵( Diffraction Grating ) 20
3.3.3 耦合波理論( Coupling Wave Theory ) 21
3.3.4 波導理論( Waveguide Theory ) [25] 23
第四章 儀器製作與實驗架設 28
4.1 材料介紹 28
4.1.1 液晶材料 HTW114200 28
4.1.2 液晶材料 E7 29
4.1.3 光阻劑 29
4.1.4 雷射染料 DCM 30
4.1.5 聚二甲基矽氧烷( Polydimethylsiloxane, PDMS ) 31
4.1.6 NOA81薄膜 32
4.2 樣品製作 33
4.2.1 清洗ITO玻璃 33
4.2.2 清洗矽基板 33
4.2.3 光學微影製作微結構之步驟 33
4.2.4 PDMS製作 34
4.2.5 NOA81翻模 35
4.2.6 樣品組裝 35
4.3 量測系統與原理介紹 36
4.3.1 掃描式電子顯微鏡( Scanning Electron Microscope, SEM ) 36
4.3.2 原子力顯微鏡( Atomic Force Microscope, AFM ) 37
4.3.3 三為輪廓儀( 3D alpha-Step Profilometer ) 38
4.4 實驗光路架設 38
第五章 實驗結果與討論 40
5.1 模仁脫模效果探討 40
5.2 NOA81薄膜摻雜雷射染料DCM之DFB雷射研究 44
5.2.1 DFB雷射輸出特性 44
5.2.2 DFB雷射輸出的偏振性 48
5.3 雷射染料DCM摻雜液晶薄膜之DFB雷射研究 49
5.3.1 液晶材料 - HTW114200 49
5.3.2 液晶材料 - E7 63
第六章 總結與未來展望 76
6.1 總結 76
6.2 未來展望 77
參 考 文 獻 78
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