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研究生:林政賢
研究生(外文):Cheng-Hsien Lin
論文名稱:表面電漿共振奈米金屬薄膜線上即時監測系統
論文名稱(外文):Metallic nano thin films in-situ and real-time deposition monitoring based on fiber surface plasmon resonance
指導教授:蔡五湖
指導教授(外文):Woo-Hu Tsai
口試委員:蔡五湖
口試委員(外文):Woo-Hu Tsai
口試日期:2015-07-21
學位類別:碩士
校院名稱:大同大學
系所名稱:光電工程研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2015
畢業學年度:103
語文別:中文
論文頁數:78
中文關鍵詞:即時膜厚監測表面電漿共振鎳薄膜光纖感測器折射率
外文關鍵詞:Index of refractionIn-situ and real-timeSurface plasmon resonance (SPR)Optical fiber sensorNi metallic thickness
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本論文利用表面電漿共振光纖感測器之技術,設計出新的腔內即時奈米鎳薄膜沉積之厚度監測系統。此表面電漿共振光纖即時監測系統具有低成本、簡單可靠、高靈敏、無電磁干擾等優點。我們可以利用白光光源和適當波長之雷射光束進行即時監測沉積鎳奈米薄膜膜厚。此即時監測鍍膜系統可建立在真空腔體的濺鍍系統內,不受腔體內射頻輻射的干擾,也不會影響腔體內鍍膜參數穩定性。我們發現,在真空腔體內,即時量測鍍鎳薄膜膜厚的響應變化,白光光頻譜分析儀上分析得出在830 nm波長處白光的歸一強度隨膜厚變化的斜率為-3.77×10-3 a.u / nm,而使用830 nm雷射,可得到光穿透率膜厚變化的斜率則為-1.92×10-6 W / nm。
由本研究的成果可知,除鎳奈米薄膜以外,此實驗系統也可以應用在對其他金屬薄膜的沉積進行即時的厚度監測。
In this thesis, an optical fiber sensor based on surface plasmon resonance (SPR) was designed to measure the thin film of Ni metallic thickness under the condition of in-situ and real-time deposition monitoring. SPR optical fiber sensors have the advantages of low cost, simplicity, high reliability, good sensitivity, and without electromagnetic interference (EMI). We used a halongen white light source and a laser beam at an appropriate wavelength of laser beam to carry out the thickness sensing during Ni nano films deposition with in-situ and real-time monitoring, without EMI problems generated in the monitoring system as well as no influence on the desposition parameters of thin film sputtering.
Spectral responses of the SPR absorption are demonstrated in the family of curves for the normalized transmitted white light power and for the transmitted light power of the 830-nm laser beam with respect to the film thickness change. The results clearly showed that linear response of the transmitted light power of the 830-nm laser has a slope values of -1.92×10-6 W / nm, on the other hand, a slope value of -3.77×10-3 a.u / nm was obtained based upon the analysis for the white light spectrum at 830-nm wavelength. The film monitoring system we have proposed can be applied to the nano film thickness estimation for the Ni film monitoring, and for other metallic nano films deposition monitoring as well.
致謝 i
摘要 ii
ABSTRACT iii
目錄 v
圖目錄 viii
第一章 1
緒論 1
1.1光纖感測器的發展 1
1.2研究動機 3
1.3薄膜厚度監測 4
1.3.1石英監測(QCM) 5
1.3.2計時法 6
1.3.3光譜法 6
1.3.4導納軌跡法6
1.4本論文架構 7
第二章 8
理論 8
2.1 表面電漿共振簡介 8
2.2 表面電漿波原理 10
2.3 漸逝波(Evanescent wave)15
2.4側拋研磨光纖原理 17
第三章 19
實驗架構 19
3.1多膜光纖的側拋步驟 20
3.2金膜的濺鍍沉積 23
3.3鎳膜的濺鍍沉積 25
3.4光纖感測器量測系統 26
3.4.1光頻譜分析儀 26
3.4.2 雷射量測 29
3.5 腔體內即時量測 30
3.6 薄膜分析儀器 32
3.6.1 掃描式電子顯微鏡(SEM) 32
3.6.2 原子力顯微鏡(AFM) 34
第四章 38
結果與討論 38
4.1導論 38
4.2 Ni薄膜厚度之SEM量測 39
4.3 不同膜厚沉積監控區段的雷射光波長選擇 43
4.4 830 nm雷射腔內即時監測 52
第五章 57
結論 57
參考文獻 59
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