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研究生:王嘉瑋
研究生(外文):Jia-Wei Wang
論文名稱:複合式奈米遮罩於低反射晶片之應用
論文名稱(外文):Application of Nano-hybrid Mask to Low-reflective Wafer
指導教授:林烱暐
指導教授(外文):Chiung-Wei Lin
口試委員:林烱暐
口試委員(外文):Chiung-Wei Lin
口試日期:2015-07-22
學位類別:碩士
校院名稱:大同大學
系所名稱:光電工程研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2015
畢業學年度:103
語文別:英文
論文頁數:76
中文關鍵詞:氮化矽雙層抗反射膜電漿輔助化學氣相沉積二氧化矽抗反射鍍膜
外文關鍵詞:Anti-reflection CoatingSiO2SiNxDLARPECVD
相關次數:
  • 被引用被引用:0
  • 點閱點閱:78
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本論文之研究目的在於利用二次遮罩SiNx搭配雙層抗反射薄膜並結合低成本奈米球自我組裝(Self-Assembly)技術,將奈米球塗佈在具有多層抗反射薄膜之絨面粗糙面金字塔結構上,形成一具有粗糙面的次波長(Tilted Sub-wavelength Structure,TSWS)抗反射層,來改善傳統雙層抗反射層的反射率,並使用相同元件材料實際作出太陽電池(Solar cell)來作探討,對於太陽電池改善光學特性的部分是否有效助於增加光子吸收之數目,而提升太陽電池轉換效率之效果。
The purpose of this paper is to study the use of secondary SiNx mask with double antireflective film in combination with a low-cost self-assembled nano ball technology, the nano-spheres coated with a multilayer antireflection film of rough suede on the surface of the pyramid structure, forming a rough surface having a second wavelength anti-reflective layer to improve the reflectivity of the conventional double anti-reflective layer and use the same component materials actually made solar cells to make discussion of the optical properties of the solar cell to improve the effectiveness of the number of photons absorbed part of the aid increase, and to enhance the effect of solar cell conversion efficiency.
Acknowledgements I
Summary II
Directory III
Tables directory V
Figure directory VI
Chapter 1 Introduction 1
1.1 Preface 1
1.2 Solar energy 2
1.3 Motivation 4
Chapter 2 theory 7
2.1 Antireflection structure 7
2.1.1 Suede fabric 7
2.1.2 Anti-reflective coating (ARC) 8
2.1.3 Wavelength (Sub-wavelength Structure,SWS) Structure 11
2.2 Naimiqiu self-assembly principles 13
2.3 Basic principles of solar cells 13
2.3.1 Photovoltaic effect 13
2.3.2 Solar cell structure and function 15
2.3.3 Solar cell equivalent circuit 16
2.3.4 The series resistance (rs) and shunt resistance (rSh) cause and effect 18
2.3.5 Back surface field (BackSurfaceField,BSF) 20
Chapter 3 Experimental 21
3.1 Antireflective film-making process 21
3.2 Experimental schema 22
Chapter 4 Results and Discussions 24
4.1 Flock structure in different etching temperatures for the study of the optical 24
4.2 As a shielding layer of silicon nitride under different processing conditions on morphology and structure of study 27
4.2.1 Silicon nitride (SiNx) Secondary screening of films Experiment 27
4.3 Beveled sub-wavelength structure (Tilted Sub-wavelength Structure,TSWS) experiment 44
4.3.1 Coating diameter 300 nm nm ball 45
4.4 Change RIE plasma power on TSWS structure 48
4.5 Matching antireflection films for Solar Cell effect 56
Chapter 5 Conclusion 59
References 61
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