臺灣博碩士論文加值系統

　　鋁合金均溫板需要在其表面製作高深寬比結構並具超親水及耐蝕等特性，以傳統乾式及濕式鍍膜製程不易解決此問題。微弧氧化技術可輕易在鋁表面製作超親水及耐蝕之膜層，但該技術在高深寬比結構下的成膜特性仍不清楚，值得進行研究。

　　先用CNC加工，在鋁板表面製作出高深寬比結構，再進行微弧氧化在微結構表面形成保護膜層。並擷取斷面分析膜層生成情形。掃描式電子顯微鏡用於分析不同深寬比結構微弧氧化膜層的厚度及均勻性。微弧氧化過程中消耗電解液並產生大量氣體，會顯著影響氧化膜層厚度，當深寬比較小或開放空間越大時，電解液快速補足，使膜層成長較快長，膜層厚度均勻性較佳。反之膜層成長較慢，膜層厚度均勻性較差；微結構深寬比愈大，使電解液接觸試片總表面積增加，使電流密度降低，也會導致微弧氧化膜層的厚度較薄。

The aluminum alloy vapor chamber requires fabricating a high aspect ratio structure on aluminum surface and provides super-hydrophilic and anti-corrosion properties, which is not easy obtained by traditional dry and wet coating process. The super-hydrophilic and anti-corrosion properties can be achieved by micro-arc oxidation (MAO) process on aluminum alloy. However, the characteristics of MAO film on high aspect ratio structure are still not clear, which worth to be studied.
The CNC machining was used to produce a high aspect ratio structure on aluminum surface, and followed by MAO process to obtain a protective coating on structured surface. The scanning electron microscope was utilized to investigate the thickness and uniformity of MAO layer covered on high aspect ratio structure. The consumption of electrolyte solution and production of large amounts of hydrogen gas in MAO process significantly influence the thickness of oxide layer. A lower aspect ratio structure with a larger open space allows fast supplement of the electrolyte solution and diffusion of hydrogen gas, which favors the growth of MAO layer with a faster speed and a better uniformity of layer thickness. A thinner oxide layer and worse uniformity of layer thickness was obtained for the sample with a higher aspect ratio structure. The alloy surface with a higher aspect ratio structure provides a higher surface area, which leads to a lower current density across the sample and may lead to a thinner coating.

摘要.................................................................................................................................. I
ABSTRACT...................................................................................................................... II
致謝.................................................................................................................................. III
目錄.................................................................................................................................. IV
圖目錄............................................................................................................................... VI
表目錄............................................................................................................................... IX
第一章 前言.................................................................................................................... 1
1.1 緒論.................................................................................................................... 1
1.2 研究目的............................................................................................................ 1
第二章 文獻回顧............................................................................................................ 3
2.1 熱導管............................................................................................................... 3
2.2 均溫板............................................................................................................... 3
2.3 微弧氧化技術................................................................................................... 5
2.3.1 微弧氧化之原理................................................................................... 5
2.3.2 電解液對膜層之影響............................................................................ 7
2.3.3 製程參數對膜層之影響........................................................................ 8
2.3.4 添加劑對微弧氧化膜層之影響及其應用............................................ 9
2.3.5 微弧氧化膜層的熱物理特性................................................................ 9
2.4高深寬比結構於電鍍及電鑄等面臨的問題.................................................... 10
第三章 實驗設備及步驟................................................................................................ 12
3.1 實驗規劃........................................................................................................... 12
3.1.1 材料準備................................................................................................ 11
3.1.2 藥品準備................................................................................................ 19
3.1.3 實驗設備.. ............................................................................................ 19
3.2 實驗步驟.......................................................................................................... 22
3.2.1前處理.................................................................................................... 23
3.2.2 電解液準備........................................................................................... 23
3.2.3 實驗參數............................................................................................... 23
3.2.4 微弧氧化流程....................................................................................... 24
3.2.5 試片裁切............................................................................................... 24
3.2.6 試片研磨及腐蝕.................................................................................... 25
3.2.7 膜層表面及斷面分析........................................................................... 26
第四章 結果與討論........................................................................................................ 28
4.1 陣列結構表面微結構觀察............................................................................... 28
4.2 陣列結構斷面微結構觀察............................................................................... 31
4.2.1 表面及深處膜厚比較-陣列結構0.5mm-溝槽深度0.3 mm................ 32
4.2.2 表面及深處膜厚比較-陣列結構0.5mm-溝槽深度1.0 mm................ 39
4.2.3 表面及深處膜厚比較-陣列結構0.3mm-溝槽深度0.3 mm................ 46
4.2.4表面及深處膜厚比較-陣列結構0.3mm-溝槽深度1.0 mm................ 48
4.3 孔洞結構表面微結構觀察............................................................................... 52
4.4 孔洞結構斷面微結構觀察............................................................................... 53
4.4.1 通孔........................................................................................................ 54
4.4.2 盲孔........................................................................................................ 59
4.5 高深寬比結構對微弧氧化的影響................................................................... 64
第五章 結論.................................................................................................................... 66
第六章 參考文獻............................................................................................................ 68

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