臺灣博碩士論文加值系統

本實驗是利用溶膠凝膠法(Sol-Gel Method)來製備不同成份氧化鋅薄膜於鐵基板(SS41)上，鐵基板的熱處理條件為500℃持溫15分鐘。至於氧化鋅合金的摻雜物是氧化銅、氧化鐵、氧化鋅及氧化鎳，而其成份範圍在0.1-10.0mol%，而摻雜物之起始原料是硝酸物。藉由不同摻雜物的濃度改變來觀察其對薄膜之物理特性影響。並由燒結氣氛及溫度改變
，來觀察燒結樣品之SEM微觀組織、XRD晶體結構、及LCR阻抗分析來研究氧化鋅薄膜的特性。
在ZnO-CuyO系統，燒結薄膜在摻雜濃度為10mol%及3mol% CuOy時會有第二相CuO的出現。同時氧化鋅薄膜是以多孔連續膜存在，其膜厚約1μm。在摻雜濃度為1mol% CuyO之氧化鋅合金燒結坯體晶粒成長最明顯。至於ZnO-FeOy系統之氧化鋅燒結坯體在3mol%FeOy時，在XRD圖中可以看到Fe3O4繞射峰。
除以上的結果，燒結樣品的電性是由LCR阻抗分析儀來測量，而量測頻率為30Hz到500kHz。其中這些樣品的電阻是隨著頻率增加而遞減。

A sol-gel method was used to fabricate several ZnO alloying thin films on the SS41 iron substrate, in which the iron substrate was pretreated at 500oC for 15 min in air before coating. As to these alloying oxides like CuyO, NiO, FeOy, and ZnO, their chemical precursors were nitrates, and there compositions were ranged from 0.1-10.0 mol%. Through different oxide alloying, and sintering atmosphere plus temperature, physical properties of sintered specimens including microstructures, crystal structures, and electrical properties were determined.
In the ZnO- CuyO system, a second phase CuO was observed in the 10mol% and 3 mol% CuyO sintered specimens. All sintered ZnO alloying thin films contained inter-connected and porous structures with a thickness of 1m approximately. For sintered bulk specimens, the specimen with 1mol% CuyO showed an apparent grain growth phenomenon. Except for microstructures, a second phase Fe3O4 was observed in the bulk sintered specimen with 3 mol% FeOy in the ZnO-FeOy system form the corresponding X-ray diffraction patterns.
As to the electrical properties being measured by an LCR meter, the electrical resistances of these sintered ZnO alloying specimens were increasing with the measuring frequency from 30Hz to 500kHz.

中文摘要 I
英文摘要 III
誌　　謝 IV
總　目　錄 V
表　目　錄 VII
圖　目　錄 VIII
第一章 簡介 1
第二章 理論背景與文獻回顧 3
2.1 氧化鋅介紹 3
2.2 薄膜介紹 5
2.2.1 鍍膜方式 6
2.3 氧化鋅薄膜文獻回顧 8
2.4 本實驗重點 9
第三章 實驗步驟及方法 10
3.1 樣品製備 11
3.1.1 鐵基板前處理 12
3.1.2 氧化鋅合金前驅物製備 13
3.1.3 氧化鋅摻雜氧化物樣品製備 15
3.1.4 氧化鋅薄膜鍍膜 18
3.1.5 管狀高溫爐燒結 18
3.2 樣品檢測 24
3.2.1 SEM掃描式電子顯微鏡 24
3.2.2 X-ray 多功能X光繞射儀 25
3.2.3 LCR電性量測 26
第四章 結果與討論 27
4.1 簡介 27
4.2 SEM微結構觀察 28
4.2.1 在ZnO-NiO系統薄膜 28
4.2.1 在ZnO-FeO系統薄膜 33
4.2.1 在ZnO-CuyO系統薄膜 38
4.2.1 在ZnO-ZnO(or Zn(NO3)2)系統薄膜 43
4.2.5 不同成份氧化鋅合金坯體燒結之微觀組織 48
4.3 XRD晶體結構分析 54
4.4 LCR阻抗分析 61
第五章 結論 74
第六章 參考文獻 76

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