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研究生:邱成偉
研究生(外文):Chen-WeiChiu
論文名稱:1-丁基-1-甲基吡咯二氰胺親水性室溫離子液體中電沈積磷化鈷化合物及其電化學研究
論文名稱(外文):Electrochemical study and electrodeposition of CoP in hydrophilic room temperature ionic liquid 1-Butyl-1-methylpyrrolidinium dicyanamide
指導教授:孫亦文
指導教授(外文):I-Wen Sun
學位類別:碩士
校院名稱:國立成功大學
系所名稱:化學系
學門:自然科學學門
學類:化學學類
論文種類:學術論文
論文出版年:2016
畢業學年度:104
語文別:中文
論文頁數:100
中文關鍵詞:離子液體電沉積磷化鈷合金水電解
外文關鍵詞:Ionic liquidElectrodepositionCobaltCobalt Phosphidewater splitting
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本研究探討在BMP-DCA(N-methyl-N-methylpyrrolidinium dicyanamide)之Co(Ⅱ)與Co(Ⅱ)/P混和溶液中的電化學行為,以GC、Pt電極並且在不同溫度及不同掃描速率下討論Co(Ⅱ)與Co(Ⅱ)/P混和溶液在離子液體中電化學行為。並以銅為基材在不同電位下沉積Co及CoP化合物,並且使用電子顯微鏡(SEM)及元素分析(EDS)觀察鍍層表面型態以及組成。最後以電沉積所的之CoP化合物在鹼性溶液中進行水的電解,結果顯示在含有29%的CoP合金對於氧氣生成反應(OER)具較良好的催化效果,而含有19%與29%的CoP對於HER比較有明顯的催化。


In this study, the electrochemical behavior of Co(II) and the mixtures of Co(II) -hypophosphite (H2PO2-) were investigated on platinum (Pt), glassy carbon (GC) electrodes by using various electrochemical techniques in N-butyl-N-methylpyrrolidinium dicyanamide room temperature ionic liquid[1] (BMP-DCA RTIL).
Co(II) species were introduced into BMP-DCA by the addition of CoSO4·7H2O or anodic dissolution of Co metal. In the Co(II) containing solutions, NaH2PO2 was introduced as the source of P and various mixtures of Co(II) and H2PO2- were prepared.
Electrodeposition of Co metal and CoP compounds were achieved by potentiostatic electrolysis and the effect of the applied potentials on the compositions of CoP was carefully studied.
The surface morphology and composition of all the electrodeposited samples were characterized using scanning electron microscope (SEM) and energy dispersive spectrometry (EDS), respectively.
The electrocatalytic activity of the CoP compounds toward the oxygen reduction reaction (ORR) was studied.



中文摘要I
ExtenedAbstract II
誌謝X
本文目錄XI
圖目錄XIV
表目錄XXV
第一章 諸論1
1-1融鹽的發展1
1-2離子液體3
1-3Dicyanamide anion based離子液體之特性及其發展4
1-4金屬磷化物之文獻回顧7
1-4-1含磷合金探討7
1-4-2金屬磷化物來源及共鍍機制7
1-5研究動機與目的 8
1-5-1析氫反應(HER)8
1-5-2氧氣生成反應(OER)9
第二章實驗原理10
2-1電化學原理10
2-2循環伏安法(Cyclic Voltammetry,CV)11
2-3電流時間法(Chronoamperometry)13
第三章實驗藥品與儀器14
3-1實驗材料14
3-2室溫離子液體製備17
3-2-1BMP-DCA室溫離子液體的製備17
3-2-2 BMP-TFSI室溫離子液體製備17
3-3實驗裝置與儀器 19
3-3-1 實驗裝置19
3-3-2 實驗儀器20
第四章結果與討論22
4-1室溫離子液體(Ionic liquid)電位窗22
4-1-1 BMP-DCA離子液體22
4-2鈷金屬絲在BMP-DCA離子液體中的陽極溶解反應22
4-2-1 硫酸鈷(CoSO4.7H2O)在BMP-DCA離子液體溶解測試 25
4-2-2 Co(Ⅱ)在BMP-DCA離子液體中的電化學行為25
4-2-3一水合次磷酸鈉(NaH2PO2·H2O)在BMP-DCA離子液體溶解測試33
4-2-4鈷離子與磷離子混合溶液其電化學行為探討 33
4-3離子液體內電沉積Co與CoP及其鍍層探討42
4-3-1離子液體內電沉積Co與其鍍層性質探討42
4-3-2電沉積CoP與其鍍層分析 47
4-3-3 Co與CoP鍍層之XRD、TEM及XPS分析61
4-4CoP合金於電催化反應之探討74
4-4-1氧氣生成反應(OER)74
4-4-2氫氣生成反應(HER)78
第五章 結論與未來展望82
參考文獻83
第六章附錄88

[1]D. R.MacFarlane, S. A.Forsyth, J.Golding, G. B.Deacon, Green Chem. 2002, 4 , 444-448.
[2]J.S.Wilkes, Green Chem. 2002,4,73-80
[3]M. Krolikowska, M. Zawadzki and M. Krolikowski, J Chem Thermodyn, 2014, 70, 127-137.
[4]J. L. Manson, C. R. Kmety, Q. Z. Huang, J. W. Lynn, G. M. Bendele, S. Pagola, P. W. Stephens, L. M. Liable-Sands, A. L. Rheingold, A. J. Epstein and J. S. Miller, Chemistry of Materials, 1998, 10, 2552-2560.
[5]H. Y. Huang and P. Y. Chen, Electrochimica Acta, 2011, 56, 2336-2343.
[6]P. Jensen, S. R. Batten, G. D. Fallon, D. C. R. Hockless, B. Moubaraki, K. S. Murray and R. Robson, Journal of Solid State Chemistry, 1999, 145,387-393.
[7]D. X. Zhuang, M. J. Deng, P. Y. Chen and I. W. Sun, Journal of the Electrochemical Society, 2008, 155, 575-579.
[8]H. Y. Huang and P. Y. Chen, Electrochimica Acta, 2011, 56, 2336-2343.
[9]A. I. de Sa, S. Eugenio, S. Quaresma, C. M. Rangel and R. Vilar, Thin Solid Films, 2011, 519, 6278-6283.
[10]A. I. de Sa, S. Eugenio, S. Quaresma, C. M. Rangel and R. Vilar, Surf Coat Tech, 2013, 232, 645-651.
[11]T. I. Leong, Y. T. Hsieh and I. W. Sun, Electrochimica Acta, 2011, 56, 3941-3946.
[12]M.-J. Deng, I. Sun, P.-Y. Chen, J.-K. Chang and W.-T. Tsai, Electrochimica Acta, 2008, 53, 5812-5818.
[13]T. I. Leong, I. W. Sun, M. J. Deng, C. M. Wu and P. Y. Chen, Journal of the Electrochemical Society, 2008, 155, 55-60.
[14]M. Wu, N. R. Brooks, S. Schaltin, K. Binnemans and J. Fransaer, Physical chemistry chemical physics, 2013, 15, 4955-4964.
[15]M. Steichen, R. Djemour, L. Gütay, J. Guillot, S. Siebentritt and P. J. Dale, The Journal of Physical Chemistry C, 2013, 117, 4383-4393.
[16]M.-J.Deng, P.-C.Lin, J.-K.Chang, J.-M. Chen and K-T.Lu, Electrochimica Acta, 2011, 56, 6071-6077.
[17]M.-J. Deng, P.-Y. Chen, T.-I. Leong, I. W. Sun, J.-K. Chang and W.-T. Tsai, Electrochemistry Communications, 2008, 10, 213-216.
[18]B. C. M. Martindale, S. E. W. Jones and R. G. Compton, Physical Chemistry Chemical Physics, 2010, 12, 1827-1833.
[19]H. Yi-Ting and I. W. Sun, Electrochemistry Communications, 2011, 13, 1510-1513.
[20]D. S. Lashmore and J. F. Weinroth, Plat. Surf. Finish., 1982,69,72-76.
[21]B. P. Daly and F. J. Barry, International Materials Reviews, 2003, 48, 326-338
[22]I. Paseka, Electrochim. Acta, 1995,40,1633-1640.
[23]R. K. Shervedani and A. Lasia, J.Electrochem. Soc.,1997,4, 511-519.
[24]Z. Xing, Q. Liu, A. M. Asiri, X. P. Sun, Adv. Mater. 2014, 26, 5702–5707.
[25]J. M. McEnaney, J. Chance Crompton, J. F. Callejas, E. J. Popczun, C. G. Read, N. S. Lewis, R. E. Schaak, Chem. Commun. 2014, 50,
11026–11028;
[26]Z. Xing, Q. Liu, A. M. Asiri, X. P. Sun, ACSCatal. 2015, 5, 145–149.
[27]E. J. Popczun, C. G. Read, C. W. Roske, N. S. Lewis, R. E. Schaak, Angew. Chem. Int. Ed. 2014, 53,5427–5430
[28]F. H. Saadi, A. I. Carim, E. Verlage, J. C. Hemminger, N. S. Lewis, M. P. Soriaga, J. Phys. Chem. C ,2014, 118, 29294–29300
[29]Z. Pu, Q. Liu, P. Jiang, A. M. Asiri, A. Y. Obaid, X. P. Sun, Chem. Mater. 2014, 26, 4326–4329.
[30]E. J. Popczun, J. R. McKone, C. G. Read, A. J. Biacchi, A. M. Wiltrout, N. S. Lewis, R. E. Schaak, J. Am. Chem. Soc. 2013, 135, 9267–9270.
[31]Y. Xu, R. Wu, J. Zhang, Y. Shi, B. Zhang, Chem. Commun. 2013, 49, 6656–6658;
[32]P. Jiang, Q. Liu, Y. Liang, J. Q. Tian, A. M. Asiri, X. P. Sun, Angew. Chem. Int. Ed. 2014, 53, 12855–12859; Angew. Chem. 2014, 126,13069–13073.
[33]J. Q. Tian, Q. Liu, N. Cheng, A. M. Asiri, X. P. Sun, Angew. Chem. Int. Ed. 2014, 53, 9577–9581; Angew. Chem. 2014, 126, 9731–9735.
[34]M. Ratzker, D. S. Lashmore and K. W. Pratt, Plating and Surface Finishing,1986,76, 74-82.
[35]R. L. Zeller, III and U. Landau, J. Electrochem. Soc., 1992,139, 3464-3469.
[36]G. McMahon and U. Erb, J. Materials Science Letters, 1989,8, 865-868.
[37]E. Toth-Kadar, I. Bakonyi, A. Solyom, J. Hering and G. Konczos, Surface and Coating Technology,1987,31, pp31-43.
[38]R. Rajnarayan and M. N. Mungole, Surface Technology, 1985, 24, 233-239.
[39]I. Ogno, H. Ohfuruton and S. Haruyama,日本金屬學會誌,1986,50, 1075-1080.
[40]J. Crousier, Z. Hanane and J-P. Crousier, Tin Solid Films, 1994,248, 51-56.
[41]M. M. V. Parente, O. R. Mattos, S. L. Diaz, P. Lima Neto and F. J. Fabbi Miranda, J. Applied Electrochemistry, 2001,31, 677-683.
[42]T. Morikawa, T. Nakade, M. Yokoi, Y. Fukumoto and C. Iwakura, Electrochimica Acta,1997,42, 115-118
[43]A. Brenner, Electrodeposition,of Alloys Vol. II, Academic Press,New York, 1963, 457.
[44]K. Masui, T. Nomura, S. Kwon and D. Chang, Surface and Coating Technology, 1992,43,195-199.
[45]T. Morikawa, M. Yokoi, S. Shiroma, S. Eguchi and E. Kousai,
Surface and Coating Technology, 1992,43, 353-354.
[46]M. Ratzker, D. S. Lashmore and K. W. Pratt, Plating and Surface Finishing, 1986,76,74-82.
[47]R. L. Zeller, III and U. Landau, J. Electrochem. Soc.,1992,139,3464-3469.
[48]J. Crousier, Z. Hanane and J-P. Crousier, Tin Solid Films,1994, 248, 51-56.
[49]T. M. Harris and Q. D. Dang,J. Electrochem. Soc., 1993,140, 81-83.
[50]N. Jiang, B You, M. Sheng, Y. Sun,Angew. Chem. Int. Ed. 2015, 54,
6251-6254
[51]H. Yang, Y. Zhang, F. Hu, Q. Wang, Nano Lett. ,2015, 15, 7616-7620
[52]J. Tian, Q Liu, A.M. Asiri, X. Sun, J. Am. Chem. Soc. 2014, 136, 7587-7590
[53]J Chang, Y Xiao, M Xiao, J Ge, C Liu, W Xing,ACS Catal. 2015, 5, 6874-6878
[54]Y. Feng, X.Y. Yu, U. Paik,Chem. Commun., 2016, 52, 1633-1636
[55]K.C. Fernandes, L.M. D. Silva, J.F.C. Boodts, L. A. D. Faria, Electrochim.Acta, 2006,51,2809-2818
[56]F. H. B. Lima , J. Zhang , M. H. Shao , K. Sasaki , M. B. Vukmirovic ,‡ E. A. Ticianelli , R. R. Adzic , J. Phys. Chem. C, 2007, 111 , 404–410
[57]A.J.B.amd L.R.Faulkner, Electrochemical Method:Fundamentals and Applications(2nd ed),2001
[58]Y. You, C. Gu, X. Wang, J. Tu, Journal of The Electrochemical Society, 2012,159,642-648

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