臺灣博碩士論文加值系統

隨著精密技術的發展，高解析度的量測方法已成為近年來發展的重點之一。其中光學量測技術具有非接觸與高解析度的優點，因此近年來已被廣泛應用於精密量測上。Shack-Hartmann光波前感測器是藉由量測光波前的變化，精準地感測光束在傳遞過程中產生的光程差，可利用透射式光路量測透鏡與大氣的像差變化，亦可配合反射式光路量測物體表面變形。
本論文設計開發出可微調式Shack-Hartmann光波前感測器，並建構一套高解析度的Shack-Hartmann光波前表面變形量測系統，用以量測壓電元件在致動時的表面變形。藉助光學模擬軟體對系統光路進行分析，以最佳化系統光路，並藉由實驗結果驗證系統光路之量測特性。本文採用反射式光路進行表面變形量測，藉由量測反射光束之光波前變化，可反推被測物之表面變形輪廓，使用準直平行光作為量測之參考光束，分別對壓電蜂鳴片與積層式壓電塊輸入電壓使其產生變形，並利用設計系統進行量測，操作電壓範圍為-50 V至50 V。經由實際量測，得以利用光波前重建壓電元件之變形輪廓。本論文設計開發之感測器的量測精密度為0.203 λ，精準度達0.032 λ，解析度則可達0.033 λ。

With the development of precision technologies, measuring methods with high resolution have become more and more important for the past few years. Due to the advantages of non-contact and high resolution of optical measurement, it has been applied to precision engineering for several years. Shack-Hartmann wavefront sensor (SHWS) can precisely detect the optical path difference of the light beam. By using the transmissive optical setup, it can measure the wavefront aberration caused by lens and atmosphere. Also, it can measure the surface topography by applying the reflective optical setup.
A tunable SHWS with high resolution is designed in this paper. Shack- Hartmann deformation measuring system is also constructed to measure the surface topography of the piezoelectric components. The optical setup of the system is analyzed by the optical simulation software. The components of the system are optimized by the simulation results, which are also used to compare with the experimental results. Reflective optical setup is applied in this paper to measure the surface deformation, and a collimated beam is used as a reference beam. Providing voltage, from -50 V to 50 V, is applied to piezoelectric components to make them deform. The designed system is applied to measure the deformation of the surface. The profile of the deformed surface can be obtained by measuring the change of wavefront of the reflective beam. Finally, the accuracy of tunable sensor is obtained to 0.203 λ by experiments. The precision reaches 0.032 λ, and the resolution reaches 0.033 λ.

口試委員審定書 I
誌謝 II
中文摘要 III
Abstract IV
目錄 V
圖目錄 VII
表目錄 IX
符號表 X
第一章 緒論 1
1.1 研究背景與動機 1
1.2 文獻回顧 2
1.3 研究目標 5
1.4 內容簡介 5
第二章 光波前變形量測系統原理與架構 7
2.1 量測光源與光路 8
2.2 量測裝置 11
2.3 資料擷取與處理裝置 13
第三章 光波前理論與解析運算法 19
3.1 光波前與像差 19
3.2 光波前重建運算法 21
第四章 光波前變形量測特性分析 25
4.1 擴束光源分析 26
4.2 光強度分布分析 30
4.3 光點大小分析 34
4.4 量測面變形重建分析 38
第五章 光波前變形量測系統總體性能測試 42
5.1 實驗架構 42
5.2 參考光校正 43
5.3 可微調式SHWS測試 45
5.4 光波前表面變形量測 49
第六章 結論與未來展望 56
參考文獻 57

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