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研究生:湯士桓
研究生(外文):Shih-Huan Tang
論文名稱:以微透鏡光罩製作高數值孔徑微透鏡
論文名稱(外文):High Numerical Aperture Microlens Fabrication by Using the Microlens Mask
指導教授:楊錫杭
指導教授(外文):Hsiharng Yang
口試委員:盧鴻華蔡裕祥
口試日期:2017-06-10
學位類別:碩士
校院名稱:國立中興大學
系所名稱:精密工程研究所
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2017
畢業學年度:105
語文別:中文
論文頁數:65
中文關鍵詞:微透鏡數值孔徑微透鏡光罩微影製程熱熔法
外文關鍵詞:MicrolensNumerical ApertureMicrolens maskLithographyThermal Reflow
相關次數:
  • 被引用被引用:1
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  • 下載下載:47
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本研究提出一新穎方法,使用微透鏡光罩製作具有高數值孔徑(Numerical Aperture;NA)之微透鏡,可利於提高光學成像與製造技術。本研究分為三大部分,第一部分使用Trace-Pro光學模擬軟體模擬光穿過微透鏡光罩之光強度分佈,進行數值分析,從中找出最佳參數值;第二部分為黃光微影製程技術,使用AZ4620正光阻進行曝光顯影,搭配熱熔法於玻璃基板上形成微透鏡結構作為本製程之光罩使用,將此微透鏡光罩取代傳統光罩進行曝光顯影,經由顯影過後可獲得具有高數值孔徑之微透鏡;第三部分使用光學顯微鏡(Optical Microscope)、表面形貌量測儀(alpha step)與掃描式電子顯微鏡(SEM)進行透鏡幾何量測,驗證模擬結果,並使用理論公式計算微透鏡之NA值。本研究使用此新型製程製作出直徑為30.06與40.15 μm之微透鏡,經由幾何量測與公式計算後得到NA值分別為0.618與0.581之微透鏡。
This research presents a novel method for the high numerical aperture microlens fabrication using the microlens mask to improve optical imaging and fabrication technology. The research is divided into three parts. First, the light intensity distribution can be simulated by optical simulation software-TracePro and obtained the numerical analysis for finding an optimal parameter value. Second part is the microlens mask fabrication. The photoresist (AZ-4620) column array was fabricated by lithography and followed by the thermal reflow to form the microlens array on the glass substrate as the mask. Microlens with a high Numerical Aperture (NA) can be obtained by lithography using the microlens mask. Last, using optical microscope, surface topography meter (alpha step) and Scanning Electron Microscope (SEM) to analysis lens geometric measurement and then verify the simulation results. Moreover, the theoretical formula is used to calculate the microlens N.A. value. This study was successful for fabricating the novel microlenses which diameter was 30.06μm and 40.15μm. After geometrical measurement and formula calculation, the NAs of microlens were 0.618 and 0.581, respectively.
目錄
摘要 i
ABSTRACT ii
目錄 iii
圖目錄 v
表目錄 vii
第一章 緒論 1
1.1 前言 1
1.2 研究目的與動機 2
1.3 研究方法與目標 3
1.4 論文架構 3
第二章 文獻回顧 4
2.1微透鏡製程 4
2.1.1 熱熔法 4
2.1.2 噴墨法 5
2.1.3 灰階光罩法 6
2.1.4 準分子雷射加工法 7
2.1.5 微影擴散法 8
2.2 高NA微透鏡製程 10
2.2.1 模具加工法 10
2.2.2 使用噴墨法於特定基板上製作高NA微透鏡 11
2.2.3 熱熔法搭配微孔洞基板製作多焦點微透鏡陣列 12
2.2.4 高NA值微透鏡應用 13
2.3 黃光微影搭配微透鏡光罩製程 15
2.3.1 環狀透鏡製程 15
2.3.2 微針製程 16
第三章 基礎理論 17
3.1 透鏡曲率公式 17
3.2 製鏡者方程式 18
3.3 透鏡NA理論推導 18
第四章 光學模擬 21
4.1 TracePro光學模擬軟體簡介 21
4.2 光學模擬與分析 21
4.2.1 參數設計 21
4.2.2 光學模擬分析 22
第五章 實驗製程規劃與製作 26
5.1 實驗流程規劃 26
5.2 實驗製程 27
5.2.1 黃光微影製程 27
5.2.2 光罩設計 28
5.2.3 基板清洗 30
5.2.4 光阻塗佈 30
5.2.5 軟烤 31
5.2.6 曝光 32
5.2.7 顯影 34
5.2.8 熱熔製程 34
5.2.9 微透鏡光罩曝光 34
5.2.10 硬烤 36
5.2.11 真空濺鍍製程 37
第六章 實驗結果量測與分析 38
6.1 光學顯微鏡(OM)量測結果 38
6.2 表面形貌儀(α-step)量測結果 43
6.3 3D共軛聚焦量測儀(NanoFocus) 46
6.4 掃描式電子顯微鏡(SEM)量測結果 48
6.5 量測結果分析與討論 50
6.5.1 透鏡成形影響 50
6.5.2透鏡NA值討論 51
6.5.3 透鏡外形分析討論 51
第七章 結論與未來展望 52
7.1 結論 52
7.2 未來展望 53
參考文獻 54
附錄 58
附錄A製程儀器設備 58
附錄B 量測儀器設備 62
參考文獻
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