[1]李邦哲,2003,“薄膜成形技術新紀元”,台灣綜合展望,卷7,頁 71。http://www.tri.org.tw/per/doc/t07/065.pdf
[2]R. L. Boxman, S. Goldsmith, 1992,“Macroparticle contamination in cathodic arc coatings generation, transport and control”, Surface & Coatings Technology. 52, pp. 39-50.
[3]蔡定平,2001,真空技術與應用,國家實驗研究院儀器科技研究中心出版,新竹市。
[4]ZHAO Jia-xue, Jin Fan-ya, 2007,“Investigation of utilization ratio and calculating method of familiar magnetron sputtering targets”, Nuclear Fusion and Plasma Physics. 27, pp. 66-72.
[5]朗文昌,肖金泉,宮駿,孫超,黃榮芳,聞立時,2010,“軸對稱磁場對電弧離子鍍弧斑運動的影響”,金屬學報,46,pp. 372-379
[6]I. Zhirkov, A. Petruhins, J. Rosen, 2015,“Effect of cathode composition and nitrogen pressure on macroparticle generation and type of arc discharge in a DC arc source with Ti–Al compound cathodes”, Surface & Coatings Technology. 281, pp. 20-26.
[7]張銀祐,2004,陰極電弧活化沉積含金屬類鑽碳膜之製程與特性研究,國立中興大學材料工程學研究所碩士論文。
[8]Masao Kumagai, Ken Yukimura, Eiji Kuze, Toshiro Maruyama, Mamoru Kohata, Ken Numata, Hidenori Saito, Xinxin Ma, 2003,“Macroparticles on titanium nitiride thin film prepared by cathodic-arc plasma-based ion implantation and deposition”, Surface & Coatings Technology. 169-170, pp. 401-404.
[9]Nishibori, Mineo, 1992,“How to solve problems of films coated by ARC methods”, Surface & Coatings Technology. 52, pp. 229-323.
[10]M. Keidar, I. Beilis, R.L. Boxman, S. Goldsmith, 1996,“Macropartic1e interaction with a substrate in cathodic vacuum arc deposition”, Surface & Coatings Technology. 86-87, pp. 415-420.
[11]J. Koskinen, U. Ehrnstén, A. Mahiout, R. Lahtinen, J.-P. Hirvonen, S.-P. Hannula, 1993,“Porosity of thin diamond-like carbon films deposited by an arc discharge method”, Surface & Coatings Technology. 62, pp. 356-360.
[12]K. AKARI, H. TAMAGAKI, T. KUMAKIRI, K. TSUJI, 1990,“Reduction In Macroparticles During The Deposition of TiN Films Prepared by Arc Ion Plating”, Surface & Coatings Technology. 43-44, pp. 312-323.
[13]Vetter, J., 2014,“60 years of DLC coatings: Historical highlights and technical review of cathodic arc processes to synthesize various DLC types, and their evolution for industrial applications”, Surface & Coatings Technology. 257, pp. 213-240.
[14]Hirofumi Takikawa, Hideto Tanoue, 2007,“Review of Cathodic Arc Deposition for Preparing Droplet-Free Thin Films”, IEEE TRANSACTIONS ON PLASMA SCIENCE. 35, pp. 992-999.
[15]賴岱暐,2011,AISI 4340 合金鋼電弧披覆Ti-Al-N薄膜之腐蝕與磨耗行為研究,大同大學材料工程研究所碩士論文。[16]W.C. Lang, J.Q. Xiao, J. Gong, C. Sun, R.F. Huang, L.S. Wen, 2010,“Study on cathode spot motion and macroparticles reduction in axisymmetric magnetic field-enhanced vacuum arc deposition”, Vacuum. 84, pp. 1111-1117.
[17]Bai-Jun Xiao, Yi Chen, Wei Dai, Kwong-Yu Kwork, Teng-Fei Zhang, Qi-MinWang, Cheng-Yong Wang, Kwang Ho Kim, 2017,“Microstructure, mechanical properties and cutting performance of AlTiN coatings prepared via arc ion plating using the arc splitting technique”, Surface & Coatings Technology. 311, pp. 98-103.
[18]B. Warcholinski, A. Gilewicz, J. Ratajski, Z. Kuklinski, J. Rochowicz, 2012,“An analysis of macroparticle-related defects on CrCN and CrN coatings in dependence of the substrate bias voltage”, Vacuum. 86, pp. 1235-1239.
[19]A. Wahab Baouchi, Anthony J. Perry, 1991,“A study of the macroparticle distribution in cathodic-arc-evaporated TiN films”, Surface & Coatings Technology. 49, pp. 253-257.
[20]I. Petrov, P. B. Barna, L. Hultman, J. E. Greene, 2003,“Microstructural evolution during film growth”, Vacuum. 21, pp. 117-128.
[21]Thornton, John A., 1974,“Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings”, Vacuum. 11, pp. 666-670.
[22]Anders, André, 2010,“A structure zone diagram including plasma-based deposition and ion etching”, Thin Solid Films. 518, pp. 4087-4090.
[23]K. Keutel, E. Hettkamp, H. Fuchs, 2004,“Investigations of plasma properties during TiN deposition by a modified pulsed arc process”, Thin Solid Films. 458, pp. 173-178.
[24]L.P. Rivera, Enrique Camps, Stephen Muhl, Rafael Basurto, A. Zeinert, 2018,“Al-Si-N thin films deposited by laser ablation: Effect of plasma parameters on mechanical and optical properties”, Materials Research Bulletin. 99, pp. 306-313.
[25]鄭信民,林麗娟,2002,“X 光繞射應用簡介”,工業材料雜誌,181期,頁100-108。http://www.materialsnet.com.tw
[26]林麗娟,1994,“X 光繞射原理及其應用”,工業材料雜誌,86期,頁100-109
[27]林麗娟,1993,“X光繞射在工業材料分析上之應用”,工業材料雜誌,80期,頁50-55
[28]羅聖全,2013,“科學基礎研究之重要利器-掃瞄式電子顯微鏡(SEM)”,科學研習,52-5期,頁2-4
[29]ISO26443, INTERNATIONAL STANDARD, 2008,“Fine ceramics (advanced ceramics, advanced technical ceramics) — Rockwell indentation test for evaluation of adhesion of ceramic coatings”.
[30]黃振賢,蔡錫鎐,2001,材料實驗,文京圖書有限公司,臺中市。
[31]Jinjun Mo, Zhengtao Wu, Yuan Yao, Quan Zhang, Qimin Wang, 2018,“Influence of Y-addition and multilayer modulation on microstructure, oxidation resistance and corrosion behavior of Al0.67Ti0.33N coatings”, Surface & Coatings Technology. 342, pp. 129-136.
[32]Yinchao Xu, Kanghua Chen, Shequan Wang, Chenxi Pan, Songyi Chen, 2016,“Ti0$33Al0.67 cathode surface modifications and the effect on the mechanical and electrochemical properties of AlTiN coating”, Vacuum. 131, pp. 97-105.