臺灣博碩士論文加值系統

指導教授推薦書…………………………………………………………..
論文口試委員審定書……………………………………………………..
致謝……………………………………………………………………...iii
摘要……………………………………………………………………...iv
Abstract…………………………………………………………………...v
目錄……………………………………………………………………vi
圖目錄…………………………………………………………………...ix
表目錄…………………………………………………………………...xi
第一章 緒論……………………………………………………………...1
1.1序言……………………………………………………………...1
1.2研究目的………………………………………………………...2
第二章 文獻回顧………………………………………………………...3
2.1 Cu0/H2O2程序之應用…………………………………………...3
2.2 Orange G染料之性質與降解…………………………………...8
2.3 Chloramphenicol之性質與降解……………………………….10
第三章 研究方法與裝置……………………………………………….12
3.1奈米零價銅粉體之合成……………………………………….12
3.1.1實驗藥品…………………………………………………12
3.1.2實驗儀器…………………………………………………13
3.1.3分析儀器…………………………………………………14
3.1.4葉片型旋轉填充床合成奈米零價銅粉體之實驗步驟…15
3.2 Cu0/H2O2程序降解OG與CAP水溶液……………………….22
3.2.1實驗藥品…………………………………………………22
3.2.2實驗儀器…………………………………………………23
3.2.3分析儀器…………………………………………………24
3.2.4實驗步驟…………………………………………………25
3.2.4.1 OG檢量線建置…………………………………..25
3.2.4.2 OG染料降解實驗步驟…………………………..27
3.2.4.3 CAP檢量線建置………………………………….31
3.2.4.4 CAP降解實驗步驟……………………………….33
第四章 結果與討論…………………………………………………….37
4.1奈米零價銅粉體特性分析…………………………………….37
4.2物性分析-形貌、尺寸…………………………………………38
4.3元素組成與粉體結構………………………………………….45
4.4 Cu0/H2O2程序降解水中汙染物……………………………….49
4.4.1 H2O2濃度之影響………………………………………...53
4.4.2 Cu0劑量之影響…………………………………………..57
4.4.3初始濃度之影響…………………………………………60
4.4.4商用與超重力奈米零價銅降解水中汙染物之比較……63
4.4.6再現性實驗………………………………………………66
第五章 結論…………………………………………………………….68
參考資料………………………………………………………………...70
附錄…………………………………………………………………...…73



圖2.1.1在酸性水溶液(初始pH3.0)中nZVC / H2O2程序中BA的去除[5]…………………………………………………………………………..6
圖2.1.2 nZVC / H2O2程序於不同初始pH值降解BA[5]……………....7
圖2.1.3 US/nZVC/H2O2程序於不同初始pH值降解NOR[6].…………7
圖 2.2.1 Orange G之分子結構式……………………………………….9
圖 2.3.1 氯黴素結構式………………………………………………...11
圖3.1.1 葉片型旋轉填充床……………………………………………16
圖3.2.1 pH3之OG檢量線…………………………………………….26
圖3.2.2 高濃度OG之檢量線…………………………………………26
圖3.2.3降解OG染料水溶液實驗裝置實物圖……………………….30
圖3.2.4 pH3之CAP檢量線…………………………………………...32
圖3.2.5 高濃度CAP之檢量線………………………………………..32
圖3.2.6 降解CAP水溶液實驗裝置實物圖…………………………..36
圖4.2.1四種奈米零價銅粉體外觀圖(左至右分別為RPB-Cu0、SA-Cu0(25 nm)、SA-Cu0(40-60 nm)、SA-Cu0(60-80 nm))…………………..40
圖4.2.2 FE-SEM圖與粒徑分布圖(A)RPB-Cu0 (B)SA-Cu0(25 nm) (C)SA-Cu0(40-60 nm) (D)SA-Cu0(60-80 nm)…………………………..42
圖4.2.3 TEM圖與粒徑分布圖(A)RPB-Cu0 (B)SA -Cu0(25 nm) (C)SA-Cu0(40-60 nm) (D)SA-Cu0(60-80 nm)………………………………….44
圖4.3.1 XRD分析圖譜(A)RPB-Cu0(B)SA-Cu0(25nm)(C)SA-Cu0(40-60nm)(D)SA-Cu0(60-80nm)…………………………………………….47
圖4.3.2 EDS分析圖(A)RPB-Cu0(B)SA-Cu0(25nm)(C)SA-Cu0(40-60nm)(D)SA-Cu0(60-80nm)…………………………………………….48
圖4.4.1 不同程序-OG濃度變化趨勢…………………………………50
圖4.4.2 Cu0/H2O2程序降解OG顏色變化圖…………………………..51
圖4.4.3 不同程序-CAP濃度變化趨勢………………………………..52
圖4.4.4 不同過氧化氫濃度−OG濃度變化趨勢………………………55
圖4.4.5 不同過氧化氫濃度−CAP濃度變化趨勢……………………..56
圖4.4.6不同Cu0劑量−OG濃度變化趨勢…………………………….58
圖4.4.7不同Cu0劑量−CAP濃度變化趨勢……………………………59
圖4.4.8不同OG初始濃度−OG濃度變化趨勢……………………….61
圖4.4.9不同CAP初始濃度−CAP濃度變化趨勢…………………….62
圖4.4.10自製與商用奈米零價銅-OG濃度變化趨勢…………………64
圖4.4.11自製與商用奈米零價銅-CAP濃度變化趨勢………………..65
圖4.4.12再現性實驗-OG濃度變化趨勢………………………………67
圖4.4.13再現性實驗-CAP濃度變化趨勢……………………………..67

表2.1.1 過氧化氫物化性質………………………………………….......5
表2.12 常見氧化劑之氧化電位[4]………………………………........…6
表2.2.1 Orange G物化性質[7]…………………...…………………….….9
表2.3.1 氯黴素物化性質[10]………..…..………………………...….....11
表3.1.1 葉片型旋轉填充床系統之組件…………...………………….17
表3.1.2 葉片型旋轉填充床詳細規格……………………………….....21
表3.2.4.1 實驗操作變因:不同程序之比較……………………..……..28
表3.2.4.2 實驗操作變因:改變Cu0劑量………………………………..28
表3.2.4.3 實驗操作變因:改變H2O2濃度…………………..…………..29
表3.2.4.4 實驗操作變因:改變OG初始濃度…………………...…….29
表3.2.4.5 實驗操作變因:超重力與商用Cu0之比較……………...….30
表3.2.4.6 實驗操作變因:不同程序之比較……………………...……34
表3.2.4.7 實驗操作變因:改變Cu0劑量……………………………....34
表3.2.4.8 實驗操作變因:改變H2O2濃度……………………...……..35
表3.2.4.9 實驗操作變因:改變CAP初始濃度……………………......35
表3.2.4.10 實驗操作變因:超重力與商用Cu0之比較…………...…...36
表4.1.1 奈米零價銅合成環境與產率……………...………………….37
表4.2.1 奈米零價銅粉體SEM粒徑計算結果……………...………..39
表4.2.2 奈米零價銅粉體TEM粒徑計算結果…………………...…..39
表4.3.1 XRD 結果計算之平均粒徑…………………………...……...46
表4.4.1 不同程序對OG之降解率………………………………...….50
表4.4.2 不同程序對CAP之降解率……………………...…………...51
表4.4.3 不同H2O2濃度對OG之降解率…………………...………...54
表4.4.4 不同H2O2濃度對CAP之降解率……………………...…….56
表4.4.5 不同Cu0劑量對OG之降解率……………………...……….58
表4.4.6 不同Cu0劑量對CAP之降解率……………………...……...59
表4.4.7 不同OG初始濃度之降解率……………………………...….61
表4.4.8 不同CAP初始濃度之降解率…………………………...…...62
表4.4.9 自製與商用奈米零價銅對OG之降解率…………...……….64
表4.4.10 自製與商用奈米零價銅對CAP之降解率……………...….65

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