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研究生:曾信傑
研究生(外文):Hsin-Chieh Tseng
論文名稱:以水熱法磊晶成長氧化鋅薄膜之性質研究
論文名稱(外文):The study on the properties of hydrothermal epitaxial growth of ZnO thin films
指導教授:陳國駒
指導教授(外文):Guo-Ju Chen
學位類別:碩士
校院名稱:義守大學
系所名稱:材料科學與工程學系
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2019
畢業學年度:107
語文別:中文
論文頁數:102
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中文摘要 I
英文摘要 II
誌  謝 III
總 目 錄 IV
表 目 錄 VII
圖 目 錄 VIII
第一章 緒論 1
1-1前言 1
1-2研究動機 1
1-3論文思路 2
第二章 理論基礎 3
2-1氧化鋅之特性 3
2-2氧化鋅的光學性質 3
2-3能隙的計算 4
2-4電學性質 5
2-5薄膜成長機制 6
2-6磊晶理論 7
2-6-1磊晶薄膜生長[14] 7
2-6-2晶格不匹配(lattice mismatch)和熱不匹配(thermal mismatch) 8
2-6-3磊晶基板的選擇 9
2-7水熱法製程(Hydrothermal processing) 9
2-8文獻回顧 10
第三章 實驗方法與步驟 18
3-1實驗設備 18
3-2實驗流程 19
3-2-1靶材製備 19
3-2-2基板清潔 19
3-2-3實驗步驟與鍍膜參數 19
3-2-4氧化鋅晶柱成長 20
3-3薄膜性質分析 20
3-3-1 X光繞射分析(XRD) 20
3-3-2場發式掃描電子顯微鏡(FE-SEM) 21
3-3-3 紫外可見光光譜儀(UV-Visible) 22
3-3-4霍爾效應量測儀(Hall effect measurement) 22
第四章 Zn-O緩衝層製備及性質研究 34
4-1 不同氣氛比對ZnO薄膜性質影響 34
4-1-1 晶體結構分析 34
4-1-2 表面形貌分析 35
4-1-3 光學性質分析 36
4-1-4 電學性質分析 37
4-1-5 Figure Of Merit 37
4-1-6 Phi-scan分析 37
4-1-7 X-ray rocking curve分析 38
4-2 氧氣氛比40%不同濺鍍功率對ZnO薄膜性質影響 38
4-2-1 晶體結構分析 38
4-2-2 表面形貌分析 39
4-2-3 光學性質分析 39
4-2-4 電學性質分析 40
4-2-5 Figure Of Merit 40
4-3 氬氣氛不同濺鍍功率對ZnO薄膜性質影響 40
4-3-1 晶體結構分析 40
4-3-2 表面形貌分析 41
4-3-3 光學性質分析 42
4-3-4 電學性質分析 43
4-3-5 Figure Of Merit 43
4-4 氧氣氛比40%不同濺鍍時間對ZnO薄膜性質影響 43
4-4-1 晶體結構分析 43
4-4-2 表面形貌分析 44
4-4-3 光學性質分析 45
4-4-4 電學性質分析 45
4-4-5 Figure Of Merit 46
第五章 結論 81
參考文獻 83
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