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研究生:徐證甯
研究生(外文):Hsu, Zheng-Ning
論文名稱:深藍光純相位矽基液晶空間光調制器以多重曝光方法於無光罩全像微影應用
論文名稱(外文):Deep-blue light phase-only LCoS with multiple exposure method for mask-less lithography
指導教授:陳皇銘陳政寰陳政寰引用關係
指導教授(外文):Chen, Huang-Ming PhilipChen, Cheng-Huan
口試委員:李柏璁田仲豪林宏洲
口試委員(外文):Lee, Po-TsungTien, Chung-HaoLin, Hong-Cheu
口試日期:2018-11-22
學位類別:碩士
校院名稱:國立交通大學
系所名稱:光電工程研究所
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2018
畢業學年度:107
語文別:中文
論文頁數:55
中文關鍵詞:矽基液晶405 nm無光罩曝光
外文關鍵詞:LCoSDeep-blue LightMaskless Lithography
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第一章 序論 1
1.1 繞射光學元件概述 1
1.2 電腦全像片簡介 1
1.3 液晶簡介 3
1.3.1 液晶相 3
1.3.2 向列型液晶 4
1.3.3 單光軸液晶光學特性 5
1.4 光學微影 7
1.5 研究動機 7
1.6 論文架構 9
第二章 電腦全像片的理論與模擬 10
2.1 遠場繞射理論推導 10
2.2 LCoS-SLM 遠場繞射成像 14
2.3 遞迴傅立葉演算法 16
2.4 混和區域振幅自由度演算法 19
2.5 演算法模擬與比較 20
第三章 製程設備與量測系統 26
3.1 製程設備 26
3.2 分析儀器 28
3.2.1 光譜儀 28
3.2.2 偏光學顯微鏡 30
3.2.3 影像感應器 31
3.2.4 薄膜厚度輪廓測量儀 31
3.3 量測光學系統 32
第四章 矽基液晶相位調制器之特性 33
4.1 LCoS-SLM簡介 33
4.2 LCoS製程步驟 34
4.2.1 清洗基板 34
4.2.2 旋轉塗佈配向層 35
4.2.3 配向研磨 35
4.2.4 後段液晶盒組裝製程 36
4.3 純相位矽基液晶面板之特性量測 37
4.3.1 LCoS均勻度 38
4.3.2 驅動面板相位線性化校正 39
4.3.3 SLM反應時間 40
第五章 成像及顯影結果 42
5.1 全像曝光系統 42
5.2 成像結果之分析 43
5.3 光學微影步驟 47
5.4 光學微影結果的分析與比較 47
第六章 結論與未來展望 52
6.1 結論 52
6.2 未來展望 52
參考文獻 54
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