臺灣博碩士論文加值系統

高能脈衝磁控濺鍍(HiPIMS)技術為目前新一代的鍍膜技術，此技術的特色是藉由調變脈衝控制器的中斷時間(off time)來使靶材在極短脈衝時間內產生高達kW/cm^2的能量，使電漿密度提升進而使靶材的游離率提高，讓鍍製出的膜變的更緻密，有效提高膜的品質。本實驗使用高功率脈衝磁控濺鍍系統(HiPIMS)來鍍製高硬度抗反射多層膜，實驗第一階段藉由改變脈衝參數使其光學及機械性質有明顯變化來做分析，實驗第二階段則是根據前面實驗參數藉由光學軟體模擬設計出高硬度的多層抗反射膜並鍍製出來，最後將實驗成品做分析，得平均穿透率為93.7%的多層抗反射硬膜且硬度達到18GPa。

High power impulse magnetron sputtering, a new generation coating technology, is characterized for the high peak power up to kW/cm^2 by modulating on/off time of the pulse power controller. The plasma density near the sputtering target can be greatly increased to ionize the forming gases and Ar to improve the properties of the films effectively. In this study, anti-reflective hard coatings were deposited by high power impulse magnetron sputtering. First part of the study, nitride, oxynitride and silicon dioxide were prepared with different on/off time and analysed their optical and mechanical properties. Finally, the best parameters in the first part were applied to design and deposit multi-layer hard AR coating. The average transmittance of the AR coating was 93.7% and it’s hardness was 18 GPa.

摘要 i
Abstract ii
目錄 iii
圖目錄 v
表目錄 ix
第一章 緒論 1
1-1 前言 1
1-2 研究動機 4
第二章 超高硬度光學薄膜設計 6
2-1 光學薄膜理論 6
2-2 高硬度光學多層膜設計 9
第三章 實驗方法 19
3-1 磁控濺鍍系統 19
3-1-1 高能脈衝磁控濺鍍系統 21
3-1-2 高功率脈衝電源控制系統 24
3-1-3 脈衝製程參數 24
3-2 基板規格及清潔流程 27
3-3 實驗流程 28
3-4 實驗步驟 29
3-5 薄膜性質分析 30
3-5-1 硬度分析 30
第四章 結果與討論 34
4-1 氮化矽薄膜製程結果與討論 34
4-2 氮氧化矽薄膜製程結果與討論 43
4-3 氧化矽薄膜製程結果與討論 55
4-4 光學抗反射多層膜 64
4-4-1 氧化矽與氮化矽之多層抗反射膜 64
4-4-2 氮氧化矽與氮化矽之多層抗反射硬膜 67
4-4-3 氮氧化矽與氮化矽之藍寶石抗反射多層膜 71
第五章 結論 73

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