臺灣博碩士論文加值系統

本論文使用不同大小的奈米球於玻璃基板上，在反應離子蝕刻（Reactive Ion Etching；RIE）機台中縮其大小，並使用熱蒸鍍法（Thermal Evaporation；TE）蒸鍍50nm厚的金（Au）膜隨後使用舉離法（Lift off）將奈米球去除掉，最後製作出不同週期性的奈米洞陣列（Nanohole array），後續在進一步的量測。
實驗中使用奈米球微影術（Nanosphere Lithography；NSL）來製作緊密單層的遮罩，是為了後續能更快速的製作奈米洞陣列。在過程中也使用掃描式電子顯微鏡（Scanning Electron Microscope；SEM）觀察每個實驗步驟及樣品的表面均勻性。
在量測部分，將不同孔徑的奈米洞分別都浸泡在不同環境折射率的匹配液中（Reflective Index Liquid），並且使用穿透式光譜儀（Transmittance Spectrometer, TS）對樣品量測其光學穿透波長，進而探討奈米洞的週期間距與在不同環境折射率下對於表面電漿子（Surface Plasmon；SP）所帶來的影響。最後使用COMSOL 3.5 a 模擬進一步的電場與實驗數據達到準確性。

Different periodic nanohole arrays were fabricated using Nanosphere Lithography (NSL) to assemble different sizes of nanospheres on glass substrate. The size of the nanospheres was reduced by Reactive Ion Etching (RIE) followed by 50nm gold (Au) film deposition using Thermal Evaporation (TE). A lift-off process was conducted to remove the nanospheres and then the different periodic nanohole arrays were formed.
NSL was used to make compact mono-layer of nanospheres as etching mask for the nanohole arrays fabication. Scanning Electron Microscope (SEM) was used to observe the surface uniformity of samples for each experimental step.
The samples with different sizes of nanoholes were immersed in a refractive index matching liquid (Reflective Index Liquid) followed by the measurement of the wavelength of the light transmission using Transmittance Spectrometer (TS). The influences of the periodic spacing of the nano-holes under different environmental refractive indices were investigated at last.

第一章 緒論.....11
1.1 前言.....11
1.2 表面電漿共振簡介.....11
1.3 十二烷基硫酸鈉.....12
1.4 文獻回顧與研究目的.....13
第二章 基礎理論.....21
2.1 表面電漿共振理論.....21
2.1.1 介電質與金屬表面之表面電漿模態.....21
2.1.2 局域性的表面電漿共振.....27
2.1.3 金屬表面電漿之激發.....31
2.2 奈米球微影術結合反應離子蝕刻.....33
第三章 實驗方法.....36
3.1 實驗儀器介紹.....36
3.1.1 旋轉塗佈機（Spin-Coating）.....36
3.1.2 X-Z驅動軸.....37
3.1.3 常壓電漿（Atmospheric-pressure plasma／Plasma jet...38
3.1.4 反應式離子蝕刻 (Reactive-Ion Etching, RIE).....40
3.1.5 熱蒸鍍 (Thermal Evaporation Deposition).....42
3.1.6 掃描式電子顯微鏡 (Scanning Electron Microscope, SEM).45
3.1.7 穿透光譜儀(VIS Spectrometer).....46
3.1.8 COMSOL模擬軟體（COMSOL Multiphysics）.....47
3.2 實樣品製備流程.....48
3.2.2 樣品基板清洗.....50
3.2.3 基板表面二次改質.....50
3.2.4 藥品溶液調配.....51
3.2.5 奈米球塗佈流程.....52
3.2.6 反應離子蝕刻縮小奈米球.....53
3.2.7 熱蒸鍍金膜.....54
3.2.8 舉離奈米球.....54
第四章 結果與討論.....55
4.1 奈米球遮罩製作.....55
4.2 金奈米洞製作.....59
4.3 環境折射率之量測.....62
4.3.1 實驗量測.....62
4.3.2 實驗模擬.....62
4.3.3 實驗穿透光譜.....63
第五章 結論與未來展望.....79
5.1 結論.....79
5.2 未來展望.....80
參考文獻.....81

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