寬頻超穎透鏡有別於傳統相機鏡頭，能在小尺寸下達到消色差的效果，這使得許多光學元件在體積及重量上能大大縮小。因此近幾年來各個研究團隊不斷致力於研發寬頻超穎透鏡，但目前主流的設計方法並無法達成無偏振選擇特性，且透鏡效率值較低，操作頻寬過窄，使得其在實際應用上遇到了瓶頸。
本篇論文將探討超穎透鏡的發展，並在設計、模擬、製程、量測上做詳細的介紹。我們選用六角環柱之氮化鎵材料進行單元結構設計，最終完成在各種線偏振角度入射下均能聚焦的無偏振選擇超穎透鏡，且其在波長633奈米處效率高達90%，操作頻寬由整個可見光區至近紅外光，並且能在量測上達到白光聚焦的效果。在文末也提及使用多週期合併之設計方法，預期能擴大設計區域並獲取更大的數值孔徑。總體而言，超穎透鏡極具發展潛力，預期在未來將會取代許多傳統光學透鏡。

Broadband meta-lenses are different from traditional camera lenses.They can achieve achromatic effects in tiny units and make many optical components much smaller in size and weight. Therefore, in recent years, various research teams have been working hard to develop broadband meta-lenses. However, current design methods can not achieve non-polarization selective characteristics, the efficiency of the meta-lenses is low, and the operation bandwidth is too narrow. These problems make it encounter bottlenecks in practical applications.
This paper explores the development of meta-lenses and provides a detailed introduction to design, simulation, process, and measurement. We chose gallium nitride material and hexagonal ring-column for cell structure design and finally completed the non-polarization-selective meta-lens that could focus at various angles of linear polarization. Its efficiency was about 90% at a wavelength of 633 nm. The operating bandwidth was from the entire visible region to the near-infrared light. The white light focusing could also be achieved on the measurement. At the end of the paper, We propose the design method of multi-cycle meta-lens and expect to expand the design area and obtain a larger numerical aperture. In general, meta-lenses have great potential to replace many traditional optical lenses in the future.

口試委員審定書 I
致謝 II
中文摘要 III
Abstract IV
目錄 V
第一章 超穎透鏡的原理及發展 1
1-1 廣義司乃耳定理(Generlized Snell’s law) 1
1-2 繞射極限(Diffraction limit) 2
1-3 電磁波的極化 4
1-4 極化狀態的表示與量測 5
1-5 像差與色散 7
1-6 寬頻超穎透鏡發展 8
第二章 儀器介紹 11
2-1 電漿輔助化學氣相沉積(Plasma-Enhanced Chemical Vapor Deposition,PEVCD) 11
2-2 旋轉塗佈機 (Spin Coater) 12
2-3 電子束微影系統(E-Beam Lithography) 12
2-4 電子束蒸鍍 (E-Gun Evaporation) 15
2-5 反應離子蝕刻(Reactive-Ion Etching) 16
2-6 感應式耦合電漿蝕刻(ICP-RIE) 17
2-7 掃描式電子顯微鏡(Scanning Electron Microscope) 18
第三章 元件設計 19
3-1 無偏振選擇寬頻消色差超穎透鏡 19
3-2 透鏡設計參數 19
3-3 超穎透鏡的相位分佈 21
3-4 單元結構的CST模擬 24
3-5 線性回歸 26
3-6 透鏡設計參數 28
3-7 CST模擬聚焦情況 28
第四章 樣品製程 31
4-1 初始樣品準備 31
4-2 樣品表面清潔 31
4-3 PECVD沉積二氧化矽硬遮罩薄膜 32
4-4 電子束光阻塗佈 32
4-5 電子束微影製程 33
4-6 顯影製程 34
4-7 鉻金屬層電子槍蒸鍍 35
4-8 光阻掀離製程 35
4-9 反應離子蝕刻二氧化矽 36
4-10 去除鉻金屬層 37
4-11 ICPRIE蝕刻單晶矽 37
4-12 去除二氧化矽薄膜 38
第五章 量測與分析 39
5-1 量測儀器簡介 39
5-2 光路架構 40
5-3 量測方法 41
5-4 分析程式 42
5-5 量測結果 43
5-6 結果比較 46
5-7 無偏振選擇的超寬頻帶超穎透鏡 47
結論及未來展望 51
參考文獻 52

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