臺灣博碩士論文加值系統

在本研究藉由輸出功率控制，成功透過射頻磁控濺鍍鍍製出不同特徵結構的氮化矽鉬單層膜。單層膜中矽含量控制在0至19原子百分比。隨著薄膜中矽含量和輸出功率的增加，單層膜的微觀結構從氮化鉬（111）優選取向演變為標準的氮化鉬，然後再演變為非晶結構。由Mo-3p1，Mo-3p3，Si-2p和N-1s的穩定鍵結表示氮化矽鉬薄膜具有良好的熱穩定性。氮化矽鉬多層膜系統由"優選取向/含矽優選取向" 、 “優選取向/非晶" 、"含矽優選取向/非晶"的結構特徵交互堆疊組成。由優選取向的氮化鉬和優選取向的氮化矽鉬製成的多層膜顯示出明顯的晶體結構，氮化矽鉬多層膜系統的非晶結構有效地抑制了柱狀晶生長的連續性。然而，由於晶粒不同的方向性和生長空間的限制，氮化鉬（200）的晶粒比氮化鉬（111）生長得更好。對於單層膜具有最高的硬度，楊氏模量和最低的磨擦係數，是由於晶粒細化和固溶強化的影響。氮化矽鉬多層膜在混合規則下，平均硬度在單層之間為17.2GPa。在磨耗性能評估，較高的矽含量約12原子百分比提供了相對緊湊的結構，S-100至S-150樣品在磨耗軌跡中沒有任何薄膜破裂。與單層膜相比，多層膜表現出更好的耐磨性。通過多層堆疊，韌性得到改善，CPR從469.8升至758.3。在刮痕測試中，多層膜與單層膜相比，裂紋和破裂被延後至到較高的載荷位置並限制在較小的區域。

In this research, the MoSiN single layer and multilayer films were fabricated by a reactive radio frequency, r.f., magnetron sputtering system with input power manipulation. The incorporation of Si contents in the coating was controlled from 0 to approximately 19 at.%. The microstructure of the MoSiN single layers evolved from Mo2N (111) preferred orientation to standard Mo2N, then to amorphous feature with Si doping amounts and input powers. Stable bonding of Mo-3p1, Mo-3p3, Si-2p, and N-1s, indicated a good thermal stability MoSiN films. The MoSiN multilayer coatings were fabricated with Mo-N and MoSiN layers with sequential stacking of any two building layers of distinct microstructure. The multilayer film made of Mo-N and MoSiN columnar layers showed an obvious crystalline structure, while the amorphous MoSiN layer incorporated multilayer MoSiN systems effectively suppressed the continuity of the columnar crystal growth. However, the grain of Mo2N (200) grew better than Mo2N (111), as a result of different directionality and limitation of grain growth space. Single layer has the highest hardness, Young’s modulus and lowest COFs, due to the grain refinement and solid solution strengthening. For the MoSiN multilayers, an average hardness of 17.2 GPa, which was between those staked single layers, was expected under the rule of mixture. For tribological analysis, a higher silicon content,12at. %, namely S-100 to S-150 provided the relatively compact structures without any chipping. As compared to monolayer coating, the multilayers coatings exhibited better wear resistance. By multilayer stacking, the toughness of the coatings was improved and the CPRs went from 469.8 to 758.3. And for scratch behavior, the cracking and chipping were delayed to higher load positions and were confined within smaller region, as compared with monolayers.

摘要 I
Abstract II
Contents III
Table List VI
Figure Captions VII
Chapter 1 Introduction 1
1.1 Background 1
1.2 Material Systems 1
1.3 Critical Issues 2
1.4 Objective 2
Chapter 2 Literature review 3
2.1 Surface engineering 3
2.1.1 Surface engineering and applications 4
2.2 Sputter technology 5
2.2.1 Plasma theory 5
2.2.2 Plasma detection 5
2.2.3 Sputtering theory 6
2.2.4 RF sputtering 7
2.2.5 Magnetron sputtering 7
2.2.6 Reactive Hysteresis effect 8
2.2.7 Thin film growth 8
2.3 Multilayer coatings 9
2.4 MoN coatings 10
2.4.1 Introduction of hard coatings 10
2.4.2 Introduction to MoN coatings 10
2.4.3 Microstructure and phase characteristics 11
2.4.4 Mechanical properties 11
2.4.5 Wear resistant 12
2.5 Nanocomposite 13
2.6 MoN Multilayer coatings 13
Chapter 3 Experimental Procedures 34
3.1 Design Philosophy 34
3.2 Sputtering deposition of MoN coatings 34
3.2.1 Substrate preparation 34
3.2.2 Coating sputtering process 35
3.3 Measurements and analysis 36
3.3.1 Microstructure features 36
3.3.2 Characteristic analysis 37
Chapter 4 Results and Discussion 54
4.1 MoSiN single layer coatings 54
4.1.1 Composition analysis 54
4.1.2 Phase identification 54
4.1.3 Plasma identification 55
4.1.4 Microstructure investigation 56
4.2 MoN multilayer coatings 59
4.2.1 Composition analysis 59
4.2.2 Phase identification 59
4.2.3 Microstructure investigation 60
4.2.4 Chemical composition analysis 65
4.3 Mechanical characterization 66
4.3.1 Hardness evaluation 66
4.3.2 Wear resistance 67
4.3.3 Rockwell C adhesion test 69
4.3.4 Scratch test 70
Chapter 5 Conclusions 138
References 140
Appendix 152

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