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研究生:黃偉哲
研究生(外文):Wei-che Huang
論文名稱:利用陰極電弧脈衝電流改質 CrAlSiN 硬質薄膜之腐蝕及磨耗研究
論文名稱(外文):Study on corrosion resistance and wear resistance of CrAlSiN hard coatings improved by using cathodic arc deposition with pulse-current
指導教授:許正勳許正勳引用關係
指導教授(外文):Cheng-Hsun Hsu
口試委員:許正勳
口試委員(外文):Cheng-Hsun Hsu
口試日期:2018-12-03
學位類別:博士
校院名稱:大同大學
系所名稱:材料工程學系(所)
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2018
畢業學年度:107
語文別:中文
論文頁數:125
中文關鍵詞:銑刀脈衝電流技術沉積技術CAE
外文關鍵詞:Milling cutterPulse current technoloydeposition technologyCAE
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本研究以改進現有的CAE沉積技術和使用脈衝電流技術開發CrAlSiN薄膜,並針對CrAlSiN鍍膜的優異性能提出實驗報告。採用之陰極電弧沉積系統鍍覆CrAlSiN 薄膜在碳化鎢及304不銹鋼基材上。此種CAE鍍膜機配有兩個陰極電弧蒸發源,可以安裝直徑為6吋的金屬靶材。陰極電弧蒸發源有安裝磁鐵,具有穩定及控制電弧點、增加電弧點的移動速率的作用,先鍍CrN當介面層再鍍上CrAlSiN薄膜。設計的CrAlSiN薄膜實驗為通入反應氣體N2,改變陰極電弧蒸發源之電流輸出,分別為(一)90A對照組 、 90-120A脈衝電流、90-150A脈衝電流等三種條件及(二) 90A對照組 、 90-150A脈衝電流之脈衝週期1ms、3ms等三種條件進行離子披覆CrAlSiN薄膜,沉積時間為40 mins。CrAlSiN系統S1樣品的硬度值為3240Hv,S2的硬度值為3337Hv和S3樣品的硬度值為4145Hv,脈衝電流從90 / 120A增加到90 / 150A,CrAlSiN塗層的硬度從S2的3337Hv增加到S3樣品的4145Hv,硬度的急劇增加,且達到最大硬度值。CrAlSiN-90的Rp值為6506642、CrAlSiN-1.0的Rp值為16266053、CrAlSiN-3.0的Rp值為23118408,表示高的脈衝電流功率週期沉積的CrAlSiN具有更高的Rp值,該增加值表示在實驗中獲得的耐腐蝕性更好。實驗結果顯示,相對於微小銑刀的有效切削長度,S1刀的壽命改善增加75%、S2刀的壽命改善增加165%、S3刀的壽命改善增加117.5%。再以S1刀的壽命為基礎,S2刀的壽命改善增加51%、S3刀的壽命改善增加24%。
In order to improve the existing CAE deposition technology and use pulse current technology to develop CrAlSiN film, the paper presents an experimental report on the excellent performance of CrAlSiN coating. The cathode Arc deposition system is applied to CrAlSiN film on tungsten carbide and 304 stainless steel substrates. The CAE coating machine is equipped with a cathode arc evaporation source which can be fitted with a metal target with a diameter of 6 inches. The cathode arc evaporation source has the installation magnet, which has the function of stabilizing and controlling the arc point and increasing the movement rate of the arc point. The CrAlSiN film was designed to N2 the current of the cathode arc evaporation source, respectively (a) 90A control group, 90-120A Pulse Current, 90-150a pulse current and other three kinds of conditions and (b) 90A control group, 90-150a Pulse cycle 1ms, 3ms and other three conditions for ion coating CrAlSiN film, deposition time of 40 mins.The hardness value of the CrAlSiN system S1 sample is 3240Hv, the hardness value of the CrAlSiN system S2 sample is 3337Hv and S3 sample 4145Hv, Pulse current from 90/120A to 90/150A,cralsin coating hardness from S2 3337Hv increased to S3 sample 4145Hv, hardness increased sharply, and reached the maximum hardness value. CrAlSiN-90 of Rp is 6506642、CrAlSiN-1.0 of Rp is 16266053、CrAlSiN-3.0 of Rp is 23118408. The Cralsin with high pulse current power cycle deposition has higher RP value, which indicates that the corrosion resistance obtained in the experiment is better. The experimental results show that compared with the effective cutting length of the small milling cutter, the life of the S1 cutter increases by 75%, the life of the S2 knife increases by 165%, and the life of S3 knife increases by 117.5%. Based on the life of S1 knife, the life of S2 knife increases by 51% and the life of S3 knife increases by 24%.
摘要 I
Abstract III
誌 謝 V
表目錄 VIII
圖目錄 XIII
第一章 前言 1
1.1. 研究動機 1
1.2. 研究目的 3
第二章 文獻回顧 4
2.1. 脈衝陰極電弧蒸鍍的發展 4
2.2. 沉積後的熱處理對鍍膜影響 13
2.3. CrAlSiN 鍍膜的特徵 16
2.4. TiSiN鍍層的特性 20
第三章 實驗方法與步驟 22
3.1.實驗設計與流程 22
3.2.基材準備 25
3.3.鍍膜前處理 27
3.4.CAE鍍膜處理 28
3.5鍍膜結構及形貌分析 31
3.5.1. XRD結構分析(X-Ray diffraction,XRD) 31
3.5.2. 膜厚量測 31
3.5.3. 表面形貌及粗糙度分析 32
3.6.鍍膜特性分析 36
3.6.1附著性試驗 36
3.6.2維氏硬度試驗 36
3.6.3磨耗試驗 38
3.6.4電化學腐蝕試驗 39
3.6.5熱分析 41
第四章 脈衝電弧電流對 CrAlSiN 鍍層特性的影響 43
4.1. 陰極電弧蒸鍍源的電流輸出之選擇 43
4.2. CrAlSiN鍍層膜厚分析 44
4.3. CrAlSiN鍍層系統表面及斷面形貌分析 46
4.4. CrAlSiN鍍層系統表面粗糙度量測分析 50
4.5 CrAlSiN鍍層系統結構分析 51
4.6. CrAlSiN鍍層系統表面硬度分析 52
4.7. CrAlSiN鍍層系統耐磨耗分析 53
4.9. CrAlSiN鍍層耐腐蝕性分析 56
4.10. CrAlSiN鍍層熱行為分析 59
第五章 脈衝電流輸入週期改變對CrAlSiN鍍層的影響 63
5.1 CrAlSiN 鍍膜的陰極電弧蒸發技術 63
5.2 CrAlSiN 鍍膜的陰極電弧蒸發週期參數設定 65
5.3 CrAlSiN 鍍膜的結構分析 66
5.3.1 XRD結構分析 66
5.3.2 CrAlSiN鍍膜的厚度和粗糙度量測 67
5.3.3 TGA / DSC對CrAlSiN薄膜的熱行為分析 69
5.3.4 腐蝕行為分析 72
第六章 CrAlSiN 薄膜應用在微小銑刀的切削特性分析 75
6.1 CrAlSiN 薄膜在微小銑刀的製程 75
6.2 CrAlSiN 薄膜應用在電路板的切削距離比較 79
6.3 CrAlSiN 薄膜應用在電路板切削距離的迴歸分析 84
第七章 CrAlSiN 薄膜的製程與特性比較 89
第八章 結論 92
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