臺灣博碩士論文加值系統

電致色變是近年來受矚目的新興技術，並能應用於節能智慧窗、汽車天窗、防眩光後視鏡、電子標籤等，但是目前除了製程限制外尚包括電極元件間的附著弱化，酸性液態電解質之腐蝕效應、長期強光照射高溫環境導致電解質劣化與漏液等，均為導致電致色變材料使用壽命短、低光學密度及著色緩慢之原因。
本研究所提田口方法優化電致色變薄膜，透過此方法並能結合專家經驗法則相互整合，大量減少實驗次數，更能有效的尋找出電致色變薄膜最佳製程參數製備氧化鉬薄膜，根據田口方法預測分析顯示，最適合實驗參數組合為濺鍍功率200W及氧氣流量20sccm時，並經由預測分析結果可知，原始參數濺鍍功率50W與氧氣流量5sccm時，S/N比為42.76，優化後可達到S/N比為51.20，相差將近8.43。
並且透過XRD、SEM、電致色變特性、光學分析以及XPS分析濺鍍功率與氧氣流量對氧化鉬薄膜特性影響，結果顯示由JCPDF card 89-1554、JCPDF card 65-1273顯示實氧化鉬薄膜為單斜結晶結構具有MoO3、MoO2，濺鍍功率50、100、200W時優選方位為MoO2(011)，濺鍍功率150W時優選方位為MoO2(110)。微觀結構可以觀察到，表面形貌成等軸狀結構，當氧氣流量增加，當氧氣流量增加，表面顆粒尺寸變小、晶界密度上升，表面型態變得緻密。光穿透度分析結果顯示，最佳參數為150 W氧氣流量20 sccm，紫外光(400 nm)、藍光(470 nm )、可見光(550 nm)、紅外光(800 nm)光學調變(ΔT)分別為16.4、26.9、40.9、39.3，光學密度(ΔOD)分別為0.262、0.368、0.525、0.403，著色效率(CE)為17.345、24.336、34.758、26.673。化學成分分析結果顯示，在O1s細部分鋒圖發現，當氧氣流量上升，MoO3比例也會上升，由此可得到氧氣流量上升，結晶結構優選方位特徵峰增強，表面形貌粒徑下降使界面密度上升增加電致色變反應面積，在電致色變特性與光學特性也有顯著的上升。

Electrochromism is an emerging technology that has attracted attention in recent years, and can be applied to energy-saving smart windows, car sunroofs, anti-glare mirrors, electronic tags, etc. However, in addition to process limitations, it also includes weak adhesion between electrode elements, the corrosive effect of acidic liquid electrolytes, long-term strong light exposure to high-temperature environments, electrolyte degradation and liquid leakage, which all lead to short service life, low optical density and slow coloring.
The Taguchi method is optimized in this research. The electrochromic film can be optimized through this method and can be integrated with the rules of experience of experts to greatly reduce the number of experiments. It is more effective to find the optimal process parameters of electrochromic films to prepare molybdenum oxide films. According to the prediction analysis of Taguchi method, the most suitable combination of experimental parameters are sputtering power of 200W and oxygen flow rate of 20 sccm. And according to the prediction results, when the original parameters of sputtering power of 50W and oxygen flow rate of 5 sccm, the S / N ratio is 42.76. It can reach S / N ratio of 51.20, a difference of nearly 8.43.
In this paper, the effects of sputtering power and oxygen flow rate on the characteristics of molybdenum oxide films are discussed through XRD, SEM, electrochromic characteristics, optical analysis, and XPS analysis. The results show that the JCPDF card 89-1554 confirmed that the molybdenum oxide thin film is an monoclinic structure. The MoO3 thin film has a peak plane with crystals at an angle of 26.324 °, and when the sputtering power is 50 ~ 200W, the preferred orientation of the crystal plane is (111).
It can be observed in the microstructure that the surface morphology becomes an equiaxed structure. When the oxygen flow rate increases, the surface grain size becomes smaller, the grain boundary density increases, and the surface pattern becomes denser. The light transmittance analysis results show that the optimal parameters (sputter power 150 W oxygen flow 20 sccm) in the optical properties of ultraviolet (400 nm), blue (470 nm), visible (550 nm), and infrared (800 nm) The modulation (ΔT) is 16.4, 26.9, 40.9, and 39.3. The optical density (ΔOD) is 0.262, 0.368, 0.525, 0.403, and the coloring efficiency (CE) is 17.345, 24.336, 34.758, 26.673. The chemical composition analysis results show that in the detailed front view of O1s, it is found that when the oxygen flow rate rises, the MoO3 proportion will also increase. From this, it can be seen that as the oxygen flow rate rises, the preferred azimuth characteristic of the crystal structure is strengthened, and the surface morphology and particle size decrease to make the surface more dense, the electrochromic characteristics and optical characteristics have also significantly increased.

摘　　要 1
ABSTRACT 3
致謝 6
圖目錄 9
表目錄 11
第一章 前言 12
第二章 研究動機 17
第三章 文獻探討 19
3.1電致色變薄膜架構 19
3.2電致色變薄膜變色機制 20
3.2.1色心理論 21
3.2.2價間電荷遷移理論 22
3.2.3能帶成色 22
3.3電致色變相關文獻 23
3.4氧化鉬的結構 24
3.5濺射原理 25
3.6薄膜成長機制 29
3.7薄膜之微觀結構 30
第四章 研究方法與流程 33
4.1 電致色變元件製程參數 33
4.2 田口方法 36
4.2.1 選定品質特性 36
4.2.2 判定品質特性之理想機能 37
4.2.3 決定控制因子並定出水準 37
4.2.4 直交表選定及參數因子配置 38
4.3 研究設備 40
4.4儀器分析量測 41
4.4.1結晶結構分析（X-ray diffractometer，XRD） 41
4.4.2掃描式電子顯微鏡分析（Scanning Electron Microscopy，SEM） 42
4.4.3光學性質量測 紫外光-可見光譜 43
4.4.4電化學反應 44
4.4.5 X光光電子能譜儀（X-ray photoelectron spectroscopy，XPS） 45
第五章 結果與討論 46
5.1 田口方法優化氧化鉬薄膜分析與探討 46
5.2 田口方法優化氧化鉬薄膜驗證分析與薄膜特性影響 50
5.2.1 結晶型態分析 51
5.2.2 微觀結構觀察 54
5.2.3 電致色變特性 58
5.2.4 光穿透度特性 63
5.2.5 化學成份分析 71
第六章 結論 79
6.1 田口方法優化氧化鉬薄膜 79
6.2 濺鍍功率與氧氣流量對氧化鉬薄膜特性影響 79
參考文獻 81

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