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研究生:卓文瑜
研究生(外文):Wen-Yu Cho
論文名稱:以脈衝直流反應性濺鍍製備氧化鋁薄膜於氮化鋁鎵/氮化鎵高電子遷移率電晶體之界面性質探討
論文名稱(外文):Interface electrical properties of aluminum oxide thin films on AlGaN/GaN HEMTs prepared by Pulsed DC reactive sputtering
指導教授:陳一塵陳一塵引用關係
指導教授(外文):I-Chen Chen
學位類別:碩士
校院名稱:國立中央大學
系所名稱:材料科學與工程研究所
學門:工程學門
學類:材料工程學類
論文出版年:2020
畢業學年度:108
語文別:中文
論文頁數:58
中文關鍵詞:反應性濺鍍氧化鋁薄膜介電常數高電子遷移率電晶體
外文關鍵詞:Reactive sputteringAlumina filmDielectric constantHigh electron mobility transistors
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  具有優異物理特性的氮化鋁鎵/氮化鎵(AlGaN/GaN)高電子遷移率電晶體(HEMTs)被視為是下世代主要的高功率元件之一。由於金屬-半導體接觸形成之蕭特基(Schottky)閘極結構易導致漏電流過大,使得有效的閘極電壓範圍受到了限制。因此在閘極電極下方沉積一層絕緣層來消除閘極漏電流的設計可使得元件可靠度大為提升,這種堆疊結構被稱為金屬氧化物半導體結構,其能有效地避免蕭特基閘極結構所造成的問題。
  本研究藉由非對稱雙極直流脈衝反應性濺鍍系統,沉積氧化鋁薄膜做為金屬氧化物半導體結構的閘極介電材,在不同氧比例與基板溫度條件下,以達到降低介電薄膜/AlGaN界面之缺陷密度,探討氧化鋁薄膜的介電性質的表現。在常溫環境下經由調變氧比例沉積氧化鋁薄膜,雖然不同氬氣與氧氣混合比例氛圍中,其氧化鋁薄膜沉積之介電性質不同,但由於其氧化程度不完全導致介電特性仍較差,後續本研究利用基板升溫進行直流脈衝反應性沉積氧化鋁薄膜於AlGaN/GaN上,經由電容-電壓量測來分析氧化鋁薄膜的性質,並計算其介電常數及界面缺陷密度的變化,目前初步得到在氧比例為0.87 %、基板溫度為300度條件下沉積之氧化鋁薄膜,經由成分組成分析得知其擁有好的化學劑量比,介電常數為3.87,氧化鋁薄膜/AlGaN界面缺陷密度(interface trap density)為2.08×1012 cm-2eV-1,並藉由時間相關介電崩潰測試得知在基板升溫下氧化鋁薄膜介電能力有大幅提升的現象。
AlGaN/GaN high-electron-mobility transistors (HEMTs) with excellent physical properties are attractive for high-power devices in next generation. However, metal and semiconductor interface with Schottky contact is easlier to leakage and the effective gate voltage was confined. Therefore, an insulating layer below the gate has to be introduced to eliminate gate leakage and improves devices reliability. This will give rise to the so called Metal Oxide Semiconductor (MOS) structures.
In this research, sputtered-Al2O3 thin film as dielectric layer to discuss the interface trap density (Dit) in different deposited oxygen flow (0.54 %, 0.87 %, 1.00 % and 1.55 %) and growth temperature (150 °C and 300 °C) conditions by asymmetric bipolar DC pulse reactive sputtering system. The sputtered films exhibit a stoichiometric composition, which was confirmed using X-ray photoelectron spectroscopy (XPS). Furthermore, using capacitance-voltage (C-V) measurement to analysis and calculate the values of dielectric constant and interface trap density. Ultimately, when the conditions of Al2O3 thin film deposited oxygen flow is 0.87 % and growth temperature at 300 °C, the dielectric constant and interface trap density are 3.87 and 2.08×1012 cm-2eV-1, respectively.
摘要 i
Abstract ii
圖目錄 v
表目錄 vii
第一章 緒論 1
第二章 文獻回顧 2
2-1脈衝直流反應性磁控濺鍍技術沉積氧化鋁薄膜 2
2-1-1脈衝直流反應性磁控濺鍍技術的背景發展 2
2-1-2反應性脈衝直流磁控濺鍍原理 3
2-1-3影響反應性脈衝直流磁控濺鍍的因素 4
2-1-4沉積氧化鋁薄膜的方法 7
2-1-5介電材料的選擇 7
2-2 AlGaN /GaN HEMT理論基礎 8
2-2-1高功率半導體元件性質 8
2-2-2 AlGaN/GaN高電子遷移率電晶體簡介 9
2-3 金屬氧化物半導體結構的電容電壓特性 11
2-3-1 MOS結構的電容電壓特性區間 11
2-3-2 MOS結構的電荷捕捉與發射機制 12
2-3-3界面之間的遲滯特性 13
2-3-4評估氧化鋁薄膜介電品質的方法 15
2-3-5 MOS結構的能帶理論 17
第三章 實驗步驟 19
3-1電子束蒸鍍環形歐姆接觸金屬電極 19
3-2 反應性磁控濺鍍氧化鋁介電材步驟 20
3-3 電子束蒸鍍環形閘極蕭基接觸金屬電極步驟 20
第四章 實驗結果探討 21
4-1 直流脈衝反應性沉積條件調控 21
4-1-1非對稱直流脈衝功率源輸出特性 21
4-1-2反應性濺鍍過程之電漿穩定性與工作區間測試 22
4-2 直流脈衝反應性沉積氧化鋁薄膜基本性質分析 24
4-2-1 氧化鋁薄膜沉積速率與薄膜厚度之觀察 24
4-2-2氧化鋁薄膜表面結構尺寸與粗糙程度之觀察 27
4-2-3氧化鋁薄膜成份組成分析 29
4-3 直流脈衝反應性濺鍍氧化鋁薄膜之MOS結構電性探討 31
4-3-1 直流脈衝反應性濺鍍氧化鋁薄膜之MOS結構的C-V特性曲線 31
4-3-2 氧化鋁薄膜之介電常數探討 34
4-3-3 氧化鋁薄膜/AlGaN之界面狀態密度探討 35
4-3-4 氧化鋁薄膜之介電崩潰測試 37
第五章 結論 39
參考文獻 40
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