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研究生:張家豪
研究生(外文):CHANG, JIA-HAO
論文名稱:鉿鈮鉭鈦鋯高熵合金表面性質及離子釋出行為之研究
論文名稱(外文):Surface Properties and Selectively Leaching Behaviors of HfNbTaTiZr High Entropy Alloys
指導教授:張世航郭文堯
指導教授(外文):CHANG, SHIH-HANGKUO, WEN-YAO
口試委員:吳錫侃林新智周棟勝
口試委員(外文):WU, SHYI-KAANLIN, HSIN-CHIHCHOU, TUNG-SHENG
口試日期:2020-07-21
學位類別:碩士
校院名稱:國立宜蘭大學
系所名稱:化學工程與材料工程學系碩士班
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:2020
畢業學年度:108
語文別:中文
論文頁數:56
中文關鍵詞:HfNbTaTiZr高熵合金腐蝕浸出X光光電子能譜分析電化學性質
外文關鍵詞:HfNbTaTiZr HEAsleachingXPS analysiselectrochemical properties
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本研究係探討HfNbTaTiZr、HfNbTaTi、HfNbTaZr及HfNbTiZr四種成分高熵合金的表面性質及腐蝕浸出之研究。X光繞射分析結果顯示HfNbTaTiZr、HfNbTaTi、HfNbTaZr及HfNbTiZr高熵合金於室溫下皆屬於BCC晶體結構。X光光電子能譜分析結果顯示Hf、Nb、Ta及Zr元素於表面大部分以HfO2、Nb2O5、Ta2O5及ZrO2氧化態形式存在,僅存在少部分金屬態;而Ti元素於表面觀察到的皆為TiO2氧化態,並無觀察到金屬態存在。電化學測試結果顯示,HfNbTaTiZr、HfNbTaTi、HfNbTaZr及HfNbTiZr高熵合金與316L不鏽鋼有相近的腐蝕電位及腐蝕電流,表示四種成分高熵合金具有與316L不鏽鋼相似的耐腐蝕性質。原子力顯微鏡表面型態分析結果顯示,HfNbTaTiZr、HfNbTaTi、HfNbTaZr及HfNbTiZr高熵合金與316L不鏽鋼經過電化學測試後,表面粗糙度皆有所上升。腐蝕浸出結果顯示,HfNbTaTiZr、HfNbTaTi、HfNbTaZr及HfNbTiZr高熵合金經過60天腐蝕浸出後,Hf及Ta元素釋出量相較Nb及Zr元素高出許多,而Ti元素釋出量則為最低。雖然HfNbTaTiZr、HfNbTaTi、HfNbTaZr及HfNbTiZr高熵合金離子釋出量高出預期,但其組成元素皆具有高度的生物相容性,因此HfNbTaTiZr、HfNbTaTi、HfNbTaZr及HfNbTiZr高熵合金於生醫材料領域發展仍具有相當的應用潛力。
The surface properties and the selectively leaching behaviors of HfNbTaTiZr, HfNbTaTi, HfNbTaZr, and HfNbTiZr high entropy alloys (HEAs) were investigated in this study. X-ray diffraction results showed that HfNbTaTiZr, HfNbTaTi, HfNbTaZr, and HfNbTiZr HEAs all possessed a BCC structure at room temperature. X-ray photoelectron spectroscopy results revealed that most Hf, Nb, Ta, Zr near the surface of these HEAs were in their oxidation states, rather than in their metallic states. The Ti on the surface of these HEAs was mostly in the highly passive TiO2 oxidation state. Electrochemical test results revealed that the HfNbTaTiZr, HfNbTaTi, HfNbTaZr, HfNbTiZr HEAs possessed of similar corrosion properties as 316L stainless steel. Atomic force microscopy results showed that the surface roughness of these HEAs increased after electrochemical test. The selective leaching results showed that the concentrations of Hf and Ta ions released from these HEAs were much higher than those of the Nb and Zr ions. The concentration of Ti released from these HEAs was much lower than the other ions. Although the ions concentrations leaching from HfNbTaTiZr HEAs were higher than our expected, HfNbTaTiZr HEAs still have potential biomedical applications since all their consistent elements are highly biocompatible.
摘要 i
Abstract ii
誌謝 iii
目錄 iv
圖目錄 vi
表目錄 ix
第一章 前言 1
第二章 文獻回顧 3
2.1 生醫材料 3
2.2 生醫金屬材料 3
2.3 高熵合金 (High Entropy Alloy, HEA) 4
2.4 高熵合金於生醫材料的應用 5
2.5 腐蝕 8
第三章 實驗設備與方法 19
3.1 HfNbTaTiZr system高熵合金的設計與熔煉 19
3.2 HfNbTaTiZr system高熵合金晶體結構分析 19
3.3 HfNbTaTiZr system高熵合金表面化學組成分析 19
3.4 HfNbTaTiZr system高熵合金電化學分析 20
3.5 HfNbTaTiZr system高熵合金表面型態分析 20
3.6 HfNbTaTiZr system高熵合金之腐蝕浸出 21
第四章 結果與討論 27
4.1 HfNbTaTiZr system高熵合金X光繞射結果分析 27
4.2 HfNbTaTiZr system高熵合金X光光電子能譜儀(XPS)結果分析 28
4.3 HfNbTaTiZr system高熵合金電化學Tafel極化曲線結果分析 31
4.4 HfNbTaTiZr system高熵合金AFM表面型態分析 32
4.5 HfNbTaTiZr system高熵合金腐蝕浸出行為 33
4.6 HfNbTaTiZr system高熵合金腐蝕浸出綜合討論 34
第五章 結論 51
參考文獻 52
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