本論文為了改善尖晶石ZnCo2O4薄膜的材料特性，以外質摻雜鎂的方式，增進半導體電學性質，同時研究摻雜效應所影響的晶體結構、光電特性以及薄膜是否具備抗菌之特性。
　　鎂摻雜於ZnCo2O4薄膜中均具有奈米晶粒，且尺寸隨著退火溫度的上升而增加，在鎂摻雜含量比由0增加至0.17並無發現二次相結構的產生。鎂置換鈷元素會使得薄膜原子晶格排序的規則性下降，造成平均晶粒尺寸及表面的粗糙度減少。所有薄膜在波長550nm的透光率約為32%~37%。未摻雜的ZnCo2O4薄膜直接能隙值為2.10 eV，摻雜鎂後能隙值的範圍改變為2.02~2. 09 eV。正二價鎂可以置換正三價鈷促使載子濃度增加，造成Zn(Co1-xMgx)2O4電阻率由1.16×102 Ω-cm(x=0)下降至4.3×101 Ω-cm(x=0.11)。
　　抗菌方面，在UV光照射以及在沒有任何光源的環境中，大腸桿菌以及金黃色葡萄球菌無法在此薄膜上進行繁殖及生存，材料的抗菌率均可達99%以上，摻雜鎂於ZnCo2O4具有優異的抗菌應用潛力。

　　In this study, in order to improve the material properties of spinel ZnCo2O4 thin films, the electrical properties of semiconductors were enhanced by extrinsic Magnesium-doping. We studied the crystal structure, microstructure, photoelectric properties and antibacterial properties of doping effects on the ZnCo2O4.
　　Magnesium-doped ZnCo2O4 films have nano-crystalline grains, and the size increases with the increase of annealing temperature. When the doping content ratio increased from x=0 to 0.17, no secondary phase structure formed. The replacement of cobalt by Magnesium causes decreasing effect on the atomic lattice order, resulting in a decrease in the average grain size and a reduction in the roughness of the surface. The transmittance of all films was about 32% ~ 37% at 550 nm. The direct band gap of the un-doped ZnCo2O4 film was 2.10 eV, and the band gaps of the Magnesium-doped ZnCo2O4 were 2.02~2.09 eV. The positive divalent Magnesium can replace positive trivalent cobalt to increase the carrier concentration, resulting in a decrease in resistivity from 1.16×102 Ω-cm(x=0) to 4.3×101 Ω-cm(x=0.11).
　　The anti-S. aureus and E. coli abilities of the films had more than 99% in the UV light irradiation and in the absence of any light source. The p-type Zn(Co1-xMgx)2O4 film can be applied to the antibacterial and electronic component.

目錄 III
圖目錄 V
表目錄 VII
第1章 緒論 1
1.1 前言 1
1.2 研究動機與目的 2
1.3 ZnCo2O4之文獻回顧 4
1.4 論文組織架構 11
第2章 實驗原理 13
2.1 透明導電薄膜 13
2.1.1 透明導電薄膜之歷史 13
2.1.2 透明導電薄膜之光學特性 14
2.1.3 透明導電薄膜之電學特性 16
2.2 薄膜沉積機制 18
2.3 薄膜成長模式 21
2.4 溶膠—凝膠法(Sol - Gel) 23
2.4.1 溶膠—凝膠之歷史 23
2.4.2 溶膠—凝膠之簡介 25
2.4.3 溶膠—凝膠法之原理及應用 26
2.5 物理氣相沉積(Physical Vapor Deposition, PVD) 31
2.5.1 蒸鍍(Evaporation) 31
2.5.2 濺鍍(Sputtering) 35
2.6 電流傳導機制 38
2.6.1 電極限制電流機制 38
2.6.2 限制電流機制 41
2.7 ZnCo2O4之晶體結構 45
第3章 實驗方法與分析 49
3.1 實驗材料 49
3.2 前驅物調製 50
3.3 實驗設備 52
3.3.1 電磁加熱攪拌器(Hot plant and magnetic stirrer) 52
3.3.2 旋轉塗佈機 (Spin Coaters) 53
3.3.3 高溫方形爐 (Muffle Furnace) 54
3.4 實驗流程 55
3.5 實驗分析及鑑定儀器 56
3.5.1 高解析X光繞射儀(High Resolution X-ray Diffractometer, HRXRD) 57
3.5.2 場發射掃描式電子顯微鏡 (FESEM) 59
3.5.3 紫外線/可見光分光光譜儀 (UV-Vis) 62
3.5.4 霍爾效應分析儀(Hall Effect Analyzer) 63
3.5.5 輕敲式原子力顯微鏡 (AFM) 65
3.5.6 多功能聚焦離子束系統(FIB) 66
3.5.7 高解析穿透式電子顯微鏡 (HRTEM) 68
第4章 實驗結果與討論 71
4.1 ZnCo2O4 摻雜Mg研究前論 71
4.2 晶體結構分析 72
4.3 薄膜表面微結構分析 79
4.4 薄膜光學性質分析 91
4.5 薄膜直接能隙 92
4.6 電學性質量測 95
4.7 抗菌測試 96
第5章 結論 101
參考文獻 103
附錄 106

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