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研究生:李慈
研究生(外文):LI,TSZ
論文名稱:應用於結構光3D取像之繞射光學元件之模擬與測量
論文名稱(外文):Simulation and Measurement of Diffractive Optical Elements Applied to 3D Imaging of Structured Light
指導教授:徐巍峰
指導教授(外文):HSU, WEI-FENG
口試委員:林正峰陳政寰徐巍峰
口試委員(外文):LIN, JENG-FENGCHEN, CHENG-HUANHSU, WEI-FENG
口試日期:2020-07-24
學位類別:碩士
校院名稱:國立臺北科技大學
系所名稱:光電工程系
學門:工程學門
學類:電資工程學類
論文種類:學術論文
論文出版年:2020
畢業學年度:108
語文別:中文
論文頁數:68
中文關鍵詞:遠場繞設廣角繞射模擬廣角繞射光學元件結構光之量測
外文關鍵詞:FraunhoferWide-angle diffraction simulationWide-angle Diffractive Optical ElementsMeasurement of structured light
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由繞射光學元件產生廣角繞射影像近來廣泛應用於結構光3D感測,本篇論文研究重點在於設計結構光中之廣角繞射光學元件,並模擬廣角繞射所造成的畸變以及光強衰減,以及隨機點繞射圖形以及網格圖形之設計。元件設計方法利用遞迴傅立葉轉換演算法(IFTA)結合大誤差縮減演算法(ZERA)來產生出具有較佳的影像品質之繞射光學元件。
為了模擬出較大的繞射角度所產生之畸變現象,利用Huygens–Fresnel principle在遠場的繞射平面上以座標轉換和三角函數的運算進而得到繞射平面上之繞射圖形,在matlab上針對特定波長的光以及特定的光軸上,且設定與實際DOE像素大小相同的目標圖形上進行繞射圖形上的強度模擬。由於開發的DOE使用的是940nm的雷射,為不可見光,故在進行量測時,需透過CMOS camera進行檢視與量測DOE實際投射影像尺寸,利用CMOScamera取得之影像資訊,確認實際繞射後的DOE影響尺寸,將測得之長度與寬度進行計算繞射角度之計算,並同時針對PSNR以及均勻度做量測及驗證。

Wide-angle diffraction images generated by diffractive optical elements have recently extensively decomposed structured light 3D sensing. The focus of this paper is to design wide-angle diffractive optical elements in structured light and simulate the distortion and intensity attenuation caused by wide-angle diffraction. The component design method utilizes a recursive Fourier transform algorithm (IFTA) combined with Large Error Reduction Algorithm (ZERA) to produce diffractive optical components with better image quality.
In order to simulate the distortion caused by the larger diffraction angle, coordinate transformation and trigonometric function calculations were performed on the diffraction plane of the far field to obtain the diffraction pattern on the diffraction plane, and the Fraunhofer diffraction formula was used Intensity simulation on the diffraction pattern was performed on the target pattern on matlab for light of a specific wavelength and the specific optical axis, and set to the same size as the actual DOE pixel size.
Since the developed DOE uses a 940nm laser, which is invisible light, it was necessary to use the CMOS camera to view and measure the actual projected image size of the DOE during measurement. Used the image information obtained by the CMOS camera to confirm the actual diffraction. The DOE affects the size, the measured length and width were calculated for the calculation of the diffraction angle, and the PSNR and uniformity were measured and verified at the same time.

摘要 i
ABSTRACT ii
誌謝 iv
目錄 v
表目錄 vii
圖目錄 viii
第一章 緒論 1
1.1 研究背景 1
1.2 研究動機與目的 5
1.3 模擬繞射相關文獻回顧 6
1.4 論文架構 7
第二章 應用之繞射理論 9
2.1 繞射理論 9
2.1.1 Rayleigh-Sommerfeld繞射理論 10
2.1.2 Fresnel繞射理論 14
2.1.3 Fraunhofer 繞射理論 18
2.2 光波的線性傳輸 20
2.3 繞射光學元件 21
2.4 繞射元件的優點與應用 25
第三章 模擬繞射 27
3.1 模擬繞射簡介 27
3.1.1 近場繞射模擬 27
3.1.2 近場繞射模擬實現 28
3.1.3 遠場繞射模擬 30
3.1.4 遠場繞射模擬實現 31
3.2 廣角繞射圖形之模擬 33
3.3 畸變之模擬 36
3.4 基於Rayleigh-Sommerfeld之模擬繞射 37
3.5 繞射元件之像素區塊影響 38
3.6 廣角繞射圖形之模擬 40
第四章 實驗結果及討論 45
4.1 影像評估參數 45
4.2 效能評估方法 46
4.3 繞射影像之量測 48
4.4 結果與討論 56
4.5 未來展望 66
參考文獻 67


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[8]杜佩芩,立體量測系統之繞射光學元件設計與製作,國立中興大學機械工程學系所,碩士論文,臺中,2014。
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