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研究生:王信發
研究生(外文):WANG, HSIN-FA
論文名稱:晶圓傳送手臂動態分析
論文名稱(外文):Analysis of Dynamic-Wafer-Handling Robot
指導教授:陳傳生
指導教授(外文):CHEN,CHWAN-HSEN
口試委員:何旭川仲維德
口試委員(外文):HER,SHIUH-CHUANCHUNG,WEI-DE
口試日期:2020-07-28
學位類別:碩士
校院名稱:元智大學
系所名稱:機械工程學系
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2020
畢業學年度:108
語文別:中文
論文頁數:36
中文關鍵詞:晶圓機器人偏心量估測
外文關鍵詞:Wafer-Handling RobotEccentricity Estimation
相關次數:
  • 被引用被引用:0
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  • 下載下載:36
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本論文研究之晶圓傳送手臂廣泛用於運送晶圓。為改善晶圓傳送效率,將感測器安裝在每個工作站估計運送中的晶圓偏心量。

但是,由於非理想因素,如:光束半徑,機器人運動誤差和系統非線性和不確定性,很難實現高精度偏心量估計,滿足半導體製造的苛刻要求。進一步改善偏心估計精度,之間的關係機器人運動誤差,傳感器校準誤差和偏心量分析識別錯誤。

提出的晶圓偏心量估計技術通過驗證在晶圓運送機器手臂上進行的實驗。該結果表明,所開發的方法可用於提高晶圓處理精度並減少晶圓在半導體製造中的循環時間。

Wafer-handling robot developed in this paper is widely used for wafer-transporting semi-conduction manufacturing. To improve the wafer transport efficiency, optical sensor are installed at each workstation to estimate the wafer eccentricity during transport.
However, due to non-ideal factors such as sensor, robot motion error, system nonlinearity and uncertainty, it is difficult to achieve high-precision eccentricity estimation to meet the demanding requirements of semiconductor manufacturing. Improve on the accuracy of eccentricity estimation, the relationship between robot motion error, sensor calibration error and eccentricity analysis identifies errors.
The proposed eccentricity estimation technique verifies the experiments performed on a wafer processing robot. The results show that the developed method can be used to improve wafer transport positioning in accuracy and reduce cycle time in wafer fabrication.

摘要 I
ABSTRACT II
致謝 III
目錄 IV
表目錄 VI
圖目錄 VII
符號說明 IX
第一章、緒論 1
1.1 研究動機 1
1.2 研究目的 1
1.3 文獻探討 3
1.4 論文大綱 3
第二章、晶圓偏心量分析 4
2.1 偏心量識別的誤差來源 4
2.2 分析方法 4
2.3 偏心量估計 6
2.4 偏心量估計(運動參數誤差) 8
2.5 晶圓凹口所造成估計誤差 9
第三章、晶圓機械手臂 14
3.1 概述 14
3.2 機構設計 14
3.3 運動學分析 22
第四章、實驗 24
4.1 概論 24
4.2 驗證 24
4.3 偏心量估計模擬(晶圓片誤差) 29
4.4 偏心量估計模擬(運動參數誤差): 31
第五章、結論 34
參考文獻 35


[1]H. Cheng,H. Chen,and B. Mooring,2013,"Accuracy Analysis of Dynamic Wafer-Handling Robotic System in Semiconductor Manufacturing",IEEE Transactions on Industrial Electronics.61(3):1402-1410.

[2]H. Chen,H. Cheng,B. Mooring,and H. Stern.,"Wafer Eccentricity Estimation with Disturbance Caused by Alignment Notch", IEEE International Conference on Cyber Technology in Automation,Control and Intelligent Systems,2013.

[3]L. Yang,and N. Wang,"Decoupling Control Based on Dynamic Model of 4-DOF Wafer Handling Robot",ICIRA 2015:Intelligent Robotics and Applications,2015,pp.563-570.

[4]H. Chen,B.Mooring,and H. Stern,"Dynamic Wafer Handling Process in Semiconductor Manufacturing.Proceedings of the 2011 IEEE International Conference on Robotics and Biomimetics,2011.

[5]M. Hosek and J. Prochazka,"On-the-fly substrate eccentricity recognition for robotized manufacturing systems",J.Manuf.Sci.Eng., vol.127,no.1,2005,pp.206–216.

[6]Ming Cong,Xu Yu ,Baohong Shen,and Jing Liu,2007,"Research on A Novel R-θ Wafer-handling Robot",Proceedings of the IEEE International Conference on Automation and Logistics 2007.

[7]H. Cheng,H. Chen,B. Mooring,and H. Stern,2012,"Error Modeling and Analysis in Dynamic Wafer Handling",Proceedings of the 10th World Congress on Intelligent Control and Automation 2012.

[8]Yunbo He,Chang Zhang,Wentao Ye,Zuoxiong He,Xin Chen,Jian Gao,Kai Zhang, Zhijun Yang,Xun Chen,Yun Chen,and Hui Tang, "A direct-drive SCARA robot for wafer & ceramic-substrate handling based on visual servoing ", Cybernetics and Intelligent Systems (CIS) and IEEE Conference on Robotics Automation and Mechatronics (RAM) 2017 IEEE International Conference on,2017,pp.428-433.

[9]D. Cheng,S Jose,and Wesley W. Zhang,(Apr.1989),"System and method for detecting the center of an integrated circuit wafer",U.S. Patent No.4819167.

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