臺灣博碩士論文加值系統

本研究以FCD450球墨鑄鐵為基材，進行沃斯回火處理得到沃斯回火延性鑄鐵 (ADI)，再使用陰極電弧沉積 (Cathodic arc deposition，CAD)技術披覆 (TiCrCuAlSi)N多元氮化陶瓷硬膜，變化鍍膜製程偏壓參數作為本實驗變因，用以得到不同元素含量比之陶瓷硬膜，偏壓值分別使用(-50V、-100V、-150V)，以探討不同元素組成比之薄膜對ADI特性之影響。
實驗結果顯示: (1)在附著性方面，利用Rockwell-C硬度壓痕器來判定，其中偏壓為-50V的膜層剝落情形較嚴重，有明顯的片狀剝落發生；隨著偏壓值上升至-150V具有最佳的附著性(HF2)。(2)在耐腐蝕性方面，經過極化試驗得知，與鍍膜前的試片相比，ADI披覆(TiCrCuAlSi)N多元氮化物膜層處理者，其耐蝕性亦有明顯的改善，其中又以偏壓值為-150V者為較佳。(3)在耐磨耗性方面，經過磨耗試驗得知，隨著負偏壓值的提升，耐磨耗性也隨之上升，其中又以偏壓值為-150V者為較佳。

In this study, the FCD450 ductile cast iron was used as the material, and the austempering treat-ment was carried out to obtain the austempered ductile cast iron (ADI). Then the cathodic arc dep-osition (CAD) technique was used to coat the (TiCrCuAlSi)N multi-elemental nitride ceramic hard film, and the bias parameter of the coating process was changed as the variable in the present experiments, so that the ceramic hard film with different elemental content ratios could be ob-tained, and the bias values were (-50V, -100V, -150V) to investigate the effect of the films with dif-ferent elemental composition ratios on the corrosion resistance of ADI. The bias values of ceramic hard films with different elemental content ratios were used to investigate the effect of films with different elemental composition ratios on characteristics of ADI.
The experimental results showed that: (1) In terms of adhesion, the Rockwell-C hardness indenter was used to determine that the film layer coated with -50V bias was more serious, with obvious flakes peeling off, and that the best adhesion was achieved when the bias value was in-creased to -150V. (2) In terms of corrosion resistance, the polarization test showed that compared with the uncoated specimen, the corrosion resistance of ADI coated (TiCrCuAlSi)N nitride film layer is significantly improved, with the bias value of -150V being the best.(3) In terms of wear resistance, according to the wear test, as the bias voltage increases, the wear resistance also increases, with the bias value of -150V being the best.

摘要 ii
ABSTRACT iii
目錄 iv
圖目錄 vii
表目錄 xi
第一章 前言 1
1.1研究動機 1
1.2研究目的 2
第二章 文獻回顧 3
2.1球墨鑄鐵 3
2.2沃斯回火球墨鑄鐵 3
2.2.1沃斯回火熱處理[8-10] 4
2.3表面處理 5
2.4物理氣相沉積法 (Physical vapor deposition, PVD) 6
2.5化學氣相沉積法 (Chemical Vapor Deposition, CVD) [17] 9
2.6電鍍 (Electroplating) [18,19] 9
2.7陰極電弧沉積法 (Cathodic arc deposition, CAD) 10
2.8真空電弧 13
2.9離子轟擊 (Ion bombardment) 14
2.10薄膜成核成長理論 16
2.11薄膜微結構型態 19
2.12微滴 (Microparticle) [34,35] 20
2.13本研究相關鍍膜 21
2.13.1多層膜 (Multilayer) 21
2.13.2中介層 22
2.13.3氮化鈦膜層 23
2.13.4氮化鉻膜層 23
2.13.5氮化鋁鉻 (AlCrN)、氮化鈦鉻 (TiCrN)膜層 24
2.14薄膜附著性檢測 24
2.15奈米壓痕硬度檢測 25
2.16 HV維氏硬度檢測 28
2.17薄膜磨耗試驗 29
2.18薄膜腐蝕行為 33
第三章 實驗方法與步驟 39
3.1實驗設計及流程 39
3.2基材準備 40
3.3鍍膜前處理 41
3.4 CAD鍍膜製程 41
3.5薄膜結構、組成成分與形貌分析 45
3.5.1 OM微觀結構 45
3.5.2 EPMA分析 46
3.5.3 XRD 結構分析 47
3.5.4 FE-SEM橫截面觀察 48
3.5.5 SEM表面形貌觀察 49
3.5.6表面粗糙度量測 50
3.6鍍膜特性分析 53
3.6.1奈米壓痕薄膜硬度試驗 53
3.6.2附著性檢測 54
3.6.3 HV維氏硬度試驗 55
3.6.4磨耗試驗 56
3.6.5鹽霧試驗 57
3.6.6極化試驗 58
3.6.7水接觸角分析 59
第四章 結果與討論 60
4.1 薄膜結構、組成成分與形貌分析 60
4.1.1薄膜成分分析 60
4.1.2 XRD結構分析 61
4.1.3 OM微觀結構 62
4.1.4橫截面觀察 64
4.1.5表面粗糙度分析 67
4.1.6表面形貌觀察 69
4.2 鍍膜特性分析 71
4.2.1 HV維氏硬度試驗 71
4.2.2奈米壓痕硬度分析 72
4.2.3附著性檢測 74
4.2.4磨耗試驗 76
4.2.5極化試驗 79
4.2.6實務耐候性試驗(鹽霧試驗) 82
4.2.7水接觸角試驗 84
第五章 結論 86
參考文獻 89

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