臺灣博碩士論文加值系統

碳類鑽薄膜是一種應用廣泛的材料,本研究利用excimer(308 nm)脈衝雷射
蒸鍍系統(固態物理氣相沉積法),和微波(2.45 GHz)電漿化學氣相沉積系
統(化學反應氣相沉積法),兩種不同真空鍍膜系統方式,在n型矽基板和鉬
基板上沉積鍍膜,其中矽基材上用微細加工蝕刻法,微影蝕刻成許多U型小
槽洞,並鍍上碳類鑽膜,以探討碳類鑽膜材料的品質,和找出最佳的鍍膜製
程條件,並以拉曼光譜儀,掃瞄式電子顯微鏡,電子光譜化學分析儀,評估碳
類鑽膜的品質,表面微結構構,表面化學元素分析等特性,和量測在高真空
底下,薄膜電特性曲線,最後應用在研製最好條件品質的碳類鑽膜,沉積鍍
膜在微針尖場發射陣列,發射模組元件表面上的材料與製程探討.

Diamond-Like Carbon(DLC) film is one of an excellent material
for various applications.We deposited it on the n-type Si(100)
and Mo substrates.The filmsstudies used two different kinds
system,one is excimer (308 nm)Pulsed Laser Deposition(PLD),the
other is Microwave (2.45 GHz)Plasma Chemical Vapour Deposition(
MPCVD).The films properties were evaluated by Raman
spectroscopy,SEM,ESCA,and electrical characters measurement. The
last step will combine the potential advantages application of
micro-tips is fabricationon Si(100) substrate byetching U groove
process with bulk micromaching technologies,DLC film then
bedeposited on the micro-tips surface and Field Emission Array(
FEA) emitter will be studied.