參考文獻
[1] 廖文淵,化學機械研磨後清洗過程微粒附著及移除機制之探討,碩士論文,中興大學,1994。[2] 鄭偉佑,多孔性聚乙烯醇縮甲醛泡棉的製備與探討,博士論文,東海大學,2011。[3] 雷红,CMP後清洗技術的研究進展,半導體技術第33 卷第5 期,2008,369-374。
[4] A. A. B. Fan Zhang, Goodarz Ahmadi and a. r. i. c. m. p. a. post, "Particle Adhesion and Removal in Chemical Mechanical Polishing (CMP) and post-CMP Cleaning," Journal of The Electrochemical Society,, vol. 146, p. 1, 1999.
[5] Jong-Min Lim, Bu-yong Jeon, and C. Lee, "Dry cleaning for metallic contaminants removal as the second cleaning process after the CMP process," Materials Chemistry and Physics, vol. 70, pp. 129-136, 2001.
[6] L. M. Ara Philipossian, "Tribological Characterization of Post-CMP Brush Scrubbbing," Solid State Phenomena vol. 92, pp. 275-280, 2003.
[7] A. A. Busnaina, H. Lin, N. Moumen, J. W. Feng, J. Taylor,“Particle Adhesion and Removal Mechanisms in Post-CMPCleaning Processes,” IEEE Transactions on Semiconductor Manufacturing. Vol. 15, No. 4, november 2002.
[8] G. Zhanga, G. Burdicka, F. Daib, T. Bibbyb, and S. Beaudoin, "Assessment of post-CMP cleaning mechanisms using statistically-designed experiments," Thin Solid Films, vol. 332, pp. 379-384, 1998.
[9] E. E. a. J. L. H. Lianga, "Mechanisms of post CMP cleaning," MRS Proceedings, vol. 671, p. M7.4, 2001.
[10] R. T. Vos, I. ; Lagrange, S. ; Lauerhaas, J. ; Meuris, M. ; Mertens, P. ; Heyns, M. , "Critical issues in post Cu CMP cleaning " Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on, pp. 415-418, 2000.
[11] W.O. Herrmann and W. Haehnel, In DE-OS, Germany: Chem. Forschungsgemeinschaft, 1924.
[12] F.L. Marten and C.W. Zvanut, "Hydrolysis of Polyvinyl Acetate to Polyvinyl Alcohol, Polyvinyl Alcohol - Developments," 2nd, John Wiley &; Sons, 1992,57-76.
[13] L. Chang Chun PetroChemical Co.," Manual of Polyvinyl Alcohol," 2003.
[14] B. Briscoe, P. Luckham and S. Zhu, "The Effects of Hydrogen Bonding Upon The Viscosity of Aqueous Polyvinyl Alcohol Solutions," Polymer, 41, 2000,3851-3860.
[15] "Plastics. Polyvinyl Alcohol (PVAL) Materials. Designation System and Basis for Specifications." In BS EN ISO, 2006.
[16] S.K. Saxena, "Chemical and Technical Assessment - Polyvinyl Alcohol In 61st Joint FAO/WHO Expert Committee on Food Additives, "2004.
[17] M.L. Hallensleben, "Ullmann's Encyclopedia of Industrial Chemistry," 6th, Wiley-VCH, 2003,1-18.
[18] K. Noro, "Emulsion Polymerization of Vinyl Acetate in Relation to the Chemical Structure of Polyvinyl Alcohol," British Polymer Journal, 2, 1970,128-134.
[19] L. Yu Fang and M. Li, "Production Technology and Market Analysis of Polyvinyl Alcohol Worldwide," Chemical Industry, 28, 2010,32-35.
[20] C.A. Finch, "Chemical Reactions and Stereochemistry of Polyvinyl Alcohol," Polyvinyl Alcohol - Developments, John Wiley &; Sons, Ltd, 1992,269-312.
[21] T.P. Blomstrom, "Encyclopedia of Polymer Science and Engineering," 2nd, 17 John Wiley &; Sons, Inc., 1989136-167.
[22] J. BeMiller and R. Whistler, "Starch: Chemistry and Technology, Food Science and Technology, International Series," 3rd, Academic Press,2009.
[23] J.R. Daniel, R.L. Whistler, H. Röper and B. Elvers, "Ullmann's Encyclopedia of Industrial Chemistry," 6th,Wiley-VCH, 2003,1-25.
[24] J.L. Jane, "Starch: Chemistry and Technology," 3rd, Academic Press, 2009,193-236.
[25] C.G. Biliaderis, "Starch: Chemistry and Technology," 3rd , 2009,293-372.
[26] Chein, R.; Liao, W., "Modeling of particle removal using non-contact brush scrubbing in post-CMP cleaning processes." The Journal of Adhesiion 2006,82,555-575.
[27] Ng, D.; Huang, P. Y.; Jeng, Y. R.; Liang, H., "Nanoparticle Removal Mechanisms during Post-CMP Cleaning." Electrochemical and Solid-State Letters 2007,10,(8),H227-H231.
[28] Philipossian, A.; Mustapha, L., "Effect of Mechanical Properties of PVA Brush Rollers on Frictional Forces during Post-CMP Scrubbing." Journal of The Electrochemical Society 2004,151,(9),G632-G637.
[29] 卓采蓉,加入聚丙烯酸(PAA)對多孔性聚乙烯醇縮甲醛泡棉(PVF)物性影響的研究,碩士論文,東海大學,2011。