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研究生:黃奕棠
研究生(外文):Yi-Tang Huang
論文名稱:高反射性表面形貌之光學量測研究
論文名稱(外文):Optical profile measurement of high reflection surface
指導教授:陳元方陳元方引用關係
指導教授(外文):Terry Yuan-Fang Chen
學位類別:碩士
校院名稱:國立成功大學
系所名稱:機械工程學系碩博士班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2006
畢業學年度:94
語文別:中文
論文頁數:115
中文關鍵詞:晶圓光碟模具條紋反射法陰影疊紋法條紋投影法
外文關鍵詞:fringe reflectionshadow moirefringe projectionwaferdisc mold
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本文研究中,主要目的是使用條紋反射法、陰影疊紋法和條紋投影法,應用在高反射性表面形貌的量測,並提出影像填補法,粉末塗佈來克服高反射面所引起的量測問題。首先以條紋反射法量測光碟膜具和晶圓試件的斜率變化和表面形貌,接著以陰影疊紋法量測晶圓的外型,再藉由滑石粉末均勻塗佈在試件表面以克服陰影疊紋法無法量測高反射性表面形貌之限制,最後嘗試以條紋投影法並搭配高倍率光學顯微鏡量測高反射性之微小試件。

在條紋反射法、陰影疊紋法之光學量測系統的精確度方面,與薄膜應力量測FLX-2320驗證比對後,條紋反射法量測系統最大誤差在1.5微米以內,陰影疊紋法量測系統最大誤差在3微米以內,其條紋投影法之光學量測系統的精確度方面,與高精度表面粗度儀SE3500驗證比對後其最大誤差可在1.5微米以內。
In this paper, the major purpose is to use three sets of optical apparatus to measure high reflection surface profile and to bring up image filled method ,daubed powder on the surface to overcome the measurement problem. First, we use fringe reflection method to measure the surface slope variation and surface profile of a disc mold and a wafer. Then, we use shadow moire method with talcum powder, which can overcome the limitation of using shadow moire apparatus to measurement high reflection surface, to measure the surface profile of wafer . Finally, we use fringe projection method combined with microscope to measure high reflection micro sample.

About the accuracy of fringe reflection and shadow moire,by comparing with the thin film stress measurement FLX-2320,the error of fringe reflection apparatus is under 1.5micron and the error of shadow moire apparatus is under 3micron.About the accuracy of fringe projection, by comparing with the surface roughness measureing instrument SE-3500,the error is under 1.5micron.
中文摘要………………………………………………………………Ⅰ
英文摘要………………………………………………………………Ⅱ
致謝……………………………………………………………………III
目錄……………………………………………………………………IV
圖目錄…………………………………………………………………VII
表目錄…………………………………………………………………X
符號說明………………………………………………………………XI

第一章 緒論
1-1研究背景…………………………………………………1
1-2研究目的…………………………………………………4
1-3文獻回顧…………………………………………………5
1-4本文架構…………………………………………………10

第二章 光學量測原理
2-1條紋反射法原理…………………………………………11
2-2陰影疊紋法原理…………………………………………21
2-3條紋投影法原理…………………………………………27

第三章 相位移法與Macy相位展開法
3-1相位移法簡介……………………………………………34
3-2相位展開法簡介…………………………………………36


第四章 實驗裝置、量測試件與方法
4-1條紋反射法實驗系統介紹………………………………37
4-2陰影疊紋法實驗系統介紹………………………………39
4-3條紋投影法實驗系統介紹………………………………42
4-4 量測試件介紹
4-4-1光碟模具試件……………………………………45
4-4-2鍍上3500 Ti之矽晶圓試件…………………… 46
4-4-3矽薄膜微小試件…………………………………47
4-5馬達校正……………………………………………… 48
4-6 量測方法
4-6-1光碟模具量測方法………………………………49
4-6-2矽晶圓量測方法…………………………………60
4-7形貌量測儀簡介
4-7-1 Alpha-Step量測儀規格介紹………………… 65
4-7-2薄膜應力量測儀FLX-2320規格介紹……………65


第五章 實驗步驟
5-1條紋反射法實驗步驟………………………………… 67
5-2陰影疊紋法實驗步驟………………………………… 68
5-3 條紋投影法實驗步驟…………………………………69


第六章 實驗結果與討論
6-1應用條紋反射法於晶圓表面量測………………………71
6-2應用條紋反射法於光碟模具表面量測…………………82
6-3應用陰影疊紋法於晶圓表面量測………………………89
6-4應用條紋投影法於矽薄膜微小試件量…………………102

第七章 結論與建議
7-1 結論…………………………………………………… 109
7-2 建議…………………………………………………… 111

參考文獻………………………………………………………… 112
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