|
1. Zhu, R., C.-C. Hsu, and M.C. Lin, ab initio study of CH3+O2 reaction: kinetics, mechanism and product branching probabilities. Journal of Chemical Physics, 2001. 115(1): p. 9. 2. Fock, V., Z. Physik, 1930. 61: p. 5. 3. Dewar, M.J.S., et al., Development and use of quantum mechanical molecular models. 76. AM1: a new general purpose quantum mechanical molecular model. J. Am. Chem. Soc., 1985. 107(13): p. 8. 4. Stewart, J.J.P., Journal of Computational Chemistry, 1989. 10. 5. Bacon, A.C. and M.C. Zerner, Theo. Chim. Acta., 1979. 53. 6. Clementi, E. and D.L. Raimondi, Atomic Screening Constants from SCF Functions. Journal of Chemical Physics, 1963. 38(11): p. 4. 7. Clementi, E., simple basis set for molecular wavefunctions containing first- and second-row atoms. Journal of Chemical Physics, 1964. 40(7): p. 2. 8. Ditchfield, R., W.J. Hehre, and J.A. Pople, self-consistent molecular-orbital methods. IX. anextended Gaussian-type basis for molecular-orbital of organic molecules. Journal of Chemical Physics, 1971. 54(2): p. 5. 9. collins, J.B., P.v.R. Schleyer, and J.S. Binkley, self-consistent molecular orbital methods. XVII. geometries and binding energise of second-row molecules. a comparison of three basis sets. journal of Chemical Physics, 1976. 64: p. 10. 10. Clark, T., et al., Journal of Computational Chemistry, 1983. 4. 11. Hohenberg, P.K. and W. Kohn, Physical review, 1964. 136. 12. Foresman, J.B., Exploring Chemistry with Electronic Structure Method. In 2nd ed. 13. Gonzalez, C. and H.B. Schlegel, an improved algorithm for reaction path following. Journal of Chemical Physics, 1989. 90(4): p. 8. 14. Widjaja, Y. and C.B. Musgrave, Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition. Applied Physics Letters, 2002. 80(18): p. 3304-3306. 15. Ghosh, M.K. and C.H. Choi, The initial mechanisms of Al2O3 atomic layer deposition on OH/Si(100)-2 x 1 surface by tri-methylaluminum and water. Chemical Physics Letters, 2006. 426(4-6): p. 365-369. 16. Raghunath, P. and M.C. Lin, Computational study on the mechanisms and energetics of trimethylindium reactions with H2O and H2S. Journal of Physical Chemistry A, 2007. 111(28): p. 6481-6488. 17. Laubengayer, A.W. and W.F. Gilliam, The Alkyls of the Third Group Elements. I. Vapor Phase Studies of the Alkyls of Aluminum, Gallium and Indium. Journal of the American Chemical Society, 1941. 63: p. 477-479.
|