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The major objective of this study was to investigate the treatment of fluoride-containing wastewater of semiconductor industry through precipitate flotation processes.Fluoride-containing wastewater was obtained from semiconductor factory. There were about 700 mg/l of fluoride, 160 mg/l of nitrate, and 5 mg/l of sulfate in the wastewater sample. The basic principle of the treatment processes is the addition of calcium chloride to generate the precipitate of calcium fluoride, and its subsequent removal. The results of despersed air flotation (DiAF) experiment indicated that through adjusting molar concentration ratio of calcium and fluoride and obtained. All flotation reactions were completed within 10 minutes. The concentration of sodium dodecy1 sulfate (SDS) has significant effect on the removal efficiency of calcium fluoride. Various types of calcium salts and surfactants were also investigated. It was found that nitrogen flowrate, molar concentration ratio of calcium and fluoride, and pH value have insignificant effects on the removal percentage of calcium fluoride. The removal efficiency decreases with increasing ionic strength, and can be overcome by increasing the concentration of SDS. Results of dissolved air flotation (DAF) experiment showed that sodium oleate (SO1) concentration has critical effect on removal efficiency of calcium fluoride. Since adjacent oleate species were adsorbed at the calcium fluoride surface, the hydrophobicity of calcium fluoride surface was enhanced. Effects of pressure. recycle flowrate, pH value, and ionic strength were studied on the removal efficiency of calcium fluoried. In the presence of sulfate and of phosphate, the residual fluoride concentration became higher and the removal efficiency of calcium fluoride decreased significantly, due to the competition effect. It can be improved by increasing calcium concentration, surfactant concentrations (SDS or SO1), or the use of SDS in combination with SO1.
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