參考文獻
1.李玉華”透明導膜及應用”科儀新知,第十二卷第一期 (1990),P94-P102
2.J.L.Vossen,”Transparent conduction films”,Physiscs of Thin Films,(1997),P1
3.許生,頻遠”全國光電顯示與連接”2002,P9
4.古俊能,”工業材料雜誌”,第169期2001年1月,P106
5.陳光華,鄧金祥,”新型電子薄膜材料”P408-P411
6.H.Kawazoe et al. Transparent P-type Conducting Oxides:design and fabrication of P-N.heterojunctions,mks.Bulletin,august (2000)P28-P36
7.Z.L Wang,M.B Mohamed,S,Link,M,A,El-Sared,Surface Science 440
(1999)L809~L814
8.Nikhil R.Jana,Latha Gearheart,and Chatherine J, Murpy , Chem
mater,13(2001)2313~2322
9.Nikhil R.Jana,Latha Gearheart,and Chatherine J, Murpy,Langmuir
12(2001)6782~6786
10.CatherineJ,Murphy,and Nikhil R.Jana,Adv.Mater.14,1(2002)
P80~P82
11. Nikhil R.Jana,Latha Gearheart,and Chatherine J, Murpy,J,Phys,
Chem.B 105(2001)4065~4067
12. Nikhil R.Jana,Latha Gearheart,and Chatherine J, Murpy,Adv.
Mater.13,18(2001)1389~1393
13.M.J.Alam,D.C.Camweron.Thin Solid Film 420-421 (2002)P76-P82
14.”真空技術與應用”精密儀器發展中心,P379-P381
15.”真空技術與應用”精密儀器發展中心,P360-p363
16.Yoshida,S.Misawa and S.Gonda,Appl.Phys.Lett.42. (1983)P427
17.K.L. Chopra.s.Major and D.K.Pandya,”Transparent Conductors-a
Status Review “,Thin Solid Films, (1983)P1-P102.
18.CTO技術”晶元光電研發中心”,謝明勲.電子時報(2006/5/9)
19.許國銓,” 科技玻璃-高性能透明導電玻璃”,材料與社會,(1993) P8420.Fan et a;,Journal of Applied Physics,48, (1977) 3524
21.楊明煇”透明導電薄材料技術與發展”P30-P32
22. 賴明雄,溫志中,”ITO靶材開發與應用”P10-P20
23. Bellingham et al,J.mater.Sci.Lett.11(1992)P263.
24.H.Tomonaga and T.morimoto,Thin Solid Films (2001)P392
25.D.J.Leary,J.O.Barnes,and A.G.Jordan,J.Electrochem.Soe,29
(1982)1328.
26.M.Quaas,C,Egs,H.walff,”structural studies of ITO thin films with the Rietveld method,”Thin solid Film,332(1998)P277-P281
27.Y,Shigesato,S.TaKaKi,and T,Haranoh,Elestrical and structural Propertier of low resistivity .Tin-doped indium Oxide films”, J.Appl Phys,71, (1922)3356
28.K.LChopra.S.major and D.K.Pandya.Thin Solid Films (1983) P102
29.”真空技術與應用”精密儀器發展中心,P213-P233
30.黃肇瑞 姚寶順氧化銦錫薄膜內應力和其附著性質之研究P54-P70
31. Anthony J. Perry , Materials Science and Engineering, A253 (1998) P310-P318.
32.Donald L. Smith, McGraw-Hill, Inc., 1995.P20-P23
33.”真空技術與應用”精密儀器發展中心,P630.