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研究生:葉育嘉
研究生(外文):Yu-Jia Ye
論文名稱:應用田口方法於3D列印之光固化材料性質最適化
論文名稱(外文):Optimization of 3-D Printing Photo-curable Material Properties with Taguchi Method
指導教授:陳志銘陳志銘引用關係張厚謙鄭文桐
指導教授(外文):Chih-Ming ChenHou-Chien ChangWen-Tung Cheng
口試委員:李亦宸
口試委員(外文):Yi-Chen Li
口試日期:2022-01-25
學位類別:碩士
校院名稱:國立中興大學
系所名稱:化學工程學系所
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:2022
畢業學年度:110
語文別:中文
論文頁數:76
中文關鍵詞:光固化3D列印田口方法
外文關鍵詞:UV-curingPhoto-curing3D printingTaguchi method
相關次數:
  • 被引用被引用:9
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光固化列印(Vat Photopolymerization)之光固化溶液配方組成決定了固化材料的性質。然而,因光固化材料為高分子,對於其材料的性質有機械強度不高及熱性質不強的本質。因此,本研究以改善產品品質著稱的田口方法(Taguchi Methods)對光固化材料的性質進行探討,以寡聚合物(Oligomer)、單體(Monomer)及光起始劑(Photoinitiator)添加量與後曝光量(Exposure dosage)作為控制因子,並分析其材料得到之最大拉伸強度及玻璃轉化溫度作為品質特性,期望找出其材料機械性質與熱性質之最適化配方。
本研究使用SLA(Stereolithography)技術之光固化3D列印機與田口方法之望大特性(Larger-The-Better)機制並以寡聚合物:胺基改質聚醚丙烯酸酯(Amine modified polyether acrylate,AMPA)、脂肪酸改質聚酯丙烯酸酯(Fatty acid modified polyester hexacrylate,FAMPH)及AMPA:FAMPH重量比1:1作為控制因子A的三水準;寡聚合物與單體三丙二醇二丙烯酸酯(Tripropylene glycol diacrylate,TPGDA)之重量比例1:1、2:1及3:1作為控制因子B的三水準;光起始劑(Irgacure819:Darocur1173重量比1:1)添加量3、6及9wt%作為控制因子C的三水準;後曝光量8.8、13.2、17.6J/cm2作為控制因子D的三水準。
本研究結果顯示,在寡聚合物AMPA:FAMPH重量比1:1、寡聚合物與單體重量比例3:1、光起始劑添加量3wt%及後曝光量17.6J/cm2有機械性質最適化配方。在寡聚合物FAMPH、寡聚合物與單體重量比例1:1、光起始劑添加量6wt%及後曝光量17.6J/cm2有熱性質最適化配方。然後,各對其性質最適化配方列印出材料及分析其材料性質,並與直交表實驗組的性質比對:機械性質增益13.2%,熱性質增益8.7%。
The composition of the photo-curable resin for Vat Photopolymerization determines the properties of photo-cured material. However, due to the fact that the photo-cured material is polymer which properties have the nature of low mechanical strength and low thermal property. Therefore, ,this study adopts Taguchi method, which is known for improving product quality, to investigate the properties of photo-cured materials. By using oligomer, monomer, photoinitiator, exposure dosage as control factors, max tensile strength and glass transition temperature were obtained by analyzing the material as quality characteristics. It is hoped to find the optimal formula for the mechanical property and thermal property of photo-cured material.
This research adopts SLA(Stereolithography) photo-curing 3D printer and Taguchi method's Larger-The-Better mechanism, and uses oligomer: Amine modified polyether acrylate(AMPA), Fatty acid modified polyester hexacrylate(FAMPH) and AMPA: FAMPH weight ratio is 1:1 as the three levels of control factor A; the oligomer: monomer(Tripropylene glycol diacrylate, TPGDA) weight ratio are 1:1, 2:1, and 3:1 as the three levels of the control factor B; the addition amount of photoinitiator (Irgacure819: Darocur1173 weight ratio is 1:1) is 3,6 and 9wt% as the three levels of the control factor C; the exposure dosage amounts of 8.8, 13.2, 17.6J/cm2 as the three levels of control factor D.
The results show that an optimal formula for mechanical property was found as the oligomer weight ratio of AMPA:FAMPH is 1:1, the weight ratio of oligomer and TPGDA is 3:1, the addition amount of photoinitiator is 3wt%, and the exposure dosage amount is 17.6J/cm2,; an optimal formula for thermal property was found as the oligomer is FAMPH, the FAMPH and TPGDA weight ratio is 1:1, photoinitiator addition amount is 6wt%, and exposure dosage amount is 17.6J/cm2. Then, mechanical property gain 13.2%, thermal property gain 8.7%.each optimized formula for its properties was printed out and the material properties were analyzed and compared with the properties of the experimental group in the Orthogonal array: mechanical property gained 13.2%, thermal property gained 8.7%.
摘要 i
Abstract ii
目錄 iv
表目錄 vi
圖目錄 vii
第一章 緒論 1
1-1 前言 1
1-2 研究動機與方法 2
1-3 論文架構 4
第二章 文獻回顧 5
2-1 3D列印技術簡介 5
2-1-1疊層製造成型 6
2-1-2材料擠壓成型 7
2-1-3材料噴塗成型 8
2-1-4粉體熔融成型 9
2-1-5黏著劑噴塗成型 10
2-1-6定向能量沉積 11
2-1-7光固化成型 12
2-2紫外光固化材料 13
2-2-1寡聚合物 14
2-2-2單體 17
2-2-3光起始劑 18
2-3田口式品質工程 22
2-3-1系統設計 22
2-3-2參數設計 22
2-3-3允差設計 23
2-3-4因子總類 24
2-3-5直交表設計 24
2-3-6訊號雜訊比 27
2-3-7變異數分析 28
2-3-8實驗確認 29
第三章 研究方法 30
3-1 光固化材料配方設計 30
3-1-1 田口方法實驗設計 30
3-1-2 變異數分析 35
3-1-3 實驗確認 38
3-1-4 光固化溶液配置 39
3-1-5 3D建模與列印 40
3-1-6 物件清洗與分析 40
3-2 儀器分析 41
3-2-1 立體光刻三維列印機 41
3-2-2 紫外光曝光機 43
3-2-3 動態熱機械分析儀 45
3-2-4 萬能拉伸試驗機 47
3-2-5 偏振光學顯微鏡 49
3-3 實驗藥品 51
3-4 儀器設備 54
第四章 結果與討論 55
4-1 光固化材料最大機械強度最適化配方 55
4-2 光固化材料耐熱性質最適化配方 62
4-3 光固化材料之橫斷面形貌分析 69
第五章 結論與未來展望 70
5-1 結論 70
5-2 未來展望 71
參考文獻 72
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